Silicon tetrachloride

• Formula: Cl₄Si
• Molecular weight: 169.898
• IUPAC Standard InChI: InChI=1S/Cl4Si/c1-5(2,3)4 Copy

  
• IUPAC Standard InChIKey: FDNAPBUWERUEDA-UHFFFAOYSA-N Copy
• CAS Registry Number: 10026-04-7
• Chemical structure:
  This structure is also available as a 2d Mol file or as a computed 3d SD file
  The 3d structure may be viewed using Java or Javascript.
• Other names: Silane, tetrachloro-; Silicon chloride (SiCl4); Tetrachlorosilane; Tetrachlorosilicon; SiCl4; Silicon chloride; Silicon(IV) chloride; Chlorid kremicity; Extrema; Silicio(tetracloruro di); Siliciumtetrachlorid; Siliciumtetrachloride; Silicium(tetrachlorure de); Tetrachlorure de silicium; UN 1818; SIC-L(TM)
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• Information on this page:
  • Phase change data
  • Gas Chromatography
  • References
  • Notes
• Other data available:
  • Gas phase thermochemistry data
  • Reaction thermochemistry data
  • Gas phase ion energetics data
  • Ion clustering data
  • IR Spectrum
  • Mass spectrum (electron ionization)
  • Vibrational and/or electronic energy levels
• Data at other public NIST sites:
  • Gas Phase Kinetics Database
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Phase change data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled as indicated in comments:
BS - Robert L. Brown and Stephen E. Stein
TRC - Thermodynamics Research Center, NIST Boulder Laboratories, Chris Muzny director
AC - William E. Acree, Jr., James S. Chickos

Enthalpy of vaporization

Antoine Equation Parameters

log₁₀(P) = A − (B / (T + C))
    P = vapor pressure (atm)
    T = temperature (K)

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Enthalpy of sublimation

Enthalpy of fusion

Gas Chromatography

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled by: NIST Mass Spectrometry Data Center, William E. Wallace, director

Kovats' RI, non-polar column, isothermal

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Normal alkane RI, non-polar column, custom temperature program

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References

Go To: Top, Phase change data, Gas Chromatography, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

PCR Inc., 1990
PCR Inc., Research Chemicals Catalog 1990-1991, PCR Inc., Gainesville, FL, 1990, 1. [all data]

Rugina, Gaspar, et al., 1987
Rugina, T.; Gaspar, M.; Sacarescu, L., Liquid-vapor equilibrium for a binary system of dichlorodimethyl-silane with trichloromethylsilane, chloromethylsilane and silicontetrachloride., Rev. Chim. (Bucharest), 1987, 38, 680. [all data]

Sauer and Hadsell, 1948
Sauer, R.O.; Hadsell, E.M., Azeotropes of Trimethylchlorosilane and Silicon Tetrachloride, J. Am. Chem. Soc., 1948, 70, 4258-9. [all data]

Anonymous, 1955
Anonymous, R., , Am. Pet. Inst. Res. Proj. 45, Tech. Rep. 14, No. 1, Ohio State Univ., 1955. [all data]

Parker and Robinson, 1927
Parker, T.W.; Robinson, P.L., Critical Temperatures of Boron Trichloride and Silicon Tetrachloride., J. Chem. Soc., 1927, 1927, 2977-81. [all data]

Jain and Yadav, 1973
Jain, D.V.S.; Yadav, O.P., Indian J. Chem., 1973, 11, 28. [all data]

Capková and Fried, 1964
Capková, A.; Fried, V., Gleichgewicht flüssigkeit-dampf im system tetrachlorsilan-trimethylchlorsilan, Collect. Czech. Chem. Commun., 1964, 29, 2, 336-340, https://doi.org/10.1135/cccc19640336 . [all data]

Jenkins and Chambers, 1954
Jenkins, Arthur C.; Chambers, George F., Vapor Pressures of Silicon Compounds, Ind. Eng. Chem., 1954, 46, 11, 2367-2369, https://doi.org/10.1021/ie50539a043 . [all data]

Kearby, 1936
Kearby, K., The Vapor Pressure of Silicon Tetrachloride, J. Am. Chem. Soc., 1936, 58, 2, 374-375, https://doi.org/10.1021/ja01293a503 . [all data]

Jain and Yadav, 1973, 2
Jain, D.V.S.; Yadav, O.P., Thermodynamics of n-Alkane Solutions: Part VIII - Vapour Pressures and Excess Free Energies for the SiCl₄/n-Hexane System, Indian J. Chem., 1973, 11, 28-30. [all data]

Balk and Dong, 1964
Balk, P.; Dong, D., The Vapor Pressures of Silicon Tetrachloride and Germanium Tetrachloride below Their Melting Points, J. Phys. Chem., 1964, 68, 4, 960-962, https://doi.org/10.1021/j100786a507 . [all data]

Devyatykh, Guesev, et al., 1985
Devyatykh, G.G.; Guesev, A.V.; Gibin, A.M.; Zhernenkov, N.V.; Zakharov, L.M.; Antipin, M.Yu.; Struchov, Yu.M.T., Russ. J. Inorg. Chem., 1985, 30, 780. [all data]

Kreshkov, Kirichenko, et al., 1975
Kreshkov, A.P.; Kirichenko, É.A.; Markov, B.A., Retention indices of alkoxychlorosilanes, Zh. Anal. Khim., 1975, 30, 2, 286-289. [all data]

Ainshtein and Shulyatieva, 1972
Ainshtein, A.A.; Shulyatieva, T.I., Retention indices of alkyl- and arylchlorosilanes, Zh. Anal. Khim., 1972, 27, 816-821. [all data]

Garzó, Fekete, et al., 1967
Garzó, G.; Fekete, J.; Blazsó, M., Determination of the gas chromatographic retention indices of various organometallic compounds, Acta Chim. Acad. Sci. Hung., 1967, 51, 4, 359-369. [all data]

Yu and Yang, 2005
Yu, X.; Yang, D., Predicting the Kovats retention index for alkoxyl silicon chlorides and sulfides on stationary phases of different polarity, Fenxi Huaxue, 2005, 33, 1, 101-105. [all data]

Notes

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• Symbols used in this document:
  

  Tboil	Boiling point
  Tc	Critical temperature
  Tfus	Fusion (melting) point
  ΔfusH	Enthalpy of fusion
  ΔsubH	Enthalpy of sublimation
  ΔvapH	Enthalpy of vaporization

• Data from NIST Standard Reference Database 69: NIST Chemistry WebBook
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