Acetic acid

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Normal alkane RI, polar column, temperature ramp

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled by: NIST Mass Spectrometry Data Center, William E. Wallace, director

Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase HP-FFAPHP-FFAPDB-WaxDB-FFAPFFAP
Column length (m) 25.25.60.30.60.
Carrier gas HeliumHeliumHeliumHeliumHelium
Substrate      
Column diameter (mm) 0.320.320.250.320.25
Phase thickness (μm) 0.500.500.250.250.25
Tstart (C) 45.45.50.50.45.
Tend (C) 220.220.220.250.220.
Heat rate (K/min) 15.15.3.4.5.
Initial hold (min)   2.4.1.
Final hold (min)   20.5.5.
I 1465.1476.1431.1465.1429.
ReferenceWanakhachornkrai and Lertsiri, 9999Wanakhachornkrai and Lertsiri, 9999Onishi, Inoue, et al., 2011Osorio, Carriazo, et al., 2011Piyachaiseth, Jirapakkul, et al., 2011
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxTC-WaxDB-WaxFFAPDB-FFAP
Column length (m) 30.60.60.30.30.
Carrier gas HeliumHeliumHeliumHelium 
Substrate      
Column diameter (mm) 0.250.250.250.320.32
Phase thickness (μm) 0.25 0.500.250.25
Tstart (C) 40.40.40.40.0.
Tend (C) 210.230.210.240.200.
Heat rate (K/min) 3.3.2.6.6.
Initial hold (min)  3.5.2.2.
Final hold (min)   70.  
I 1439.1455.1465.1450.1450.
ReferenceKumazawa, Sakai, et al., 2010Miyazawa, Fujita, et al., 2010Moon and Shibamoto, 2010Christlbauer and Schieberle, 2009Laselan, Buettner, et al., 2009
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase CP-WaxDB-WaxDB-WaxDB-WaxDB-Wax
Column length (m) 60.60.30.30.30.
Carrier gas HeliumHeliumHeliumHeliumHelium
Substrate      
Column diameter (mm) 0.250.250.250.250.25
Phase thickness (μm) 0.250.500.250.250.25
Tstart (C) 50.40.40.40.60.
Tend (C) 230.210.230.180.250.
Heat rate (K/min) 6.2.3.3.510.
Initial hold (min) 2.5.2.10.2.
Final hold (min) 15.70.5.30.10.
I 1445.1468.1441.1464.1425.
ReferenceMo, Fan, et al., 2009Moon and Shibamoto, 2009Zhao, Xu, et al., 2009Caldeira, de Sousa, et al., 2008Guo, Wu, et al., 2008
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxHP-InnowaxHP-InnowaxCP Wax 52 CBStabilwax
Column length (m) 30.50.30.60.60.
Carrier gas HeliumHeliumHeliumHeliumHelium
Substrate      
Column diameter (mm) 0.250.200.250.250.25
Phase thickness (μm) 0.250.200.250.250.25
Tstart (C) 60.45.50.40.40.
Tend (C) 250.190.250.220.240.
Heat rate (K/min) 10.4.6.53.3.
Initial hold (min) 2.2.1.5 5.
Final hold (min) 10.50.10. 10.
I 1425.1471.1460.1436.1453.
ReferenceGuo, Wu, et al., 2008Soria, Sanz, et al., 2008Thakeow, Angeli, et al., 2008Chen, Chyau, et al., 2007Cros, Vandanjon, et al., 2007
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxFFAPCP-Wax 52CBRTX-WaxDB-Wax
Column length (m) 30.30.60.30.30.
Carrier gas HeN2HeHeHe
Substrate      
Column diameter (mm) 0.320.320.320.250.25
Phase thickness (μm) 0.50.50.50.50.25
Tstart (C) 40.35.40.40.40.
Tend (C) 240.320.220.220.230.
Heat rate (K/min) 5.4.4.10.4.
Initial hold (min)  5.8.5.2.
Final hold (min)  45.20.10.5.
I 1469.1478.1462.1436.1424.
ReferenceDury-Brun, Fournier, et al., 2007Nebesny, Budryn, et al., 2007Povolo, Contarini, et al., 2007Prososki, Etzel, et al., 2007Xu, Fan, et al., 2007
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxDB-WaxHP-InnowaxDB-Wax
Column length (m) 60.30.30.30.60.
Carrier gas HeHeN2He 
Substrate      
Column diameter (mm) 0.250.320.320.250.25
Phase thickness (μm) 0.50.250.250.50.25
Tstart (C) 50.40.40.40.70.
Tend (C) 230.230.230.200.230.
Heat rate (K/min) 3.4.6.2.2.
Initial hold (min) 2.2.2.3.2.
Final hold (min) 20.15.15.15.20.
I 1448.1424.1473.1433.1449.
ReferenceCai, Lin, et al., 2006Fan and Qian, 2006Fan and Qian, 2006, 2Komes, Ulrich, et al., 2006Lan Phi N.T., Nishiyama C., et al., 2006
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-Wax EtrZB-WaxDB-WaxCarbowax 20MStabilwax
Column length (m) 30.60.30.50.30.
Carrier gas HeHeN2Helium 
Substrate      
Column diameter (mm) 0.250.320.320.250.32
Phase thickness (μm) 0.250.50.250.250.5
Tstart (C) 40.40.40.40.40.
Tend (C) 220.250.230.190.280.
Heat rate (K/min) 2.3.4.4.6.
Initial hold (min) 1.2.2.2.5.
Final hold (min) 10.10.5.30.5.
I 1485.1477.1473.1458.1409.
ReferencePerestrelo, Fernandes, et al., 2006Wierda R.L., Fletcher G., et al., 2006Fan and Qian, 2005de la Fuente, Martinez-Castro, et al., 2005Jirovetz, Buchbauer, et al., 2005
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Stabilwax DADB-WaxZB-WaxZB-WaxPEG-20M
Column length (m) 60.60.30.30.30.
Carrier gas  NitrogenHeliumHelium 
Substrate      
Column diameter (mm) 0.250.320.320.320.25
Phase thickness (μm) 0.50.500.250.25 
Tstart (C) 40.35.40.40.60.
Tend (C) 180.235.250.250.180.
Heat rate (K/min) 5.2.5.5.3.
Initial hold (min) 5.4.2.2.10.
Final hold (min)  30.5.5.30.
I 1470.1471.1454.1466.1466.
ReferenceNogueira, Lubachevsky, et al., 2005Qian and Wang, 2005N/AN/AYao, Guo, et al., 2005
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxTC-WaxDB-WaxDB-Wax
Column length (m) 60.30.60.60.60.
Carrier gas  H2HeHeHe
Substrate      
Column diameter (mm) 0.250.320.250.250.25
Phase thickness (μm) 0.50.50.5  
Tstart (C) 35.40.40.60.60.
Tend (C) 240.200.230.220.220.
Heat rate (K/min) 4.4.3.2.2.
Initial hold (min) 5.5.8.4.4.
Final hold (min) 10.    
I 1457.1477.1455.1448.1448.
ReferenceChida, Sone, et al., 2004Culleré, Escudero, et al., 2004Ishikawa, Ito, et al., 2004Jiang and Kubota, 2004Jiang and Kubota, 2004
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxHP-FFAPHP-InnowaxDB-WaxDB-Wax
Column length (m) 60.30.50.30.30.
Carrier gas HeHeHeHeH2
Substrate      
Column diameter (mm) 0.250.250.20.250.25
Phase thickness (μm) 0.250.250.20.250.5
Tstart (C) 40.40.45.50.50.
Tend (C) 220.120.190.180.200.
Heat rate (K/min) 3.5.4.3.3.
Initial hold (min) 5.5.2. 10.
Final hold (min)  3.50.40.10.
I 1466.1463.1471.1455.1474.
ReferenceLópez, Ezpeleta, et al., 2004López, Guzmán, et al., 2004Soria, Gonzalez, et al., 2004Yanagimoto, Ochi, et al., 2004Alves and Franco, 2003
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase StabilwaxDB-WaxDB-WaxDB-WaxDB-Wax
Column length (m) 60.60.60.30.30.
Carrier gas HeliumH2HeHeHe
Substrate      
Column diameter (mm) 0.250.320.250.250.25
Phase thickness (μm) 0.250.250.250.250.25
Tstart (C) 40.40.40.40.40.
Tend (C) 240.230.210.210.185.
Heat rate (K/min) 3.4.3.3.4.
Initial hold (min) 5.5.  4.
Final hold (min) 10.25.  20.
I 1453.1449.1447.1454.1434.
ReferenceCros, Vandanjon, et al., 2003Dregus and Engel, 2003Kumazawa and Masuda, 2003Kumazawa and Masuda, 2003Lee and Noble, 2003
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxTC-WaxInnowaxDB-Wax
Column length (m) 30.30.60.60.30.
Carrier gas HeH2HeHe 
Substrate      
Column diameter (mm) 0.250.320.250.250.25
Phase thickness (μm) 0.250.5  0.25
Tstart (C) 50.40.80.60.30.
Tend (C) 230.200.250.220.250.
Heat rate (K/min) 3.4.4.4.4.
Initial hold (min) 2.5. 10.1.
Final hold (min) 20. 30.10. 
I 1451.1467.1459.1475.1451.
ReferenceLin, Cai, et al., 2003López, Ortín, et al., 2003Miyazawa and Okuno, 2003Suleimenov, Atazharova, et al., 2003Tanaka, Yamauchi, et al., 2003
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxSupelcowax-10Supelcowax-10HP-FFAPHP-FFAP
Column length (m) 30.30.30.25.25.
Carrier gas  HeHeHeHe
Substrate      
Column diameter (mm) 0.250.250.250.320.32
Phase thickness (μm) 0.250.250.250.50.5
Tstart (C) 30.40.40.45.45.
Tend (C) 250.200.200.220.220.
Heat rate (K/min) 4.3.3.15.15.
Initial hold (min) 1.10.10.  
Final hold (min)      
I 1451.1448.1442.1465.1476.
ReferenceTanaka, Yamauchi, et al., 2003Vichi, Castellote, et al., 2003Vichi, Pizzale, et al., 2003Wanakhachornkrai and Lertsiri, 2003Wanakhachornkrai and Lertsiri, 2003
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-FFAPBP-20DB-WaxDB-WaxRTX-Wax
Column length (m) 30.50.30.30.60.
Carrier gas HeH2H2HeHe
Substrate      
Column diameter (mm) 0.320.250.320.250.25
Phase thickness (μm) 0.250.250.50.250.5
Tstart (C) 40.45.40.40.40.
Tend (C) 230.230.200.250.180.
Heat rate (K/min) 6.3.4.8.5.
Initial hold (min) 2.1.5.5.5.
Final hold (min) 10.10. 5.20.
I 1443.1452.1461.1433.1451.
ReferenceCzerny and Schieberle, 2002Darriet, Pons, et al., 2002Ferreira, Ortín, et al., 2002Fu, Yoon, et al., 2002Galindo-Cuspinera, Lubran, et al., 2002
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase FFAPTC-WAX FFSDB-WaxDB-WaxHP-FFAP
Column length (m) 30.60.30.30.25.
Carrier gas HeHeHeHe 
Substrate      
Column diameter (mm) 0.320.250.250.250.32
Phase thickness (μm) 1. 0.250.250.52
Tstart (C) 35.60.50.50.60.
Tend (C) 240.240.220.220.240.
Heat rate (K/min) 5.3.4.4.5.
Initial hold (min) 3. 4.4.1.
Final hold (min)   20.20.5.
I 1410.1453.1415.1432.1460.
ReferenceLecanu, Ducruet, et al., 2002Miyazawa, Maehara, et al., 2002Osorio, Duque, et al., 2002Osorio, Duque, et al., 2002Qian and Reineccius, 2002
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase HP-WaxTC-WaxDB-WaxDB-WaxEC-1000
Column length (m) 60.60.60.30.30.
Carrier gas HeHeHeH2He
Substrate      
Column diameter (mm) 0.250.250.250.320.25
Phase thickness (μm) 0.50.250.250.50.25
Tstart (C) 40.40.40.40.35.
Tend (C) 190.230.200.200.230.
Heat rate (K/min) 3.3.2.4.5.
Initial hold (min) 6.10.2.5.5.
Final hold (min)  10. 60.15.
I 1480.1424.1437.1452.1455.
ReferenceSanz, Maeztu, et al., 2002Suhardi, Suzuki, et al., 2002Umano, Hagi, et al., 2002Aznar, López, et al., 2001Bendall, 2001
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxHP-WaxTC-WaxHP-Wax
Column length (m) 30.30.60.60.60.
Carrier gas HeliumH2HeHeHe
Substrate      
Column diameter (mm) 0.250.320.250.250.25
Phase thickness (μm) 0.250.50.5 0.5
Tstart (C) 25.40.40.80.40.
Tend (C) 220.200.190.250.190.
Heat rate (K/min) 4.4.3.4.3.
Initial hold (min)  5.6. 6.
Final hold (min) 30.60. 47. 
I 1422.1452.1480.1441.1480.
ReferenceDuque, Bonilla, et al., 2001Ferreira, Aznar, et al., 2001Maeztu, Sanz, et al., 2001Miyazawa, Kurose, et al., 2001Sanz, Ansorena, et al., 2001
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-FFAPDB-WaxDB-WaxDB-WaxDB-Wax
Column length (m) 30.30.60.60.30.
Carrier gas HeHeHe He
Substrate      
Column diameter (mm) 0.320.250.250.250.2
Phase thickness (μm) 0.250.250.250.25 
Tstart (C) 40.50.40.30.50.
Tend (C) 195.220.200.170.180.
Heat rate (K/min) 5.4.2.2.3.
Initial hold (min) 5.3. 4.8.
Final hold (min) 40.  30. 
I 1452.1451.1435.1440.1465.
ReferenceSuriyaphan, Drake, et al., 2001Weckerle, Bastl-Borrmann, et al., 2001Wei, Mura, et al., 2001Buttery, Light, et al., 2000Franco and Shibamoto, 2000
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxDB-WaxDB-WaxDB-Wax
Column length (m) 30.30.30.30.60.
Carrier gas H2H2HeHeNitrogen
Substrate      
Column diameter (mm) 0.320.320.250.250.25
Phase thickness (μm) 0.50.50.250.25 
Tstart (C) 60.60.50.50.40.
Tend (C) 245.245.240.240.200.
Heat rate (K/min) 3.3.4.4.2.
Initial hold (min) 3.3.3.3.10.
Final hold (min) 20.20.10.10. 
I 1449.1449.1424.1430.1457.
ReferenceKotseridis and Baumes, 2000Kotseridis and Baumes, 2000Parada, Duque, et al., 2000Parada, Duque, et al., 2000Tamura, Boonbumrung, et al., 2000
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Carbowax 20MCP-Wax 52CBDB-WaxDB-WaxCarbowax 20M
Column length (m) 25.50.30.30.60.
Carrier gas HeH2  He
Substrate      
Column diameter (mm) 0.30.320.530.530.32
Phase thickness (μm)  0.22  0.5
Tstart (C) 60.60.60.60.40.
Tend (C) 190.190.210.210.190.
Heat rate (K/min) 5.2.4.4.2.
Initial hold (min) 2.4.  5.
Final hold (min) 20.21.   
I 1432.1450.1450.1449.1454.
ReferenceXue, Ye, et al., 2000Hwan and Chou, 1999Iwatsuki, Mizota, et al., 1999Iwatsuki, Mizota, et al., 1999Lopez, Ferreira, et al., 1999
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxSupelcowax-10Carbowax 20MDB-Wax
Column length (m) 60.60.60.50.30.
Carrier gas He H2HeHe
Substrate      
Column diameter (mm) 0.250.250.320.250.25
Phase thickness (μm) 0.25 0.50.250.25
Tstart (C) 60.30.35.35.50.
Tend (C) 240.170.250.230.240.
Heat rate (K/min) 4.2.5.3.4.
Initial hold (min)  4.5. 3.
Final hold (min)  30.20.30.10.
I 1460.1440.1470.1430.1424.
ReferenceNgassoum, Yonkeu, et al., 1999Buttery and Ling, 1998Campeanu, Burcea, et al., 1998Chatonnet and Dubourdieu, 1998Parada and Duque, 1998
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxInnowaxPEG-20MDB-WaxDB-Wax
Column length (m) 30.30.60.60.60.
Carrier gas He HeHeHe
Substrate      
Column diameter (mm) 0.250.250.250.250.25
Phase thickness (μm) 0.250.25   
Tstart (C) 50.40.70.60.50.
Tend (C) 240.240.210.180.200.
Heat rate (K/min) 4.6.3.2.3.
Initial hold (min) 3.10.   
Final hold (min) 10.25.  40.
I 1446.1451.1430.1445.1459.
ReferenceParada and Duque, 1998Petersen, Poll, et al., 1998Awano, Honda, et al., 1997Sekiwa, Kubota, et al., 1997Wada and Shibamoto, 1997
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase PEG-20MTC-WaxSupelcowax-10DB-WaxDB-Wax
Column length (m) 50.60.60.30.60.
Carrier gas Nitrogen He He
Substrate      
Column diameter (mm) 0.250.250.250.250.25
Phase thickness (μm) 0.25 0.250.25 
Tstart (C) 60.80.40.20.40.
Tend (C) 180.240.200.230.200.
Heat rate (K/min) 2.3.3.5.2.
Initial hold (min)  5.3.1.2.
Final hold (min)   30.  
I 1415.1460.1488.1418.1448.
ReferenceKubota, Matsujage, et al., 1996Shuichi, Masazumi, et al., 1996Wong and Lai, 1996Christensen and Reineccius, 1995Umano, Hagi, et al., 1995
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Carbowax 20MDB-WaxCarbowax 20MCarbowax 20MPEG-20M
Column length (m) 50.30.50.50.50.
Carrier gas HeHeHeHeN2
Substrate      
Column diameter (mm) 0.250.250.330.250.25
Phase thickness (μm)      
Tstart (C) 60.60.60.60.60.
Tend (C) 180.240.200.180.180.
Heat rate (K/min) 2.3.3.2.2.
Initial hold (min) 4.10. 4. 
Final hold (min)      
I 1405.1410.1410.1405.1417.
ReferenceKawakami, Kobayashi, et al., 1993Hatsuko, Kazuko, et al., 1992Vernin, Metzger, et al., 1992Kawakami and Kobayashi, 1991Kubota, Nakamoto, et al., 1991
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxSupelcowax-10Carbowax 20MCarbowax 20MCarbowax 20M
Column length (m) 60.60.50.50.50.
Carrier gas  HeN2N2N2
Substrate      
Column diameter (mm) 0.320.250.220.220.22
Phase thickness (μm)  0.25   
Tstart (C) 50.40.80.80.80.
Tend (C) 230.175.200.200.200.
Heat rate (K/min) 4.1.3.3.3.
Initial hold (min) 0.15.   
Final hold (min) 10.    
I 1451.1471.1403.1413.1403.
ReferenceBinder, Flath, et al., 1989Hsieh, Williams, et al., 1989Mihara, Tateba, et al., 1988Mihara, Tateba, et al., 1988Mihara, Tateba, et al., 1988
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Carbowax 20MFFAPFFAPCarbowax 20MCarbowax 20M
Column length (m) 50.50.50.50.50.
Carrier gas N2HeHeN2N2
Substrate      
Column diameter (mm) 0.220.280.280.220.22
Phase thickness (μm)      
Tstart (C) 80.60.60.80.80.
Tend (C) 200.240.240.200.200.
Heat rate (K/min) 3.2.2.3.3.
Initial hold (min)  5.5.  
Final hold (min)      
I 1413.1425.1425.1403.1413.
ReferenceMihara, Tateba, et al., 1988Vernin, Metzger, et al., 1988Vernin, Metzger, et al., 1988Mihara, Tateba, et al., 1987Mihara, Tateba, et al., 1987
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillary
Active phase Carbowax 20MCarbowax 20MCarbowax 20MCarbowax 20M
Column length (m) 50.50.150.150.
Carrier gas N2N2  
Substrate     
Column diameter (mm) 0.220.220.640.64
Phase thickness (μm)     
Tstart (C) 80.80.50.50.
Tend (C) 200.200.170.170.
Heat rate (K/min) 3.3.1.1.
Initial hold (min)    30.
Final hold (min)   30.60.
I 1403.1413.1430.1430.
ReferenceMihara, Tateba, et al., 1987Mihara, Tateba, et al., 1987Buttery, Kamm, et al., 1984Buttery, Ling, et al., 1983
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI

References

Go To: Top, Normal alkane RI, polar column, temperature ramp, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Wanakhachornkrai and Lertsiri, 9999
Wanakhachornkrai, P.; Lertsiri, S., Comparison of determination method for volatile compounds in Thai soy sauce, Analytical, Nutritional and Clinical Methods, 9999, 1-11. [all data]

Onishi, Inoue, et al., 2011
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Notes

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