Trifluorosilyl radical


Gas phase thermochemistry data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Quantity Value Units Method Reference Comment
Δfgas-1085.33kJ/molReviewChase, 1998Data last reviewed in December, 1977
Quantity Value Units Method Reference Comment
gas,1 bar282.37J/mol*KReviewChase, 1998Data last reviewed in December, 1977

Gas Phase Heat Capacity (Shomate Equation)

Cp° = A + B*t + C*t2 + D*t3 + E/t2
H° − H°298.15= A*t + B*t2/2 + C*t3/3 + D*t4/4 − E/t + F − H
S° = A*ln(t) + B*t + C*t2/2 + D*t3/3 − E/(2*t2) + G
    Cp = heat capacity (J/mol*K)
    H° = standard enthalpy (kJ/mol)
    S° = standard entropy (J/mol*K)
    t = temperature (K) / 1000.

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Temperature (K) 298. to 1100.1100. to 6000.
A 42.3964782.72312
B 97.327790.250286
C -88.85937-0.054788
D 28.862400.004184
E -0.415787-3.587279
F -1102.965-1120.312
G 306.0182366.7268
H -1085.330-1085.330
ReferenceChase, 1998Chase, 1998
Comment Data last reviewed in December, 1977 Data last reviewed in December, 1977

Vibrational and/or electronic energy levels

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled by: Marilyn E. Jacox

State:   ?


 Energy 
 (cm-1
 Med.   Transition   λmin 
 (nm) 
 λmax 
 (nm) 
 References

gas 290 340 Suto, Han, et al., 1989
Biehl, Boyle, et al., 1997

State:   ?


 Energy 
 (cm-1
 Med.   Transition   λmin 
 (nm) 
 λmax 
 (nm) 
 References

gas 350 800 Donnelly and Flamm, 1980
Suto, Han, et al., 1989
Vanhaelemeersch, Van Hoeymissen, et al., 1991
Biehl, Boyle, et al., 1997

State:   X


Vib. 
sym. 
 No.   Approximate 
 type of mode 
 cm-1   Med.   Method   References

a1 1 SiF stretch 834.9 Ne IR Jacox, Irikura, et al., 1995
1 SiF stretch 832 s Ar IR Milligan, Jacox, et al., 1968
2 Umbrella 406 s Ar IR Milligan, Jacox, et al., 1968
e 3 SiF stretch 958.6 Ne IR Jacox, Irikura, et al., 1995
3 SiF stretch 954 vs Ar IR Milligan, Jacox, et al., 1968
4 Deformation 290 w m Ar IR Milligan, Jacox, et al., 1968

Additional references: Jacox, 1994, page 218; Jacox, 1998, page 262; Jacox, 2003, page 241; Wang, Krishnan, et al., 1973; Griffith and Mathews, 1997; Tanimoto and Saito, 1999

Notes

wWeak
mMedium
sStrong
vsVery strong

References

Go To: Top, Gas phase thermochemistry data, Vibrational and/or electronic energy levels, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Chase, 1998
Chase, M.W., Jr., NIST-JANAF Themochemical Tables, Fourth Edition, J. Phys. Chem. Ref. Data, Monograph 9, 1998, 1-1951. [all data]

Suto, Han, et al., 1989
Suto, M.; Han, J.C.; Lee, L.C.; Chuang, T.J., Emission spectra of SiF3, J. Chem. Phys., 1989, 90, 5, 2834, https://doi.org/10.1063/1.455935 . [all data]

Biehl, Boyle, et al., 1997
Biehl, H.; Boyle, K.J.; Seccombe, D.P.; Smith, D.M.; Tuckett, R.P.; Yoxall, K.R.; Baumgartel, H.; Jochims, H.W., Vacuum-UV fluorescence spectroscopy of SiF[sub 4] in the range 10--30 eV, J. Chem. Phys., 1997, 107, 3, 720, https://doi.org/10.1063/1.474437 . [all data]

Donnelly and Flamm, 1980
Donnelly, V.M.; Flamm, D.L., Studies of chemiluminescence accompanying fluorine atom etching of silicon, J. Appl. Phys., 1980, 51, 10, 5273, https://doi.org/10.1063/1.327282 . [all data]

Vanhaelemeersch, Van Hoeymissen, et al., 1991
Vanhaelemeersch, S.; Van Hoeymissen, J.; Vermeylen, D.; Peeters, J., SiF2 as a primary desorption product of Si etching by F atoms: Interpretation of laser-induced fluorescence spectra; rate constant of the gas phase SiF2+F reaction, J. Appl. Phys., 1991, 70, 7, 3892, https://doi.org/10.1063/1.349197 . [all data]

Jacox, Irikura, et al., 1995
Jacox, M.E.; Irikura, K.K.; Thompson, W.E., Matrix isolation study of the interaction of excited neon atoms with SiF4: Infrared spectra of SiF+3 and SiF-3, J. Chem. Phys., 1995, 103, 13, 5308, https://doi.org/10.1063/1.470726 . [all data]

Milligan, Jacox, et al., 1968
Milligan, D.E.; Jacox, M.E.; Guillory, W.A., Matrix-Isolation Study of the Vacuum-Ultraviolet Photolysis of Trifluorosilane. The Infrared Spectrum of the Free Radical SiF3, J. Chem. Phys., 1968, 49, 12, 5330, https://doi.org/10.1063/1.1670052 . [all data]

Jacox, 1994
Jacox, M.E., Vibrational and electronic energy levels of polyatomic transient molecules, American Chemical Society, Washington, DC, 1994, 464. [all data]

Jacox, 1998
Jacox, M.E., Vibrational and electronic energy levels of polyatomic transient molecules: supplement A, J. Phys. Chem. Ref. Data, 1998, 27, 2, 115-393, https://doi.org/10.1063/1.556017 . [all data]

Jacox, 2003
Jacox, M.E., Vibrational and electronic energy levels of polyatomic transient molecules: supplement B, J. Phys. Chem. Ref. Data, 2003, 32, 1, 1-441, https://doi.org/10.1063/1.1497629 . [all data]

Wang, Krishnan, et al., 1973
Wang, J.L.-F.; Krishnan, C.N.; Margrave, J.L., Emission spectrum of SiF3, J. Mol. Spectrosc., 1973, 48, 2, 346, https://doi.org/10.1016/0022-2852(73)90199-9 . [all data]

Griffith and Mathews, 1997
Griffith, W.B., Jr.; Mathews, C.W., private communication., 1997, https://doi.org/10.1016/S1090-9516(97)90007-9 . [all data]

Tanimoto and Saito, 1999
Tanimoto, M.; Saito, S., Microwave spectroscopic study of the SiF[sub 3] radical: Spin-rotation interaction and molecular structure, J. Chem. Phys., 1999, 111, 20, 9242, https://doi.org/10.1063/1.479838 . [all data]


Notes

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