Silane, tetramethyl-

• Formula: C₄H₁₂Si
• Molecular weight: 88.2236
• IUPAC Standard InChI: InChI=1S/C4H12Si/c1-5(2,3)4/h1-4H3 Copy

  
• IUPAC Standard InChIKey: CZDYPVPMEAXLPK-UHFFFAOYSA-N Copy
• CAS Registry Number: 75-76-3
• Chemical structure:
  This structure is also available as a 2d Mol file or as a computed 3d SD file
  The 3d structure may be viewed using Java or Javascript.
• Other names: Tetramethylsilane; (CH3)4Si; Silicon, tetramethyl-; Tetramethylsilicane; UN 2749; Si(CH3)4; CT2050; TMS; NSC 5210; T2050
• Permanent link for this species. Use this link for bookmarking this species for future reference.
• Information on this page:
  • Reaction thermochemistry data
  • Gas phase ion energetics data
  • References
  • Notes
• Other data available:
  • Gas phase thermochemistry data
  • Condensed phase thermochemistry data
  • Phase change data
  • Ion clustering data
  • IR Spectrum
  • Mass spectrum (electron ionization)
  • UV/Visible spectrum
  • Gas Chromatography
• Data at other public NIST sites:
  • Electron-Impact Ionization Cross Sections (on physics web site)
  • Gas Phase Kinetics Database
  • X-ray Photoelectron Spectroscopy Database, version 5.0
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Reaction thermochemistry data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled as indicated in comments:
B - John E. Bartmess
M - Michael M. Meot-Ner (Mautner) and Sharon G. Lias

Note: Please consider using the reaction search for this species. This page allows searching of all reactions involving this species. A general reaction search form is also available. Future versions of this site may rely on reaction search pages in place of the enumerated reaction displays seen below.

Individual Reactions

C₄H₁₁Si^- +  =

By formula: C₄H₁₁Si^- + H⁺ = C₄H₁₂Si

 +  = ( • )

By formula: F^- + C₄H₁₂Si = (F^- • C₄H₁₂Si)

C₃H₉Si⁺ +  = (C₃H₉Si⁺ • )

By formula: C₃H₉Si⁺ + C₄H₁₂Si = (C₃H₉Si⁺ • C₄H₁₂Si)

Gas phase ion energetics data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data evaluated as indicated in comments:
L - Sharon G. Lias

Data compiled as indicated in comments:
B - John E. Bartmess
LLK - Sharon G. Lias, Rhoda D. Levin, and Sherif A. Kafafi
RDSH - Henry M. Rosenstock, Keith Draxl, Bruce W. Steiner, and John T. Herron
LBLHLM - Sharon G. Lias, John E. Bartmess, Joel F. Liebman, John L. Holmes, Rhoda D. Levin, and W. Gary Mallard

Ionization energy determinations

Appearance energy determinations

De-protonation reactions

C₄H₁₁Si^- +  =

By formula: C₄H₁₁Si^- + H⁺ = C₄H₁₂Si

References

Go To: Top, Reaction thermochemistry data, Gas phase ion energetics data, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Damrauer, Kass, et al., 1988
Damrauer, R.; Kass, S.R.; DePuy, C.H., Gas-Phase Acidities of Methylsilanes: C-H versus Si-H, Organomet., 1988, 7, 3, 637, https://doi.org/10.1021/om00093a011 . [all data]

Wetzel and Brauman, 1988
Wetzel, D.M.; Brauman, J.I., Quantitative Measure of alpha-Silyl Carbanion Stabilization. The Electron Affinity of (Trimethylsilyl)methyl Radical, J. Am. Chem. Soc., 1988, 110, 25, 8333, https://doi.org/10.1021/ja00233a008 . [all data]

DePuy and Damrauer, 1984
DePuy, C.H.; Damrauer, R., Reactions of organosilane anionic species with nitrous oxide, Organometallics, 1984, 3, 362. [all data]

Larson and McMahon, 1985
Larson, J.W.; McMahon, T.B., Fluoride and chloride affinities of the main group oxides, fluorides, oxofluorides, and alkyls. Quantitative scales of lewis acidities from ICR halide exchange equilibria, J. Am. Chem. Soc., 1985, 107, 766. [all data]

Arshadi, Yamdagni, et al., 1970
Arshadi, M.; Yamdagni, R.; Kebarle, P., Hydration of Halide Negative Ions in the Gas Phase. II. Comparison of Hydration Energies for the Alkali Positive and Halide Negative Ions, J. Phys. Chem., 1970, 74, 7, 1475, https://doi.org/10.1021/j100702a014 . [all data]

Wojtyniak, Li, et al., 1987
Wojtyniak, A.C.M.; Li, K.; Stone, J.A., The Formation of (CH3)7Si2+ in (CH3)4Si/CH4 Mixtures and CH3- Exchange Reactions Between (CH3)4Si, (CH3)4Ge and (CH3)4Sn Studied by High Pressure Mass Spectrometry, Can. J. Chem., 1987, 65, 12, 2849, https://doi.org/10.1139/v87-473 . [all data]

Murphy and Beauchamp, 1977
Murphy, M.K.; Beauchamp, J.L., Photoionization mass spectrometry of the fluoromethylsilanes (CH₃)_n F_4-nSi (n = 1-4), J. Am. Chem. Soc., 1977, 99, 2085. [all data]

Potzinger, Ritter, et al., 1975
Potzinger, P.; Ritter, A.; Krause, J., Massenspektrometrische Bestimmung von Bindungsenergien in siliciumorganischen Verbindungen, Z. Naturforsch. A:, 1975, 30, 347. [all data]

MacLean and Sacher, 1974
MacLean, D.I.; Sacher, R.E., A study of some spectroscopic properties of Group IVA acetylides, J. Organomet. Chem., 1974, 74, 197. [all data]

Jonas, Schweitzer, et al., 1973
Jonas, A.E.; Schweitzer, G.K.; Grimm, F.A.; Carlson, T.A., The photoelectron spectra of the tetrafluoro and tetramethyl compounds of the group IV elements, J. Electron Spectrosc. Relat. Phenom., 1973, 1, 29. [all data]

Evans, Green, et al., 1972
Evans, S.; Green, J.C.; Joachim, P.J.; Orchard, A.F.; Turner, D.W.; Maier, J.P., Electronic structures of the Group IV_B tetramethyls by helium-(I) photoelectron spectroscopy, J. Chem. Soc. Faraday Trans. 2, 1972, 68, 905. [all data]

Lappert, Pedley, et al., 1971
Lappert, M.F.; Pedley, J.B.; Simpson, J.; Spalding, T.R., Bonding studies of compounds of boron and the Group IV elements. VI. Mass spectrometric studies on compounds Me₄M and Me₃M-M'Me₃ (M and M'=C, Si, Ge, Sn, and Pb): thermochemical data, J. Organomet. Chem., 1971, 29, 195. [all data]

Potzinger and Lampe, 1970
Potzinger, P.; Lampe, F.W., Thermochemistry of simple alkylsilanes, J. Phys. Chem., 1970, 74, 719. [all data]

Distefano, 1970
Distefano, G., Photoionization study of tetramethylsilicon, Inorg. Chem., 1970, 9, 1919. [all data]

Lappert, Simpson, et al., 1969
Lappert, M.F.; Simpson, J.; Spalding, T.R., Bonding studies of compounds of the group IV elements: ionisation potentials of the Me₃M radicals, J.Organometal. Chem., 1969, 17, PI. [all data]

Band, Davidson, et al., 1968
Band, S.J.; Davidson, I.M.T.; Lambert, C.A., Bond dissociation energies: electron impact studies on some trimethylsilyl compounds, J. Chem. Soc. A, 1968, 2068. [all data]

Hess, Lampe, et al., 1965
Hess, G.G.; Lampe, F.W.; Sommer, L.H., An electron impact study of ionization and dissociation of trimethylsilanes, J. Am. Chem. Soc., 1965, 87, 5327. [all data]

Khvostenko, Zykov, et al., 1981
Khvostenko, V.I.; Zykov, B.G.; Yuriev, V.P.; Mironov, V.F.; Kovel'zon, G.I.; Panasenko, A.A.; Sheludyakov, V.D.; Gailyunas, I.A., Study of d(π)-p(π) interaction in vinyl- and alkylsilicon-containing compounds by photoelectron spectroscopy, J. Organomet. Chem., 1981, 218, 155. [all data]

Roberge, Sandorfy, et al., 1978
Roberge, R.; Sandorfy, C.; Matthews, J.I.; Strausz, O.P., The far ultraviolet HeI photoelectron spectra of alkyl and fluorine substituted silane derivatives, J. Chem. Phys., 1978, 69, 5105. [all data]

Starzewski, Richter, et al., 1976
Starzewski, K.-H.A.O.; Richter, W.; Schmidbaur, H., Photoelektronenspektren und Struktur von Arsenyliden. P versus As: Ein Beitrag zur Problematik der ylidischen Bindung, Chem. Ber., 1976, 109, 473. [all data]

deRidder and Dijkstra, 1967
deRidder, J.J.; Dijkstra, G., Mass spectra of the tetramethyl and tetraethyl compounds of carbon, silicon, germanium, tin and lead, Rec. Trav. Chim., 1967, 86, 737. [all data]

Hobrock and Kiser, 1961
Hobrock, B.G.; Kiser, R.W., Electron impact spectroscopy of tetramethylsilicon, -tin and -lead, J. Phys. Chem., 1961, 65, 2186. [all data]

Szepes and Baer, 1984
Szepes, L.; Baer, T., Dissociation dynamics of energy selected hexamethyldisilane ions and the heats of formation of (CH₃)₃Si⁺ and (CH₃)₃Si, J. Am. Chem. Soc., 1984, 106, 273. [all data]

Szepes and Baer, 1984, 2
Szepes, L.; Baer, T., (CH₃)₃SiX tipusu vegyuletek vizsgalata fotoelectron-fotoion koincidenciaval,I. Meghatarozott belso energiaju hexametil-diszilan-ionok disszociaciojanak dinamikaja, Magy. Kem. Foly., 1984, 90, 104. [all data]

Band, Davidson, et al., Commun. 1967
Band, S.J.; Davidson, I.M.T.; Lambert, C.A.; Stephenson, I.L., Bond dissociation energies and heats of formation of trimethylsilyl compounds, Chem., Commun. 1967, 723. [all data]

Connor, Finney, et al., 1966
Connor, J.A.; Finney, G.; Leigh, G.J.; Haszeldine, R.N.; Robinson, P.J.; Sedgwick, R.D.; Simmons, R.F., Bond dissociation energies in organosilicon compounds, Chem. Commun., 1966, 178. [all data]

Hess, Lampe, et al., 1964
Hess, G.G.; Lampe, F.W.; Sommer, L.H., Bond dissociation energies and ion energetics in organosilicon compounds by electron impact, J. Am. Chem. Soc., 1964, 86, 3174. [all data]

Notes

Go To: Top, Reaction thermochemistry data, Gas phase ion energetics data, References

• Symbols used in this document:
  

  AE	Appearance energy
  IE (evaluated)	Recommended ionization energy
  ΔrG°	Free energy of reaction at standard conditions
  ΔrH°	Enthalpy of reaction at standard conditions
  ΔrS°	Entropy of reaction at standard conditions

• Data from NIST Standard Reference Database 69: NIST Chemistry WebBook
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