Silicon tetrachloride

• Formula: Cl₄Si
• Molecular weight: 169.898
• IUPAC Standard InChI: InChI=1S/Cl4Si/c1-5(2,3)4 Copy

  
• IUPAC Standard InChIKey: FDNAPBUWERUEDA-UHFFFAOYSA-N Copy
• CAS Registry Number: 10026-04-7
• Chemical structure:
  This structure is also available as a 2d Mol file or as a computed 3d SD file
  The 3d structure may be viewed using Java or Javascript.
• Other names: Silane, tetrachloro-; Silicon chloride (SiCl4); Tetrachlorosilane; Tetrachlorosilicon; SiCl4; Silicon chloride; Silicon(IV) chloride; Chlorid kremicity; Extrema; Silicio(tetracloruro di); Siliciumtetrachlorid; Siliciumtetrachloride; Silicium(tetrachlorure de); Tetrachlorure de silicium; UN 1818; SIC-L(TM)
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• Information on this page:
  • Phase change data
  • Gas phase ion energetics data
  • Gas Chromatography
  • References
  • Notes
• Other data available:
  • Gas phase thermochemistry data
  • Reaction thermochemistry data
  • Ion clustering data
  • IR Spectrum
  • Mass spectrum (electron ionization)
  • Vibrational and/or electronic energy levels
• Data at other public NIST sites:
  • Computational Chemistry Comparison and Benchmark Database
  • Gas Phase Kinetics Database
• Options:
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Phase change data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled as indicated in comments:
BS - Robert L. Brown and Stephen E. Stein
TRC - Thermodynamics Research Center, NIST Boulder Laboratories, Chris Muzny director
AC - William E. Acree, Jr., James S. Chickos

Enthalpy of vaporization

Antoine Equation Parameters

log₁₀(P) = A − (B / (T + C))
    P = vapor pressure (atm)
    T = temperature (K)

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Enthalpy of sublimation

Enthalpy of fusion

Gas phase ion energetics data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data evaluated as indicated in comments:
L - Sharon G. Lias

Data compiled as indicated in comments:
LLK - Sharon G. Lias, Rhoda D. Levin, and Sherif A. Kafafi
RDSH - Henry M. Rosenstock, Keith Draxl, Bruce W. Steiner, and John T. Herron

Ionization energy determinations

Appearance energy determinations

Gas Chromatography

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled by: NIST Mass Spectrometry Data Center, William E. Wallace, director

Kovats' RI, non-polar column, isothermal

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Normal alkane RI, non-polar column, custom temperature program

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References

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

PCR Inc., 1990
PCR Inc., Research Chemicals Catalog 1990-1991, PCR Inc., Gainesville, FL, 1990, 1. [all data]

Rugina, Gaspar, et al., 1987
Rugina, T.; Gaspar, M.; Sacarescu, L., Liquid-vapor equilibrium for a binary system of dichlorodimethyl-silane with trichloromethylsilane, chloromethylsilane and silicontetrachloride., Rev. Chim. (Bucharest), 1987, 38, 680. [all data]

Sauer and Hadsell, 1948
Sauer, R.O.; Hadsell, E.M., Azeotropes of Trimethylchlorosilane and Silicon Tetrachloride, J. Am. Chem. Soc., 1948, 70, 4258-9. [all data]

Anonymous, 1955
Anonymous, R., , Am. Pet. Inst. Res. Proj. 45, Tech. Rep. 14, No. 1, Ohio State Univ., 1955. [all data]

Parker and Robinson, 1927
Parker, T.W.; Robinson, P.L., Critical Temperatures of Boron Trichloride and Silicon Tetrachloride., J. Chem. Soc., 1927, 1927, 2977-81. [all data]

Jain and Yadav, 1973
Jain, D.V.S.; Yadav, O.P., Indian J. Chem., 1973, 11, 28. [all data]

Capková and Fried, 1964
Capková, A.; Fried, V., Gleichgewicht flüssigkeit-dampf im system tetrachlorsilan-trimethylchlorsilan, Collect. Czech. Chem. Commun., 1964, 29, 2, 336-340, https://doi.org/10.1135/cccc19640336 . [all data]

Jenkins and Chambers, 1954
Jenkins, Arthur C.; Chambers, George F., Vapor Pressures of Silicon Compounds, Ind. Eng. Chem., 1954, 46, 11, 2367-2369, https://doi.org/10.1021/ie50539a043 . [all data]

Kearby, 1936
Kearby, K., The Vapor Pressure of Silicon Tetrachloride, J. Am. Chem. Soc., 1936, 58, 2, 374-375, https://doi.org/10.1021/ja01293a503 . [all data]

Jain and Yadav, 1973, 2
Jain, D.V.S.; Yadav, O.P., Thermodynamics of n-Alkane Solutions: Part VIII - Vapour Pressures and Excess Free Energies for the SiCl₄/n-Hexane System, Indian J. Chem., 1973, 11, 28-30. [all data]

Balk and Dong, 1964
Balk, P.; Dong, D., The Vapor Pressures of Silicon Tetrachloride and Germanium Tetrachloride below Their Melting Points, J. Phys. Chem., 1964, 68, 4, 960-962, https://doi.org/10.1021/j100786a507 . [all data]

Devyatykh, Guesev, et al., 1985
Devyatykh, G.G.; Guesev, A.V.; Gibin, A.M.; Zhernenkov, N.V.; Zakharov, L.M.; Antipin, M.Yu.; Struchov, Yu.M.T., Russ. J. Inorg. Chem., 1985, 30, 780. [all data]

Potzinger, Ritter, et al., 1975
Potzinger, P.; Ritter, A.; Krause, J., Massenspektrometrische Bestimmung von Bindungsenergien in siliciumorganischen Verbindungen, Z. Naturforsch. A:, 1975, 30, 347. [all data]

Bassett and Lloyd, 1971
Bassett, P.J.; Lloyd, D.R., Photoelectron spectra of halides. Part I. Tetrafluorides and tetrachlorides of group IVB, J. Chem. Soc., 1971, (A), 641. [all data]

Frost, Herring, et al., 1971
Frost, D.C.; Herring, F.G.; Katrib, A.; McLean, R.A.N.; Drake, J.E.; Westwood, N.P.C., (p→>d)π Bonding in halosilanes; evidence from photoelectron spectroscopy, Chem. Phys. Lett., 1971, 10, 347. [all data]

Ihle, Wu, et al., 1978
Ihle, H.R.; Wu, C.H.; Miletic, M.; Zmbov, K.F., Mass spectrometric studies of gas species in the systems Si-Cl and Si-Li, Adv. Mass Spectrom., 1978, 7, 670. [all data]

Steele, Nichols, et al., 1962
Steele, W.C.; Nichols, L.D.; Stone, F.G.A., The determination of silicon-carbon and silicon-hydrogen bond dissociation energies by electron impact, J. Am. Chem. Soc., 1962, 84, 4441. [all data]

Kreshkov, Kirichenko, et al., 1975
Kreshkov, A.P.; Kirichenko, É.A.; Markov, B.A., Retention indices of alkoxychlorosilanes, Zh. Anal. Khim., 1975, 30, 2, 286-289. [all data]

Ainshtein and Shulyatieva, 1972
Ainshtein, A.A.; Shulyatieva, T.I., Retention indices of alkyl- and arylchlorosilanes, Zh. Anal. Khim., 1972, 27, 816-821. [all data]

Garzó, Fekete, et al., 1967
Garzó, G.; Fekete, J.; Blazsó, M., Determination of the gas chromatographic retention indices of various organometallic compounds, Acta Chim. Acad. Sci. Hung., 1967, 51, 4, 359-369. [all data]

Yu and Yang, 2005
Yu, X.; Yang, D., Predicting the Kovats retention index for alkoxyl silicon chlorides and sulfides on stationary phases of different polarity, Fenxi Huaxue, 2005, 33, 1, 101-105. [all data]

Notes

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• Symbols used in this document:
  

  AE	Appearance energy
  IE (evaluated)	Recommended ionization energy
  Tboil	Boiling point
  Tc	Critical temperature
  Tfus	Fusion (melting) point
  ΔfusH	Enthalpy of fusion
  ΔsubH	Enthalpy of sublimation
  ΔvapH	Enthalpy of vaporization

• Data from NIST Standard Reference Database 69: NIST Chemistry WebBook
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