Trifluorosilyl radical
- Formula: F3Si
- Molecular weight: 85.0807
- IUPAC Standard InChI: InChI=1S/F3Si/c1-4(2)3
- IUPAC Standard InChIKey: ATVLVRVBCRICNU-UHFFFAOYSA-N
- CAS Registry Number: 14835-14-4
- Chemical structure:
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Gas phase thermochemistry data
Go To: Top, Gas phase ion energetics data, References, Notes
Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.
| Quantity | Value | Units | Method | Reference | Comment |
|---|---|---|---|---|---|
| ΔfH°gas | -259.400 | kcal/mol | Review | Chase, 1998 | Data last reviewed in December, 1977 |
| Quantity | Value | Units | Method | Reference | Comment |
| S°gas,1 bar | 67.488 | cal/mol*K | Review | Chase, 1998 | Data last reviewed in December, 1977 |
Gas Phase Heat Capacity (Shomate Equation)
Cp° = A + B*t + C*t2 + D*t3 +
E/t2
H° − H°298.15= A*t + B*t2/2 +
C*t3/3 + D*t4/4 − E/t + F − H
S° = A*ln(t) + B*t + C*t2/2 + D*t3/3 −
E/(2*t2) + G
Cp = heat capacity (cal/mol*K)
H° = standard enthalpy (kcal/mol)
S° = standard entropy (cal/mol*K)
t = temperature (K) / 1000.
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| Temperature (K) | 298. to 1100. | 1100. to 6000. |
|---|---|---|
| A | 10.13300 | 19.77130 |
| B | 23.26190 | 0.059820 |
| C | -21.23790 | -0.013095 |
| D | 6.898280 | 0.001000 |
| E | -0.099375 | -0.857380 |
| F | -263.6150 | -267.7610 |
| G | 73.14011 | 87.64981 |
| H | -259.4001 | -259.4001 |
| Reference | Chase, 1998 | Chase, 1998 |
| Comment | Data last reviewed in December, 1977 | Data last reviewed in December, 1977 |
Gas phase ion energetics data
Go To: Top, Gas phase thermochemistry data, References, Notes
Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.
Data compiled as indicated in comments:
LL - Sharon G. Lias and Joel F. Liebman
B - John E. Bartmess
View reactions leading to F3Si+ (ion structure unspecified)
Electron affinity determinations
| EA (eV) | Method | Reference | Comment |
|---|---|---|---|
| 2.41 ± 0.22 | LPES | Kawamata, Neigishi, et al., 1996 | Vertical Detachment Energy: 2.76±0.05 eV.; B |
| 2.95 ± 0.10 | PD | Richardson, Stephenson, et al., 1975 | non-adiabatic; B |
| 2.03811 | EIAE | Franklin, Wang, et al., 1974 | From SiF4; B |
| 2.03811 | EIAE | Wang, Margrave, et al., 1973 | From SiF4; B |
| 3.69996 | EIAE | MacNeil and Thynne, 1970 | From SiF4; B |
| 3.35205 | SI | Page and Goode, 1969 | The Magnetron method, lacking mass analysis, is not considered reliable.; B |
Ionization energy determinations
| IE (eV) | Method | Reference | Comment |
|---|---|---|---|
| 9.99 ± 0.24 | END | Weber and Armentrout, 1988 | LL |
References
Go To: Top, Gas phase thermochemistry data, Gas phase ion energetics data, Notes
Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.
Chase, 1998
Chase, M.W., Jr.,
NIST-JANAF Themochemical Tables, Fourth Edition,
J. Phys. Chem. Ref. Data, Monograph 9, 1998, 1-1951. [all data]
Kawamata, Neigishi, et al., 1996
Kawamata, H.; Neigishi, Y.; Kishi, R.; Iwata, S.; Nakajima, A.; Kaya, K.,
Photoelectron Spectroscopy of Silicon-Fluorine Binary Cluster Anions (SinFm-),
J. Chem. Phys., 1996, 105, 13, 5369, https://doi.org/10.1063/1.472377
. [all data]
Richardson, Stephenson, et al., 1975
Richardson, J.H.; Stephenson, L.M.; Brauman, J.I.,
Photodetachment of electrons from trifluoromethyl and trifluorosilyl ions the electron affinities of CF3 and SiF3,
Chem. Phys. Lett., 1975, 30, 17. [all data]
Franklin, Wang, et al., 1974
Franklin, J.L.; Wang, J.L.-F.; Bennett, S.L.; Harland, P.W.; Margrave, J.L.,
Studies of the energies of negative ions at high temperatures,
Adv. Mass Spectrom., 1974, 6, 319. [all data]
Wang, Margrave, et al., 1973
Wang, J.L.-F.; Margrave, J.L.; Franklin, J.L.,
Interpretation of dissociative electron attachment processes for carbon and silicon tetrafluorides,
J. Chem. Phys., 1973, 58, 5417. [all data]
MacNeil and Thynne, 1970
MacNeil, K.A.G.; Thynne, J.C.J.,
The Formation of Negative Ions by Electron Impact on Silicon Tetrafluoride and Carbon Tetrafluoride,
Int. J. Mass Spectrom. Ion Phys., 1970, 3, 6, 455, https://doi.org/10.1016/0020-7381(70)80004-3
. [all data]
Page and Goode, 1969
Page, F.M.; Goode, G.C.,
Negative Ions and the Magnetron., Wiley, NY, 1969. [all data]
Weber and Armentrout, 1988
Weber, M.E.; Armentrout, P.B.,
Energetics and dynamics in the reaction of Si+ with SiF4. Thermochemistry of SiFx and SiFx+ (x=1,2,3),
J. Chem. Phys., 1988, 11, 6898. [all data]
Notes
Go To: Top, Gas phase thermochemistry data, Gas phase ion energetics data, References
- Symbols used in this document:
EA Electron affinity S°gas,1 bar Entropy of gas at standard conditions (1 bar) ΔfH°gas Enthalpy of formation of gas at standard conditions - Data from NIST Standard Reference Database 69: NIST Chemistry WebBook
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