Hexanoic acid

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Normal alkane RI, polar column, temperature ramp

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled by: NIST Mass Spectrometry Data Center, William E. Wallace, director

Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase HP-FFAPFFAPVF-Wax MSDB-WaxDB-Wax
Column length (m) 25.60.60.30.60.
Carrier gas HeliumHeliumHeliumHeliumHelium
Substrate      
Column diameter (mm) 0.320.250.250.250.25
Phase thickness (μm) 0.500.250.250.250.50
Tstart (C) 45.45.60.40.40.
Tend (C) 220.220.220.210.210.
Heat rate (K/min) 15.5.3.3.2.
Initial hold (min)  1.5. 5.
Final hold (min)  5.25. 70.
I 1864.1824.1841.1842.1871.
ReferenceWanakhachornkrai and Lertsiri, 9999Piyachaiseth, Jirapakkul, et al., 2011Duarte, Dias, et al., 2010Kumazawa, Sakai, et al., 2010Moon and Shibamoto, 2010
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase CP Wax 52 CBDB-WaxCP-WaxHP-20MHP-20M
Column length (m) 30.30.60.50.50.
Carrier gas HeliumHeliumHeliumHeliumHelium
Substrate      
Column diameter (mm) 0.320.320.250.250.25
Phase thickness (μm) 0.500.250.250.250.25
Tstart (C) 40. 50.70.70.
Tend (C) 230.240.230.180.180.
Heat rate (K/min) 4.6.6.4.4.
Initial hold (min) 2. 2.4.4.
Final hold (min) 15.5.15.  
I 1848.1800.1820.1860.1875.
ReferenceBirtic, Ginies, et al., 2009Mallia, Escher, et al., 2009Mo, Fan, et al., 2009Blazevic and Mastelic, 2008Blazevic and Mastelic, 2008
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxHP-InnowaxHP-InnowaxCP-Wax 52CB
Column length (m) 30.30.50.30.30.
Carrier gas HeliumHeliumHeliumHeliumHe
Substrate      
Column diameter (mm) 0.250.250.200.25 
Phase thickness (μm) 0.250.250.200.250.32
Tstart (C) 40.60.45.50.50.
Tend (C) 180.250.190.250.220.
Heat rate (K/min) 3.510.4.6.56.
Initial hold (min) 10.2.2.1.52.
Final hold (min) 30.10.50.10.20.
I 1867.1851.1862.1843.1842.
ReferenceCaldeira, de Sousa, et al., 2008Guo, Wu, et al., 2008Soria, Sanz, et al., 2008Thakeow, Angeli, et al., 2008Audino, Alzogaray, et al., 2007
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase StabilwaxDB-WaxCP-Wax 52CBCP-Wax 52CBRTX-Wax
Column length (m) 60.30.60.60.30.
Carrier gas HeliumHeHeHeHe
Substrate      
Column diameter (mm) 0.250.320.320.320.25
Phase thickness (μm) 0.250.50.50.50.5
Tstart (C) 40.40.40.40.40.
Tend (C) 240.240.220.220.220.
Heat rate (K/min) 3.5.4.4.10.
Initial hold (min) 5. 8.8.5.
Final hold (min) 10. 20.20.10.
I 1848.1870.1845.1846.1828.
ReferenceCros, Vandanjon, et al., 2007Dury-Brun, Fournier, et al., 2007Povolo, Contarini, et al., 2007Povolo, Contarini, et al., 2007Prososki, Etzel, et al., 2007
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase BP-20DB-WaxDB-WaxDB-WaxDB-Wax
Column length (m) 30.30.30.30.30.
Carrier gas HeHeHeHeN2
Substrate      
Column diameter (mm) 0.250.250.250.320.32
Phase thickness (μm) 0.250.250.250.250.25
Tstart (C) 70.40.40.40.40.
Tend (C) 220.230.230.230.230.
Heat rate (K/min) 4.4.4.4.6.
Initial hold (min) 4.2.2.2.2.
Final hold (min) 5.5.5.15.15.
I 1864.1846.1846.1846.1866.
ReferenceRawat, Gulati, et al., 2007Xu, Fan, et al., 2007Xu, Fan, et al., 2007Fan and Qian, 2006Fan and Qian, 2006, 2
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-Wax EtrDB-WaxHP-InnowaxDB-Wax EtrZB-Wax
Column length (m) 60.15.30.30.60.
Carrier gas HeHeHeHeHe
Substrate      
Column diameter (mm) 0.250.320.250.250.32
Phase thickness (μm) 0.250.250.50.250.5
Tstart (C) 40.40.40.40.40.
Tend (C) 230.230.200.220.250.
Heat rate (K/min) 2.6.2.2.3.
Initial hold (min) 5. 3.1.2.
Final hold (min) 100.20.15.10.10.
I 1866.1838.1833.1882.1866.
ReferenceIbarz, Ferreira, et al., 2006Kishimoto, Wanikawa, et al., 2006Komes, Ulrich, et al., 2006Perestrelo, Fernandes, et al., 2006Wierda R.L., Fletcher G., et al., 2006
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxCarbowax 20MStabilwax DADB-WaxZB-Wax
Column length (m) 30.50.60.60.30.
Carrier gas N2Helium NitrogenHelium
Substrate      
Column diameter (mm) 0.320.250.250.320.32
Phase thickness (μm) 0.250.250.50.500.25
Tstart (C) 40.40.40.35.40.
Tend (C) 230.190.180.235.250.
Heat rate (K/min) 4.4.5.2.5.
Initial hold (min) 2.2.5.4.2.
Final hold (min) 5.30. 30.5.
I 1857.1852.1873.1874.1849.
ReferenceFan and Qian, 2005de la Fuente, Martinez-Castro, et al., 2005Nogueira, Lubachevsky, et al., 2005Qian and Wang, 2005N/A
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase ZB-WaxZB-WaxZB-WaxZB-WaxZB-Wax
Column length (m) 30.30.30.30.30.
Carrier gas HeliumHeliumHeliumHeliumHe
Substrate      
Column diameter (mm) 0.320.320.320.320.32
Phase thickness (μm) 0.250.250.250.250.25
Tstart (C) 40.40.40.40.40.
Tend (C) 250.250.250.250.250.
Heat rate (K/min) 5.5.5.5.5.
Initial hold (min) 2.2.2.2.2.
Final hold (min) 5.5.5.5.10.
I 1858.1861.1865.1866.1858.
ReferenceN/AN/AN/AN/AWu, Krings, et al., 2005
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase PEG-20MDB-WaxDB-WaxDB-WaxPEG-20M
Column length (m) 30.30.60.60.50.
Carrier gas  H2HeHe 
Substrate      
Column diameter (mm) 0.250.320.250.250.20
Phase thickness (μm)  0.5 0.250.20
Tstart (C) 60.40.60.40.40.
Tend (C) 180.200.220.220.180.
Heat rate (K/min) 3.4.2.3.3.
Initial hold (min) 10.5.4.5.5.
Final hold (min) 30.   30.
I 1868.1872.1842.1860.1804.
ReferenceYao, Guo, et al., 2005Culleré, Escudero, et al., 2004Jiang and Kubota, 2004López, Ezpeleta, et al., 2004Narain, Almeida, et al., 2004
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase HP-InnowaxDB-WaxStabilwaxDB-WaxDB-Wax
Column length (m) 50.30.60.60.30.
Carrier gas HeH2HeliumH2He
Substrate      
Column diameter (mm) 0.20.250.250.320.25
Phase thickness (μm) 0.20.50.250.250.25
Tstart (C) 45.50.40.40.40.
Tend (C) 190.200.240.230.185.
Heat rate (K/min) 4.3.3.4.4.
Initial hold (min) 2.10.5.5.4.
Final hold (min) 50.10.10.25.20.
I 1869.1861.1848.1846.1840.
ReferenceSoria, Gonzalez, et al., 2004Alves and Franco, 2003Cros, Vandanjon, et al., 2003Dregus and Engel, 2003Lee and Noble, 2003
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxTC-WaxDB-WaxDB-Wax
Column length (m) 30.30.60.30.30.
Carrier gas HeH2He  
Substrate      
Column diameter (mm) 0.250.320.250.250.25
Phase thickness (μm) 0.250.5 0.250.25
Tstart (C) 50.40.80.30.30.
Tend (C) 230.200.250.250.250.
Heat rate (K/min) 3.4.4.4.4.
Initial hold (min) 2.5. 1.1.
Final hold (min) 20. 30.  
I 1848.1869.1846.1849.1850.
ReferenceLin, Cai, et al., 2003López, Ortín, et al., 2003Miyazawa and Okuno, 2003Tanaka, Yamauchi, et al., 2003Tanaka, Yamauchi, et al., 2003
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Supelcowax-10Supelcowax-10Supelcowax-10HP-FFAPDB-FFAP
Column length (m) 30.30.30.25.30.
Carrier gas HeHeHeHeHe
Substrate      
Column diameter (mm) 0.250.250.250.320.32
Phase thickness (μm) 0.250.250.250.50.25
Tstart (C) 40.40.40.45.40.
Tend (C) 200.200.200.220.230.
Heat rate (K/min) 3.3.3.15.6.
Initial hold (min) 10.10.10. 2.
Final hold (min)     10.
I 1841.1836.1835.1864.1832.
ReferenceVichi, Castellote, et al., 2003Vichi, Pizzale, et al., 2003Vichi, Pizzale, et al., 2003, 2Wanakhachornkrai and Lertsiri, 2003Czerny and Schieberle, 2002
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxTC-WaxDB-WaxHP-FFAP
Column length (m) 30.30.60.60.25.
Carrier gas H2HeHe  
Substrate      
Column diameter (mm) 0.320.250.250.250.32
Phase thickness (μm) 0.50.250.25 0.52
Tstart (C) 40.40.50.60.60.
Tend (C) 200.250.230.180.240.
Heat rate (K/min) 4.8.2.3.5.
Initial hold (min) 5.5. 4.1.
Final hold (min)  5.  5.
I 1870.1814.1847.1849.1797.
ReferenceFerreira, Ortín, et al., 2002Fu, Yoon, et al., 2002Fukami, Ishiyama, et al., 2002Ito, Sugimoto, et al., 2002Qian and Reineccius, 2002
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase TC-WaxDB-WaxFFAPDB-WaxDB-Wax
Column length (m) 60.30.30.30.30.
Carrier gas HeH2H2HeliumH2
Substrate      
Column diameter (mm) 0.250.320.320.250.32
Phase thickness (μm) 0.250.50.250.250.5
Tstart (C) 40.40.40.25.40.
Tend (C) 230.200.240.220.200.
Heat rate (K/min) 3.4.3.4.4.
Initial hold (min) 10.5.5. 5.
Final hold (min) 10.60. 30.60.
I 1835.1863.1847.1832.1863.
ReferenceSuhardi, Suzuki, et al., 2002Aznar, López, et al., 2001Ducruet, Fournier, et al., 2001Duque, Bonilla, et al., 2001Ferreira, Aznar, et al., 2001
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase TC-WaxDB-WaxDB-WaxDB-WaxSupelcowax-10
Column length (m) 60.30.60.60.60.
Carrier gas HeHeHe He
Substrate      
Column diameter (mm) 0.250.250.250.250.25
Phase thickness (μm)  0.250.250.250.25
Tstart (C) 80.50.40.30.60.
Tend (C) 250.220.200.170.280.
Heat rate (K/min) 4.4.2.2.4.
Initial hold (min)  3. 4. 
Final hold (min) 47.  30. 
I 1861.1802.1832.1825.1826.
ReferenceMiyazawa, Kurose, et al., 2001Weckerle, Bastl-Borrmann, et al., 2001Wei, Mura, et al., 2001Buttery, Light, et al., 2000Korány, Mednyánszky, et al., 2000
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxDB-WaxDB-WaxDB-Wax
Column length (m) 30.30.25.25.25.
Carrier gas H2H2HeHeHe
Substrate      
Column diameter (mm) 0.320.320.250.250.25
Phase thickness (μm) 0.50.50.250.250.25
Tstart (C) 60.60.50.50.50.
Tend (C) 245.245.200.200.200.
Heat rate (K/min) 3.3.4.4.4.
Initial hold (min) 3.3.4.4.4.
Final hold (min) 20.20.10.10.10.
I 1841.1841.1812.1833.1833.
ReferenceKotseridis and Baumes, 2000Kotseridis and Baumes, 2000Morales, Duque, et al., 2000Morales, Duque, et al., 2000Morales, Duque, et al., 2000
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxDB-WaxDB-WaxDB-Wax
Column length (m) 25.30.30.60.60.
Carrier gas HeHeHeNitrogen 
Substrate      
Column diameter (mm) 0.250.250.250.250.32
Phase thickness (μm) 0.250.250.25  
Tstart (C) 50.50.50.40.30.
Tend (C) 200.240.240.200.170.
Heat rate (K/min) 4.4.4.2.2.
Initial hold (min) 4.3.3.10.4.
Final hold (min) 10.10.10. 60.
I 1840.1838.1848.1853.1825.
ReferenceMorales, Duque, et al., 2000Parada, Duque, et al., 2000Parada, Duque, et al., 2000Tamura, Boonbumrung, et al., 2000Buttery, Orts, et al., 1999
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxDB-WaxInnowaxHP-Innowax
Column length (m) 60.30.30.60.60.
Carrier gas N2  HeHe
Substrate      
Column diameter (mm) 0.250.530.530.250.25
Phase thickness (μm) 0.25  0.250.25
Tstart (C) 40.60.60.60.60.
Tend (C) 210.210.210.220.220.
Heat rate (K/min) 3.4.4.  
Initial hold (min)    10.10.
Final hold (min)      
I 1815.1835.1840.1871.1871.
ReferenceChyau and Mau, 1999Iwatsuki, Mizota, et al., 1999Iwatsuki, Mizota, et al., 1999Kaya, Baser, et al., 1999Kaya, Baser, et al., 1999, 2
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxCarbowax 20MDB-WaxDB-Wax
Column length (m) 30.60.60.30.60.
Carrier gas   HeHeliumHe
Substrate      
Column diameter (mm) 0.530.250.320.330.25
Phase thickness (μm) 1.0.250.50.250.25
Tstart (C) 40.40.40.40.40.
Tend (C) 210.210.190.200.200.
Heat rate (K/min) 5.5.2.6.2.
Initial hold (min)   5.5.2.
Final hold (min)    30. 
I 1849.1852.1854.1845.1849.
ReferenceKumazawa and Masuda, 1999Kumazawa and Masuda, 1999Lopez, Ferreira, et al., 1999Suriyaphan, Drake, et al., 1999Umano, Nakahara, et al., 1999
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxSupelcowax-10HP-InnowaxHP-InnowaxDB-Wax
Column length (m) 60.60.25.25.30.
Carrier gas  H2  He
Substrate      
Column diameter (mm) 0.250.320.320.320.25
Phase thickness (μm)  0.5  0.25
Tstart (C) 30.35.35.35.50.
Tend (C) 170.250.250.250.240.
Heat rate (K/min) 2.5.4.4.4.
Initial hold (min) 4.5.  3.
Final hold (min) 30.20.  10.
I 1825.1873.1836.1836.1835.
ReferenceButtery and Ling, 1998Campeanu, Burcea, et al., 1998Ong and Acree, 1998Ong, Acree, et al., 1998Parada and Duque, 1998
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxInnowaxPEG-20MCP-Wax 52CBDB-Wax
Column length (m) 30.30.60.50.60.
Carrier gas He HeHeHe
Substrate      
Column diameter (mm) 0.250.250.250.320.25
Phase thickness (μm) 0.250.25 0.25 
Tstart (C) 50.40.70.50.60.
Tend (C) 240.240.210.210.180.
Heat rate (K/min) 4.6.3.1.52.
Initial hold (min) 3.10. 5. 
Final hold (min) 10.25. 10. 
I 1848.1849.1853.1848.1847.
ReferenceParada and Duque, 1998Petersen, Poll, et al., 1998Awano, Honda, et al., 1997Chyau, Lin, et al., 1997Sekiwa, Kubota, et al., 1997
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase HP-InnowaxDB-WaxPEG-20MDB-WaxDB-Wax
Column length (m) 60.60.50.30.30.
Carrier gas H2HeNitrogenHeHe
Substrate      
Column diameter (mm) 0.320.250.250.250.25
Phase thickness (μm) 0.5 0.250.250.25
Tstart (C) 50.50.60.20.50.
Tend (C) 180.200.180.200.200.
Heat rate (K/min) 1.53.2.4.4.
Initial hold (min)    4.4.
Final hold (min)  40. 10.10.
I 1882.1852.1808.1829.1812.
ReferenceUlrich, Hoberg, et al., 1997Wada and Shibamoto, 1997Kubota, Matsujage, et al., 1996Morales, Albarracín, et al., 1996Morales, Albarracín, et al., 1996
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase TC-WaxSupelcowax-10DB-WaxSupelcowax-10Carbowax 20M
Column length (m) 60.60.30.90.60.
Carrier gas  He He 
Substrate      
Column diameter (mm) 0.250.250.250.250.25
Phase thickness (μm)  0.250.250.25 
Tstart (C) 80.40.20.35.60.
Tend (C) 240.200.230.220.180.
Heat rate (K/min) 3.3.5.2.2.
Initial hold (min) 5.3.1.20.4.
Final hold (min)  30. 30. 
I 1860.1856.1845.1871.1807.
ReferenceShuichi, Masazumi, et al., 1996Wong and Lai, 1996Christensen and Reineccius, 1995Girard and Lau, 1995Kawakami, Ganguly, et al., 1995
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxPEG-20MPEG-20MDB-Wax
Column length (m) 60.60.50.50.60.
Carrier gas HeHeHeHe 
Substrate      
Column diameter (mm) 0.250.250.250.250.25
Phase thickness (μm)   0.150.15 
Tstart (C) 60.60.60.60.60.
Tend (C) 180.180.180.180.220.
Heat rate (K/min) 2.2.2.2.3.
Initial hold (min) 4.4.4.4.4.
Final hold (min)      
I 1836.1844.1807.1807.1866.
ReferenceKobayashi, Tsuda, et al., 1995Kobayashi, Tsuda, et al., 1995Togari, Kobayashi, et al., 1995Togari, Kobayashi, et al., 1995Chung, Eiserich, et al., 1993
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Carbowax 20MDB-WaxCP-Wax 52CBDB-WaxSupelcowax-10
Column length (m) 50.60.50.30.60.
Carrier gas HeHeH2He 
Substrate      
Column diameter (mm) 0.250.250.320.250.75
Phase thickness (μm)  0.250.22 1.
Tstart (C) 60.50.50.60.80.
Tend (C) 180.230.200.240.200.
Heat rate (K/min) 2.2.2.3.2.
Initial hold (min) 4.4.5.10.5.
Final hold (min)      
I 1807.1851.1871.61820.1850.
ReferenceKawakami, Kobayashi, et al., 1993Shimoda, Shiratsuchi, et al., 1993Chyau, Chen, et al., 1992Hatsuko, Kazuko, et al., 1992Miranda-López, Libbey, et al., 1992
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Supelcowax-10Carbowax 20MSP-1000Supelcowax-10DB-Wax
Column length (m) 60.50.25.60.30.
Carrier gas  HeN2HeHelium
Substrate      
Column diameter (mm) 0.750.250.20.250.32
Phase thickness (μm) 1. 0.430.25 
Tstart (C) 80.60.60.40.40.
Tend (C) 200.180.190.175.200.
Heat rate (K/min) 2.2.4.1.6.
Initial hold (min) 5.4. 5.1.
Final hold (min)   30.  
I 1853.1807.1847.1850.1855.
ReferenceMiranda-López, Libbey, et al., 1992Kawakami and Kobayashi, 1991De Llano D.G., Ramos M., et al., 1990Hsieh, Williams, et al., 1989Andersen J.F., Mikolajczak K.L., et al., 1987
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillary
Active phase Carbowax 20MCarbowax 20M
Column length (m) 150.150.
Carrier gas   
Substrate   
Column diameter (mm) 0.640.64
Phase thickness (μm)   
Tstart (C) 50.50.
Tend (C) 170.170.
Heat rate (K/min) 1.1.
Initial hold (min) 30.30.
Final hold (min) 60. 
I 1830.1880.
ReferenceButtery, Ling, et al., 1983Buttery, Parker, et al., 1981
Comment MSDC-RI MSDC-RI

References

Go To: Top, Normal alkane RI, polar column, temperature ramp, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Wanakhachornkrai and Lertsiri, 9999
Wanakhachornkrai, P.; Lertsiri, S., Comparison of determination method for volatile compounds in Thai soy sauce, Analytical, Nutritional and Clinical Methods, 9999, 1-11. [all data]

Piyachaiseth, Jirapakkul, et al., 2011
Piyachaiseth, T.; Jirapakkul, W.; Chaiseri, S., Aroma compounds of flash-fried rice, Kasetsart J. (Nat. Sci.), 2011, 45, 717-729. [all data]

Duarte, Dias, et al., 2010
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Notes

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