Silicon tetrafluoride

• Formula: F₄Si
• Molecular weight: 104.0791
• IUPAC Standard InChI: InChI=1S/F4Si/c1-5(2,3)4 Copy

  
• IUPAC Standard InChIKey: ABTOQLMXBSRXSM-UHFFFAOYSA-N Copy
• CAS Registry Number: 7783-61-1
• Chemical structure:
  This structure is also available as a 2d Mol file or as a computed 3d SD file
  The 3d structure may be viewed using Java or Javascript.
• Other names: Silane, tetrafluoro-; Silicon fluoride (SiF4); Tetrafluorosilane; SiF4; Silicon fluoride; UN 1859
• Permanent link for this species. Use this link for bookmarking this species for future reference.
• Information on this page:
  • Phase change data
  • Gas phase ion energetics data
  • References
  • Notes
• Other data available:
  • Gas phase thermochemistry data
  • Reaction thermochemistry data
  • Ion clustering data
  • IR Spectrum
  • Mass spectrum (electron ionization)
  • Vibrational and/or electronic energy levels
• Data at other public NIST sites:
  • Electron-Impact Ionization Cross Sections (on physics web site)
  • Gas Phase Kinetics Database
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Phase change data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled as indicated in comments:
BS - Robert L. Brown and Stephen E. Stein
TRC - Thermodynamics Research Center, NIST Boulder Laboratories, Chris Muzny director
AC - William E. Acree, Jr., James S. Chickos

Antoine Equation Parameters

log₁₀(P) = A − (B / (T + C))
    P = vapor pressure (bar)
    T = temperature (K)

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Enthalpy of sublimation

Gas phase ion energetics data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data evaluated as indicated in comments:
HL - Edward P. Hunter and Sharon G. Lias
L - Sharon G. Lias

Data compiled as indicated in comments:
MM - Michael M. Meot-Ner (Mautner)
LL - Sharon G. Lias and Joel F. Liebman
LBLHLM - Sharon G. Lias, John E. Bartmess, Joel F. Liebman, John L. Holmes, Rhoda D. Levin, and W. Gary Mallard
LLK - Sharon G. Lias, Rhoda D. Levin, and Sherif A. Kafafi
RDSH - Henry M. Rosenstock, Keith Draxl, Bruce W. Steiner, and John T. Herron

Proton affinity at 298K

Gas basicity at 298K

Protonation entropy at 298K

Ionization energy determinations

Appearance energy determinations

References

Go To: Top, Phase change data, Gas phase ion energetics data, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

PCR Inc., 1990
PCR Inc., Research Chemicals Catalog 1990-1991, PCR Inc., Gainesville, FL, 1990, 1. [all data]

Booth and Swinehart, 1935
Booth, H.S.; Swinehart, C.F., Critical Constants and Vapor Pressure of Some Gaseous Fluorides of Group IV, J. Am. Chem. Soc., 1935, 57, 1337. [all data]

Pace and Mosser, 1963
Pace, E.L.; Mosser, J.S., Thermodynamic Properties of Silicon Tetrafluoride from 15 ºK to its Triple Point. The Entropy from Molecular and Spectroscopic Data, J. Chem. Phys., 1963, 39, 1, 154-158, https://doi.org/10.1063/1.1733993 . [all data]

Stull, 1947
Stull, Daniel R., Vapor Pressure of Pure Substances. Organic and Inorganic Compounds, Ind. Eng. Chem., 1947, 39, 4, 517-540, https://doi.org/10.1021/ie50448a022 . [all data]

Patnode and Papish, 1929
Patnode, W.I.; Papish, Jacob, The Vapor Pressure of Silicon Tetrafluoride, J. Phys. Chem., 1929, 34, 7, 1494-1496, https://doi.org/10.1021/j150313a010 . [all data]

Hunter and Lias, 1998
Hunter, E.P.; Lias, S.G., Evaluated Gas Phase Basicities and Proton Affinities of Molecules: An Update, J. Phys. Chem. Ref. Data, 1998, 27, 3, 413-656, https://doi.org/10.1063/1.556018 . [all data]

Ling, Milburn, et al., 1999
Ling, Y.; Milburn, R.K.; Hopkinson, A.C.; Bohme, D.K., Experimental and theoretical studies of the proton affinity of SiF4 and the structure of SiF4H+, J. Am. Soc. Mass Spectrom., 1999, 10, 848. [all data]

Kickel, Fisher, et al., 1993
Kickel, B.L.; Fisher, E.R.; Armentrout, P.B., Dissociative charge-transfer reactions of N⁺(³P), N₂⁺(²_g⁺), Ar⁺(²P_3/2,_1/2), and Kr⁺(²P_3/2) with SiF₄. Thermochemistry of SiF₄⁺ and SiF₃⁺, J. Phys. Chem., 1993, 97, 10198. [all data]

Murphy and Beauchamp, 1977
Murphy, M.K.; Beauchamp, J.L., Photoionization mass spectrometry of the fluoromethylsilanes (CH₃)_n F_4-nSi (n = 1-4), J. Am. Chem. Soc., 1977, 99, 2085. [all data]

Farber and Srivastava, 1977
Farber, M.; Srivastava, R.D., Mass spectrometric determination of the heats of formation of the silane fluorides, Chem. Phys. Lett., 1977, 51, 307. [all data]

Lloyd and Roberts, 1975
Lloyd, D.R.; Roberts, P.J., Photoelectron spectra of halides. VII. Variable temperature He(I) and He(II) studies of CF₄, SiF₄, and GeF₄, J. Electron Spectrosc. Relat. Phenom., 1975, 7, 325. [all data]

Bassett and Lloyd, 1971
Bassett, P.J.; Lloyd, D.R., Photoelectron spectra of halides. Part I. Tetrafluorides and tetrachlorides of group IVB, J. Chem. Soc., 1971, (A), 641. [all data]

Bull, Pullen, et al., 1970
Bull, W.E.; Pullen, B.P.; Grimm, F.A.; Moddeman, W.E.; Schweitzer, G.K.; Carlson, T.A., High resolution photoelectron spectroscopy of carbon and silicon tetrafluorides, Inorg. Chem., 1970, 9, 2474. [all data]

McDonald, Williams, et al., 1968
McDonald, J.D.; Williams, C.H.; Thompson, J.C.; Margrave, J.L., Appearance potentials, ionization potentials and heats of formation for perfluorosilanes and perfluoroborosilanes, Advan. Chem. Ser., 1968, 72, 261. [all data]

Bieri, Asbrink, et al., 1982
Bieri, G.; Asbrink, L.; Von Niessen, W., 30.4-nm He(II) photoelectron spectra of organic molecules, J. Electron Spectrosc. Relat. Phenom., 1982, 27, 129. [all data]

Fehlner and Turner, 1974
Fehlner, T.P.; Turner, D.W., The photoelectron spectrum of SiF₂, Inorg. Chem., 1974, 13, 754. [all data]

Jonas, Schweitzer, et al., 1973
Jonas, A.E.; Schweitzer, G.K.; Grimm, F.A.; Carlson, T.A., The photoelectron spectra of the tetrafluoro and tetramethyl compounds of the group IV elements, J. Electron Spectrosc. Relat. Phenom., 1973, 1, 29. [all data]

Notes

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• Symbols used in this document:
  

  AE	Appearance energy
  IE (evaluated)	Recommended ionization energy
  Pc	Critical pressure
  Tboil	Boiling point
  Tc	Critical temperature
  ΔsubH	Enthalpy of sublimation

• Data from NIST Standard Reference Database 69: NIST Chemistry WebBook
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