Trifluorosilane
- Formula: F3HSi
- Molecular weight: 86.0886
- IUPAC Standard InChIKey: WPPVEXTUHHUEIV-UHFFFAOYSA-N
- CAS Registry Number: 13465-71-9
- Chemical structure:
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Reaction thermochemistry data
Go To: Top, Gas phase ion energetics data, References, Notes
Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.
Data compiled by: John E. Bartmess
Note: Please consider using the reaction search for this species. This page allows searching of all reactions involving this species. A general reaction search form is also available. Future versions of this site may rely on reaction search pages in place of the enumerated reaction displays seen below.
Individual Reactions
F3Si- + =
By formula: F3Si- + H+ = HF3Si
Quantity | Value | Units | Method | Reference | Comment |
---|---|---|---|---|---|
ΔrH° | 358.1 ± 5.2 | kcal/mol | D-EA | Kawamata, Neigishi, et al., 1996 | gas phase; Vertical Detachment Energy: 2.76±0.05 eV. |
Quantity | Value | Units | Method | Reference | Comment |
ΔrG° | 350.4 ± 5.3 | kcal/mol | H-TS | Kawamata, Neigishi, et al., 1996 | gas phase; Vertical Detachment Energy: 2.76±0.05 eV. |
Gas phase ion energetics data
Go To: Top, Reaction thermochemistry data, References, Notes
Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.
Data compiled as indicated in comments:
B - John E. Bartmess
LLK - Sharon G. Lias, Rhoda D. Levin, and Sherif A. Kafafi
RDSH - Henry M. Rosenstock, Keith Draxl, Bruce W. Steiner, and John T. Herron
Ionization energy determinations
IE (eV) | Method | Reference | Comment |
---|---|---|---|
11. ± 1. | EI | Farber and Srivastava, 1977 | LLK |
14.0 | PE | Cradock, Ebsworth, et al., 1973 | LLK |
14.48 ± 0.05 | PE | Demuth, 1977 | Vertical value; LLK |
14.48 ± 0.02 | PE | Cradock, Ebsworth, et al., 1973 | Vertical value; LLK |
Appearance energy determinations
Ion | AE (eV) | Other Products | Method | Reference | Comment |
---|---|---|---|---|---|
SiHF2+ | 13.4 ± 0.3 | F | EI | Sharp and Margrave, 1969 | RDSH |
De-protonation reactions
F3Si- + =
By formula: F3Si- + H+ = HF3Si
Quantity | Value | Units | Method | Reference | Comment |
---|---|---|---|---|---|
ΔrH° | 358.1 ± 5.2 | kcal/mol | D-EA | Kawamata, Neigishi, et al., 1996 | gas phase; Vertical Detachment Energy: 2.76±0.05 eV.; B |
Quantity | Value | Units | Method | Reference | Comment |
ΔrG° | 350.4 ± 5.3 | kcal/mol | H-TS | Kawamata, Neigishi, et al., 1996 | gas phase; Vertical Detachment Energy: 2.76±0.05 eV.; B |
References
Go To: Top, Reaction thermochemistry data, Gas phase ion energetics data, Notes
Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.
Kawamata, Neigishi, et al., 1996
Kawamata, H.; Neigishi, Y.; Kishi, R.; Iwata, S.; Nakajima, A.; Kaya, K.,
Photoelectron Spectroscopy of Silicon-Fluorine Binary Cluster Anions (SinFm-),
J. Chem. Phys., 1996, 105, 13, 5369, https://doi.org/10.1063/1.472377
. [all data]
Farber and Srivastava, 1977
Farber, M.; Srivastava, R.D.,
Mass spectrometric determination of the heats of formation of the silane fluorides,
Chem. Phys. Lett., 1977, 51, 307. [all data]
Cradock, Ebsworth, et al., 1973
Cradock, S.; Ebsworth, E.A.V.; Whiteford, R.A.,
Photoelectron spectra of some simple fluorosilanes,
J. Chem. Soc. Dalton Trans., 1973, 22, 2401. [all data]
Demuth, 1977
Demuth, R.,
Photoelektronenspektren von einigen Trihalogensilylphosphanen und -arsanen X3SiER2 (X = F, Cl; E = N, P, As; R = H, CH3),
Z. Naturforsch. B:, 1977, 32, 1252. [all data]
Sharp and Margrave, 1969
Sharp, K.G.; Margrave, J.L.,
Silicon-fluorine chemistry. VII. The reaction of silicon difluoride with hydrogen sulfide,
Inorg. Chem., 1969, 8, 2655. [all data]
Notes
Go To: Top, Reaction thermochemistry data, Gas phase ion energetics data, References
- Symbols used in this document:
AE Appearance energy ΔrG° Free energy of reaction at standard conditions ΔrH° Enthalpy of reaction at standard conditions - Data from NIST Standard Reference Database 69: NIST Chemistry WebBook
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