Si6

Gas phase ion energetics data

EA (eV)	Method	Reference	Comment
2.390 ± 0.010	N/A	Peppernick, Gunaratne, et al., 2010	Stated electron affinity is the Vertical Detachment Energy
2.000 ± 0.020	LPES	Kishi, Kawamata, et al., 1997	Vertical Detachment Energy: 2.32±.03 eV
2.08 ± 0.14	LPES	Kawamata, Neigishi, et al., 1996	Vertical Detachment Energy: 2.40±0.05 eV.
1.73 ± 0.15	LPES	Nakajima, Taguwa, et al., 1995	Vertical Detachment Energy: 2.23±0.08 eV.
1.80 ± 0.20	LPES	Cheshnovsky, Yang, et al., 1987	EA given is Vertical Detachment Energy. Adiabatic EA est as up to 1 eV smaller
<3.70 ± 0.55	IMRB	Mandich, Bondybey, et al., 1987	The values from this reference are ca. 0.4-0.8 eV more bound than from other references
<2.33997	LPD	Liu, Zhang, et al., 1986	EA given is Vertical Detachment Energy. Thought to be considerably greater than adiabatic.

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Peppernick, Gunaratne, et al., 2010
Peppernick, S.J.; Gunaratne, K.D.D.; Sayres, S.G.; Castleman, A.W., Photoelectron imaging of small silicon cluster anions, Si-n- (n=2-7), J. Chem. Phys., 2010, 132, 4, 044302, https://doi.org/10.1063/1.3299271 . [all data]

Kishi, Kawamata, et al., 1997
Kishi, R.; Kawamata, H.; Neigishi, Y.; Iwata, S.; Nakajima, A.; Kaya, K., Geometric and Electronic Structures of Silicon-Sodium Binary Clusters. II. Photoelectron Spectroscopy of SinNam Cluster Anions, J. Chem. Phys., 1997, 107, 23, 10029, https://doi.org/10.1063/1.474160 . [all data]

Kawamata, Neigishi, et al., 1996
Kawamata, H.; Neigishi, Y.; Kishi, R.; Iwata, S.; Nakajima, A.; Kaya, K., Photoelectron Spectroscopy of Silicon-Fluorine Binary Cluster Anions (SinFm-), J. Chem. Phys., 1996, 105, 13, 5369, https://doi.org/10.1063/1.472377 . [all data]

Nakajima, Taguwa, et al., 1995
Nakajima, A.; Taguwa, T.; Nakao, K.; Gomei, M.; Kishi, R.; Iwata, S.; Kaya, K., Photoelectron Spectroscopy of silicon-carbon cluster Anions (SinCm-), J. Chem. Phys., 1995, 103, 6, 2050, https://doi.org/10.1063/1.469731 . [all data]

Cheshnovsky, Yang, et al., 1987
Cheshnovsky, O.; Yang, S.H.; Pettiette, C.L.; Craycraft, M.J.; Liu, Y.; Smalley, R.E., Ultraviolet Photoelectron Spectroscopy of Semiconductor Clusters: Silicon and Germanium, Chem. Phys. Lett., 1987, 138, 2-3, 119, https://doi.org/10.1016/0009-2614(87)80353-6 . [all data]

Mandich, Bondybey, et al., 1987
Mandich, M.L.; Bondybey, V.E.; Reents, W.D., Reactive Etching of Positive and Negative Silicon Cluster Ions by Nitrogen Dioxide, J. Chem. Phys., 1987, 86, 7, 4245, https://doi.org/10.1063/1.451885 . [all data]

Liu, Zhang, et al., 1986
Liu, Y.; Zhang, Q.-L.; Tittel, F.K.; Curl, R.F.; Smalley, R.E., Photodetachment and Photofragmentation Studies of Semiconductor Cluster Anions, J. Chem. Phys., 1986, 85, 12, 7434, https://doi.org/10.1063/1.451332 . [all data]

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Symbols used in this document:

EA Electron affinity
Data from NIST Standard Reference Database 69: NIST Chemistry WebBook
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