Silane, trimethyl-


Gas phase ion energetics data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled as indicated in comments:
B - John E. Bartmess
LLK - Sharon G. Lias, Rhoda D. Levin, and Sherif A. Kafafi
RDSH - Henry M. Rosenstock, Keith Draxl, Bruce W. Steiner, and John T. Herron
LL - Sharon G. Lias and Joel F. Liebman

Ionization energy determinations

IE (eV) Method Reference Comment
9.9PEPotzinger, Ritter, et al., 1975LLK
10.11PIConnor, Haszeldine, et al., 1967RDSH
9.8 ± 0.3EIHobrock and Kiser, 1962Personal communication from R.M. Reese and V.H. Dibeler; RDSH
10.8PERoberge, Sandorfy, et al., 1978Vertical value; LLK

Appearance energy determinations

Ion AE (eV) Other Products MethodReferenceComment
CHSi+11.7 ± 0.5?EIHobrock and Kiser, 1962Personal communication from R.M. Reese and V.H. Dibeler; RDSH
CH2Si+10.6 ± 0.3?EIHobrock and Kiser, 1962Personal communication from R.M. Reese and V.H. Dibeler; RDSH
CH3+14.8 ± 0.5?EIHobrock and Kiser, 1962Personal communication from R.M. Reese and V.H. Dibeler; RDSH
CH3Si+13.40 ± 0.10?EIPotzinger and Lampe, 1970RDSH
CH3Si+12.4 ± 0.3?EIHobrock and Kiser, 1962Personal communication from R.M. Reese and V.H. Dibeler; RDSH
CH4Si+11.0 ± 0.3?EIHobrock and Kiser, 1962Personal communication from R.M. Reese and V.H. Dibeler; RDSH
CH5Si+12.8 ± 0.5?EIHobrock and Kiser, 1962Personal communication from R.M. Reese and V.H. Dibeler; RDSH
C2H3+15.3 ± 0.5?EIHobrock and Kiser, 1962Personal communication from R.M. Reese and V.H. Dibeler; RDSH
C2H6Si+10.03 ± 0.05CH4PIShin, Corderman, et al., 1990LL
C2H6Si+10.5 ± 0.1CH4EIPotzinger, Ritter, et al., 1975LLK
C2H6Si+10.50 ± 0.05?EIPotzinger and Lampe, 1970RDSH
C2H6Si+10.3 ± 0.2?EIHobrock and Kiser, 1962Personal communication from R.M. Reese and V.H. Dibeler; RDSH
C2H7Si+10.71 ± 0.05CH3PIShin, Corderman, et al., 1990LL
C2H7Si+10.9 ± 0.1CH3EIPotzinger, Ritter, et al., 1975LLK
C2H7Si+10.91 ± 0.05CH3EIPotzinger and Lampe, 1970RDSH
C2H7Si+11.70 ± 0.06CH3EIHess, Lampe, et al., 1965RDSH
C3H9Si+10.24 ± 0.05HPIShin, Corderman, et al., 1990LL
C3H9Si+10.5 ± 0.1HEIPotzinger, Ritter, et al., 1975LLK
C3H9Si+10.52 ± 0.05HEIPotzinger and Lampe, 1970RDSH
C3H9Si+10.6 ± 0.1HEIBand, Davidson, et al., Commun. 1967RDSH
C3H9Si+10.7 ± 0.1HEIConnor, Finney, et al., 1966RDSH
C3H9Si+10.78 ± 0.07HEIHess, Lampe, et al., 1964RDSH
SiH+14.2 ± 0.2?EIHobrock and Kiser, 1962Personal communication from R.M. Reese and V.H. Dibeler; RDSH
SiH3+14.3 ± 0.5?EIHobrock and Kiser, 1962Personal communication from R.M. Reese and V.H. Dibeler; RDSH
Si+13.7 ± 0.3?EIHobrock and Kiser, 1962Personal communication from R.M. Reese and V.H. Dibeler; RDSH

De-protonation reactions

C3H9Si- + Hydrogen cation = Silane, trimethyl-

By formula: C3H9Si- + H+ = C3H10Si

Quantity Value Units Method Reference Comment
Δr385.8 ± 2.2kcal/molD-EAWetzel, Salomon, et al., 1989gas phase; B
Δr384.1 ± 4.1kcal/molG+TSDamrauer, Kass, et al., 1988gas phase; Between furan and methanol.; B
Quantity Value Units Method Reference Comment
Δr378.6 ± 2.3kcal/molH-TSWetzel, Salomon, et al., 1989gas phase; B
Δr377.0 ± 4.0kcal/molIMRBDamrauer, Kass, et al., 1988gas phase; Between furan and methanol.; B
Δr374.0 ± 3.0kcal/molIMRBGrimm and Bartmess, 1992gas phase; B
Δr>375.0 ± 3.0kcal/molIMRBWetzel, Salomon, et al., 1989gas phase; B

Gas Chromatography

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled by: NIST Mass Spectrometry Data Center, William E. Wallace, director

Normal alkane RI, non-polar column, temperature ramp

View large format table.

Column type Active phase I Reference Comment
CapillaryOV-101408.Zenkevich, 200525. m/0.20 mm/0.10 μm, N2/He, 6. K/min; Tstart: 50. C; Tend: 250. C
CapillarySqualane377.Szekely, Nefedov, et al., 1967Nitrogen, 5. K/min; Column length: 50. m; Column diameter: 0.25 mm; Tstart: 60. C; Tend: 250. C

References

Go To: Top, Gas phase ion energetics data, Gas Chromatography, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Potzinger, Ritter, et al., 1975
Potzinger, P.; Ritter, A.; Krause, J., Massenspektrometrische Bestimmung von Bindungsenergien in siliciumorganischen Verbindungen, Z. Naturforsch. A:, 1975, 30, 347. [all data]

Connor, Haszeldine, et al., 1967
Connor, J.A.; Haszeldine, R.N.; Leigh, G.J.; Sedgwick, R.D., Organosilicon chemistry. Part II. The thermal decomposition of hexamethyldisilane, the Me3Si-SiMe3 bond dissociation energy, and the ionisation potential of the trimethylsilyl radical, J. Chem. Soc. A, 1967, 768. [all data]

Hobrock and Kiser, 1962
Hobrock, B.G.; Kiser, R.W., Electron impact spectroscopy of tetramethylgermanium, trimethylsilane, and dimethylmercury, J. Phys. Chem., 1962, 66, 155. [all data]

Roberge, Sandorfy, et al., 1978
Roberge, R.; Sandorfy, C.; Matthews, J.I.; Strausz, O.P., The far ultraviolet HeI photoelectron spectra of alkyl and fluorine substituted silane derivatives, J. Chem. Phys., 1978, 69, 5105. [all data]

Potzinger and Lampe, 1970
Potzinger, P.; Lampe, F.W., Thermochemistry of simple alkylsilanes, J. Phys. Chem., 1970, 74, 719. [all data]

Shin, Corderman, et al., 1990
Shin, S.K.; Corderman, R.R.; Beauchamp, J.L., Photoionization mass spectrometric studies of the methylsilanes Si(CH3)nH4-n (n = 0-3), Int. J. Mass Spectrom. Ion Processes, 1990, 101, 257. [all data]

Hess, Lampe, et al., 1965
Hess, G.G.; Lampe, F.W.; Sommer, L.H., An electron impact study of ionization and dissociation of trimethylsilanes, J. Am. Chem. Soc., 1965, 87, 5327. [all data]

Band, Davidson, et al., Commun. 1967
Band, S.J.; Davidson, I.M.T.; Lambert, C.A.; Stephenson, I.L., Bond dissociation energies and heats of formation of trimethylsilyl compounds, Chem., Commun. 1967, 723. [all data]

Connor, Finney, et al., 1966
Connor, J.A.; Finney, G.; Leigh, G.J.; Haszeldine, R.N.; Robinson, P.J.; Sedgwick, R.D.; Simmons, R.F., Bond dissociation energies in organosilicon compounds, Chem. Commun., 1966, 178. [all data]

Hess, Lampe, et al., 1964
Hess, G.G.; Lampe, F.W.; Sommer, L.H., Bond dissociation energies and ion energetics in organosilicon compounds by electron impact, J. Am. Chem. Soc., 1964, 86, 3174. [all data]

Wetzel, Salomon, et al., 1989
Wetzel, D.M.; Salomon, K.E.; Berger, S.; Brauman, J.I., Gas-Phase Acidities of Organosilanes and Electron Affinities of Organosilyl Radicals, J. Am. Chem. Soc., 1989, 111, 11, 3835, https://doi.org/10.1021/ja00193a013 . [all data]

Damrauer, Kass, et al., 1988
Damrauer, R.; Kass, S.R.; DePuy, C.H., Gas-Phase Acidities of Methylsilanes: C-H versus Si-H, Organomet., 1988, 7, 3, 637, https://doi.org/10.1021/om00093a011 . [all data]

Grimm and Bartmess, 1992
Grimm, D.T.; Bartmess, J.E., The Intrinsic (Gas Phase) Basicity of some Anions Commonly Used in Condensed-Phase Synthesis, J. Am. Chem. Soc., 1992, 114, 4, 1227, https://doi.org/10.1021/ja00030a016 . [all data]

Zenkevich, 2005
Zenkevich, I.G., Experimentally measured retention indices., 2005. [all data]

Szekely, Nefedov, et al., 1967
Szekely, T.; Nefedov, O.M.; Garzo, G.; Shiryayav, V.I.; Fritz, D., Gas chromatographic investigation of the thermal decomposition of polydimethylsilylene, Acta Chim. Acad. Sci. Hung., 1967, 54, 3-4, 241-254. [all data]


Notes

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