Trifluorosilane
- Formula: F3HSi
- Molecular weight: 86.0886
- IUPAC Standard InChI: InChI=1S/F3HSi/c1-4(2)3/h4H
- IUPAC Standard InChIKey: WPPVEXTUHHUEIV-UHFFFAOYSA-N
- CAS Registry Number: 13465-71-9
- Chemical structure:
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Gas phase ion energetics data
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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.
Data compiled as indicated in comments:
B - John E. Bartmess
LLK - Sharon G. Lias, Rhoda D. Levin, and Sherif A. Kafafi
RDSH - Henry M. Rosenstock, Keith Draxl, Bruce W. Steiner, and John T. Herron
Ionization energy determinations
| IE (eV) | Method | Reference | Comment |
|---|---|---|---|
| 11. ± 1. | EI | Farber and Srivastava, 1977 | LLK |
| 14.0 | PE | Cradock, Ebsworth, et al., 1973 | LLK |
| 14.48 ± 0.05 | PE | Demuth, 1977 | Vertical value; LLK |
| 14.48 ± 0.02 | PE | Cradock, Ebsworth, et al., 1973 | Vertical value; LLK |
Appearance energy determinations
| Ion | AE (eV) | Other Products | Method | Reference | Comment |
|---|---|---|---|---|---|
| SiHF2+ | 13.4 ± 0.3 | F | EI | Sharp and Margrave, 1969 | RDSH |
De-protonation reactions
F3Si- + =
By formula: F3Si- + H+ = HF3Si
| Quantity | Value | Units | Method | Reference | Comment |
|---|---|---|---|---|---|
| ΔrH° | 1498. ± 22. | kJ/mol | D-EA | Kawamata, Neigishi, et al., 1996 | gas phase; Vertical Detachment Energy: 2.76±0.05 eV.; B |
| Quantity | Value | Units | Method | Reference | Comment |
| ΔrG° | 1466. ± 22. | kJ/mol | H-TS | Kawamata, Neigishi, et al., 1996 | gas phase; Vertical Detachment Energy: 2.76±0.05 eV.; B |
References
Go To: Top, Gas phase ion energetics data, Notes
Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.
Farber and Srivastava, 1977
Farber, M.; Srivastava, R.D.,
Mass spectrometric determination of the heats of formation of the silane fluorides,
Chem. Phys. Lett., 1977, 51, 307. [all data]
Cradock, Ebsworth, et al., 1973
Cradock, S.; Ebsworth, E.A.V.; Whiteford, R.A.,
Photoelectron spectra of some simple fluorosilanes,
J. Chem. Soc. Dalton Trans., 1973, 22, 2401. [all data]
Demuth, 1977
Demuth, R.,
Photoelektronenspektren von einigen Trihalogensilylphosphanen und -arsanen X3SiER2 (X = F, Cl; E = N, P, As; R = H, CH3),
Z. Naturforsch. B:, 1977, 32, 1252. [all data]
Sharp and Margrave, 1969
Sharp, K.G.; Margrave, J.L.,
Silicon-fluorine chemistry. VII. The reaction of silicon difluoride with hydrogen sulfide,
Inorg. Chem., 1969, 8, 2655. [all data]
Kawamata, Neigishi, et al., 1996
Kawamata, H.; Neigishi, Y.; Kishi, R.; Iwata, S.; Nakajima, A.; Kaya, K.,
Photoelectron Spectroscopy of Silicon-Fluorine Binary Cluster Anions (SinFm-),
J. Chem. Phys., 1996, 105, 13, 5369, https://doi.org/10.1063/1.472377
. [all data]
Notes
Go To: Top, Gas phase ion energetics data, References
- Symbols used in this document:
AE Appearance energy ΔrG° Free energy of reaction at standard conditions ΔrH° Enthalpy of reaction at standard conditions - Data from NIST Standard Reference Database 69: NIST Chemistry WebBook
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