Benzaldehyde

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Van Den Dool and Kratz RI, polar column, temperature ramp

Go To: Top, References, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled by: NIST Mass Spectrometry Data Center, William E. Wallace, director

Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxDB-Wax EtrDB-WaxHP-Innowax
Column length (m) 30.30.30.30.60.
Carrier gas HeHe He 
Substrate      
Column diameter (mm) 0.250.250.250.250.25
Phase thickness (μm) 0.250.250.250.250.25
Tstart (C) 40.40.40.50.40.
Tend (C) 200.200.250.180.250.
Heat rate (K/min) 4.4.5.3.54.
Initial hold (min) 1.1.3.2.2.
Final hold (min) 10.10.15.25.10.
I 1530.1534.1520.1502.1530.
ReferenceCho, Namgung, et al., 2008Cho, Namgung, et al., 2008Aubert and Chanforan, 2007Botelho, Caldeira, et al., 2007Hashizume M., Gordon M.H., et al., 2007
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase HP-20MDB-WaxDB-WaxZB-WaxDB-Wax Etr
Column length (m) 50.30.30.30.30.
Carrier gas HeliumHeHeHeHe
Substrate      
Column diameter (mm) 0.200.250.250.320.25
Phase thickness (μm) 0.200.50.50.250.25
Tstart (C) 70.40.40.40.40.
Tend (C) 180.250.250.250.250.
Heat rate (K/min) 4.4.4.5.5.
Initial hold (min) 4.5.5.2.3.
Final hold (min) 15.15.15.5.15.
I 1480.1520.1520.1506.1526.
ReferencePoliteo, Jukic, et al., 2007Pozo-Bayon M.A., Ruiz-Rodriguez A., et al., 2007Pozo-Bayon M.A., Ruiz-Rodriguez A., et al., 2007Wu, Zorn, et al., 2007Aubert C. and Pitrat M., 2006
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxPolyethylene GlycolDB-WaxHP-Wax
Column length (m) 60.60.30.30.30.
Carrier gas HeHeN2HeN2
Substrate      
Column diameter (mm) 0.250.250.320.250.25
Phase thickness (μm) 0.250.250.250.250.25
Tstart (C) 40.40.50.50.60.
Tend (C) 200.200.230.230.220.
Heat rate (K/min) 4.4.2.10.5.
Initial hold (min) 1.1.10.5.10.
Final hold (min) 10.10.15.25. 
I 1534.1530.1504.1521.1497.
ReferenceCho, Choi, et al., 2006Cho, Choi, et al., 2006Dob, Dahmane, et al., 2006Fernandez-Segovia, Escriche, et al., 2006Flamini, Tebano, et al., 2006
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxCP-Wax 52CBZB-WaxCP-Wax 52CB
Column length (m) 60.30.60.30.50.
Carrier gas HeHeHeHe 
Substrate      
Column diameter (mm) 0.250.320.250.250.32
Phase thickness (μm) 0.250.50.250.15 
Tstart (C) 40.40.40.35.60.
Tend (C) 265.265.250.220.220.
Heat rate (K/min) 7.7.4.5.4.
Initial hold (min)    5.5.
Final hold (min) 5.5. 10.30.
I 1555.1530.1541.1513.1508.
ReferenceGurbuz O., Rouseff J.M., et al., 2006Gurbuz O., Rouseff J.M., et al., 2006Kourkoutas, Elmore, et al., 2006Ledauphin, Basset, et al., 2006Mahadevan and Farmer, 2006
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxLM-120DB-WaxCP-Wax 52CBOV-351
Column length (m) 30.50.30.60.50.
Carrier gas He He He
Substrate      
Column diameter (mm) 0.250.250.250.250.32
Phase thickness (μm) 0.250.50.50.250.2
Tstart (C) 50.50.50.35.60.
Tend (C) 220.240.260.203.220.
Heat rate (K/min) 4.3.4.3.5.
Initial hold (min) 4.  4. 
Final hold (min) 20.30.5.  
I 1495.1563.1525.1520.1493.
ReferenceOsorio, Alarcon, et al., 2006Pinto, Guedes, et al., 2006Selli, Rannou, et al., 2006Alasalvar, Taylor, et al., 2005Bonvehí, 2005
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Supelcowax-10StabilwaxSupelcowax-10StabilwaxInnowax
Column length (m) 60.60.60.30.50.
Carrier gas  HeHeN2He
Substrate      
Column diameter (mm) 0.250.250.250.320.25
Phase thickness (μm) 0.250.250.251.0.25
Tstart (C) 35.40.40.40.50.
Tend (C) 195.240.280.230.220.
Heat rate (K/min) 6.3.4.4.2.
Initial hold (min) 5.5.2.2.3.
Final hold (min) 60.10. 10.20.
I 1497.1524.1537.1557.1529.
ReferenceChung, Fung, et al., 2005Cros, Lignot, et al., 2005Elmore, Nisyrios, et al., 2005Fang and Qian, 2005Lee, Lee, et al., 2005
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase InnowaxSupelcowax-10Carbowax 20MZB-WaxHP-Wax
Column length (m) 30.30.60.30.30.
Carrier gas HeHeHeHeN2
Substrate      
Column diameter (mm) 0.250.250.250.320.25
Phase thickness (μm) 0.250.250.250.250.25
Tstart (C) 40.60.45.40.60.
Tend (C) 200.240.250.250.220.
Heat rate (K/min) 5.3.2.5.5.
Initial hold (min) 5.5.0.172.10.
Final hold (min) 2.10. 5. 
I 1523.1504.1496.1498.1521.
ReferencePena, Barciela, et al., 2005Riu-Aumatell, Lopez-Tamames, et al., 2005Verzera, Campisi, et al., 2005Wu, Zorn, et al., 2005Flamini, Luigi Cioni, et al., 2004
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxZB-WaxDB-WaxDB-WaxDB-Wax
Column length (m) 0.30.30.30.30.
Carrier gas  HeHeHe 
Substrate      
Column diameter (mm) 0.320.250.250.250.32
Phase thickness (μm) 0.50.150.250.250.5
Tstart (C) 40.35.40.40.40.
Tend (C) 240.220.240.200.245.
Heat rate (K/min) 7.1.86.4.3.
Initial hold (min)  10.10.5.3.
Final hold (min) 5.10.25.20.20.
I 1533.1513.1494.1508.1508.
ReferenceGocmen, Gurbuz, et al., 2004Ledauphin, Saint-Clair, et al., 2004Varming, Andersen, et al., 2004Zheng, Kim, et al., 2004Aubert, Ambid, et al., 2003
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxHP-WaxOV-351DB-Wax
Column length (m) 30.30.30.50.30.
Carrier gas   N2HeHe
Substrate      
Column diameter (mm) 0.320.320.250.320.25
Phase thickness (μm) 0.50.50.250.20.25
Tstart (C) 40.40.60.60.40.
Tend (C) 245.245.220.220.250.
Heat rate (K/min) 2.2.5.5.3.
Initial hold (min) 3.3.10.  
Final hold (min) 20.20.  20.
I 1508.1508.1521.1493.1478.
ReferenceAubert, Günata, et al., 2003Aubert, Günata, et al., 2003Bader, Caponi, et al., 2003Bonvehi and Coll, 2003Brat, Rega, et al., 2003
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase HP-WaxHP-WaxStabilwaxHP-20MAT-Wax
Column length (m) 30.30.60.50.60.
Carrier gas N2N2HeHeHe
Substrate      
Column diameter (mm) 0.250.250.250.20.32
Phase thickness (μm) 0.250.250.250.20.25
Tstart (C) 60.60.40.70.65.
Tend (C) 220.220.240.180.250.
Heat rate (K/min) 5.5.3.4.2.
Initial hold (min) 10.10.5.4.10.
Final hold (min)   10.10.60.
I 1495.1495.1524.1481.1507.
ReferenceCampeol, Flamini, et al., 2003Campeol, Flamini, et al., 2003Cros, Vandanjon, et al., 2003Jerkovic, Mastelic, et al., 2003Pino, Almora, et al., 2003
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxZB-WaxSupelcowax-10DB-WaxAT-Wax
Column length (m) 30.60.60.60.60.
Carrier gas  HeHeHeHe
Substrate      
Column diameter (mm) 0.320.320.250.320.32
Phase thickness (μm) 0.50.250.250.50.25
Tstart (C) 40.40.35.67.65.
Tend (C) 240.220.195.235.250.
Heat rate (K/min) 7.3.2.2.72.
Initial hold (min)   5. 10.
Final hold (min) 5. 90.30.60.
I 1525.1502.1530.1557.1508.
ReferenceValim, Rouseff, et al., 2003Brunton, Cronin, et al., 2002Chung, Yung, et al., 2002Claudela, Dirningera, et al., 2002Pino, Marbot, et al., 2002
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase HP-InnowaxHP-InnowaxSupelcowax-10DB-WaxCP-Wax 52CB
Column length (m) 30.30.60.60.50.
Carrier gas N2N2HeHeH2
Substrate      
Column diameter (mm) 0.250.250.250.250.32
Phase thickness (μm) 0.250.250.250.25 
Tstart (C) 60.60.35.40.50.
Tend (C) 220.220.195.200.200.
Heat rate (K/min) 5.5.2.2.2.
Initial hold (min)   5.5. 
Final hold (min)   90.30. 
I 1546.1546.1530.1504.1541.
ReferenceAdamiec, Rossner, et al., 2001Adamiec, Rossner, et al., 2001Chung, Yung, et al., 2001Kim, 2001Liu, Yang, et al., 2001
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase AT-WaxAT-WaxDB-WaxCP-Wax 52CBDB-Wax
Column length (m) 60.60.60.60.60.
Carrier gas HeHeHeHeHe
Substrate      
Column diameter (mm) 0.320.320.250.250.32
Phase thickness (μm) 0.250.250.250.250.5
Tstart (C) 65.65.50.45.30.
Tend (C) 250.250.230.250.160.
Heat rate (K/min) 2.2.2.2.3.
Initial hold (min) 10.10. 0.17 
Final hold (min) 60.60.60. 5.
I 1508.1508.1531.1496.1536.
ReferencePino and Marbot, 2001Pino, Marbot, et al., 2001Shimoda, Yoshimura, et al., 2001Verzera, Campisi, et al., 2001Beauchene, Grua-Priol, et al., 2000
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxDB-FFAPCP-Wax 52CBSupelcowax-10
Column length (m) 60.60.30.50.60.
Carrier gas HeHeH2 He
Substrate      
Column diameter (mm) 0.500.530.320.320.25
Phase thickness (μm) 1.01.00.25 0.25
Tstart (C) 60.50.40.60.35.
Tend (C) 225.220.240.220.195.
Heat rate (K/min) 3.3.5.4.2.
Initial hold (min)   2.5. 
Final hold (min)    30.90.
I 1520.1520.1523.1505.1530.
ReferenceBrophy, Goldsack, et al., 2000Brophy, Goldsack, et al., 2000, 2Charles, Martin, et al., 2000Chevance, Farmer, et al., 2000Chung, 2000
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase CP-Wax 52CBDB-WaxDB-WaxHP-20MDB-Wax
Column length (m) 50.30.60.50.30.
Carrier gas HeHeHeHeH2
Substrate      
Column diameter (mm) 0.250.250.320.20.25
Phase thickness (μm) 0.20.250.50.20.25
Tstart (C) 30.40.40.70.60.
Tend (C) 220.200.250.180.220.
Heat rate (K/min) 2.2.4.4.2.
Initial hold (min) 1.35.2.4.3.
Final hold (min)  20.10.10. 
I 1501.1502.1539.1475.1500.
ReferenceJensen, Christensen, et al., 2000Kim, Thuy, et al., 2000Le Guen, Prost, et al., 2000Milos, Mastelic, et al., 2000Chassagne, Boulanger, et al., 1999
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase CP-Wax 52CBCP-Wax 52CBCP-Wax 52CBSupelcowax-10Supelcowax-10
Column length (m) 50.50.50.60.60.
Carrier gas    HeHe
Substrate      
Column diameter (mm) 0.320.320.320.250.25
Phase thickness (μm)    0.250.25
Tstart (C) 60.60.40.35.35.
Tend (C) 220.220.220.195.195.
Heat rate (K/min) 4.4.4.2.2.
Initial hold (min) 5.5.5.5.5.
Final hold (min) 30.30.30.90.90.
I 1508.1508.1506.1530.1530.
ReferenceChevance and Farmer, 1999Chevance and Farmer, 1999, 2Chevance and Farmer, 1999, 2Chung, 1999Chung, 1999, 2
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxCarbowax 20MSP-1000DB-WaxDB-Wax
Column length (m) 30.25.85.60.60.
Carrier gas H2H2HeHeHe
Substrate      
Column diameter (mm) 0.320.250.50.320.32
Phase thickness (μm) 0.50.3   
Tstart (C) 67.50.60.65.35.
Tend (C) 240.200.225.225.220.
Heat rate (K/min) 5.3.3.3.3.
Initial hold (min)  1.   
Final hold (min)  20.   
I 1549.1516.1518.1520.1520.
ReferenceEscudero and Etiévant, 1999Bicchi, Rubiolo, et al., 1998Brophy, Forster, et al., 1998Brophy, Goldsack, et al., 1998Brophy, Goldsack, et al., 1998, 2
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxDB-WaxFFAPPEG-20M
Column length (m) 60.60.30.30.60.
Carrier gas   N2HeHe
Substrate      
Column diameter (mm) 0.250.320.530.250.25
Phase thickness (μm) 0.250.250.250.250.25
Tstart (C) 40.40.50.20.50.
Tend (C) 200.200.200.200.230.
Heat rate (K/min) 3.2.2.4.2.
Initial hold (min) 5.  1. 
Final hold (min) 60.  1.60.
I 1522.1534.1534.1556.1512.
ReferenceCha, Kim, et al., 1998Mau, Lin, et al., 1998Mau and Hwang, 1997Ott, Fay, et al., 1997Shimoda, Nakada, et al., 1997
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxDB-WaxDB-WaxDB-Wax
Column length (m) 60.60.60.30.30.
Carrier gas HeHeHeHeHe
Substrate      
Column diameter (mm) 0.250.250.250.320.32
Phase thickness (μm) 0.250.250.250.50.5
Tstart (C) 50.50.50.50.50.
Tend (C) 230.230.180.230.230.
Heat rate (K/min) 2.3.2.52.2.
Initial hold (min)   5.  
Final hold (min) 60.    
I 1512.1534.1501.1532.1533.
ReferenceShimoda, Shiratsuchi, et al., 1996Shimoda, Wu, et al., 1996Stashenko, Prada, et al., 1996Coen, Engel, et al., 1995Coen, Engel, et al., 1995
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Carbowax 20MDB-WaxDB-WaxDB-WaxDB-Wax
Column length (m) 60.60.30.60.60.
Carrier gas He He He
Substrate      
Column diameter (mm) 0.320.250.250.250.25
Phase thickness (μm) 0.4250.25 0.250.25
Tstart (C) 45.50.40.50.50.
Tend (C) 300.230.200.230.230.
Heat rate (K/min) 3.2.2.2.2.
Initial hold (min) 3. 5.  
Final hold (min) 20.  60.60.
I 1508.1496.1500.1522.1522.
ReferenceMondello, Dugo, et al., 1995Shimoda, Shigematsu, et al., 1995Iwaoka, Hagi, et al., 1994Shiratsuchi, Shimoda, et al., 1994Shiratsuchi, Shimoda, et al., 1994, 2
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxSupelcowax-10DB-WaxDB-WaxCP-Wax 52CB
Column length (m) 60.60.60.30.50.
Carrier gas HeHe HeH2
Substrate      
Column diameter (mm) 0.250.250.250.250.32
Phase thickness (μm)  0.250.25  
Tstart (C) 40.40.50.40.50.
Tend (C) 200.195.230.200.200.
Heat rate (K/min) 3.2.2.2.1.5
Initial hold (min) 5.5.4.10.10.
Final hold (min)  40.30. 80.
I 1530.1527.1513.1506.1470.
ReferenceSumitani, Suekane, et al., 1994Chung and Cadwallader, 1993Shiratsuchi, Shimoda, et al., 1993Umano, Hagi, et al., 1992Wu and Liou, 1992
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxCarbowax 20MSupelcowax-10Supelcowax-10
Column length (m) 30.30.30.60.60.
Carrier gas HeHeHe  
Substrate      
Column diameter (mm) 0.250.320.250.250.25
Phase thickness (μm) 0.250.250.250.250.25
Tstart (C) 50.40.40.40.40.
Tend (C) 240.220.240.175.175.
Heat rate (K/min) 4.5.4.2.2.
Initial hold (min) 3.3.3.5.5.
Final hold (min)    20.20.
I 1502.1502.1502.1527.1530.
ReferenceKrammer, Winterhalter, et al., 1991Frohlich and Schreier, 1990Schwab, Mahr, et al., 1989Tanchotikul and Hsieh, 1989Tanchotikul and Hsieh, 1989
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase CP-WAX 57CBCP-WAX 57CBSupelcowax-10Supelcowax-10Carbowax 20M
Column length (m) 50.50.60.60.50.
Carrier gas He   He
Substrate      
Column diameter (mm) 0.240.320.250.250.32
Phase thickness (μm)   0.250.25 
Tstart (C) 50.60.40.40.50.
Tend (C) 210.200.175.175.200.
Heat rate (K/min) 2.4.2.2.2.
Initial hold (min) 5.5.5.5.5.
Final hold (min)   20.20.40.
I 1493.1510.1532.1535.1514.
ReferenceBaltes and Mevissen, 1988Salter L.J., Mottram D.S., et al., 1988Vejaphan, Hsieh, et al., 1988Vejaphan, Hsieh, et al., 1988Chen, Kuo, et al., 1986
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type Capillary
Active phase Carbowax 20M
Column length (m) 50.
Carrier gas H2
Substrate  
Column diameter (mm) 0.2
Phase thickness (μm)  
Tstart (C) 50.
Tend (C) 200.
Heat rate (K/min) 2.
Initial hold (min)  
Final hold (min) 55.
I 1473.
ReferenceWu and Liou, 1986
Comment MSDC-RI

References

Go To: Top, Van Den Dool and Kratz RI, polar column, temperature ramp, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Cho, Namgung, et al., 2008
Cho, I.H.; Namgung, H.-J.; Choi, H.-K.; Kim, Y.-S., Volatiles and key odorants in the pileus and stipe of pine-mushroom (Tricholoma matsutake Sing.), Food Chem., 2008, 106, 1, 71-76, https://doi.org/10.1016/j.foodchem.2007.05.047 . [all data]

Aubert and Chanforan, 2007
Aubert, C.; Chanforan, C., Postharvest Changes in Physicochemical Properties and Volatile Constituents of Apricot (Prunus armeniaca L.). Characterization of 28 Cultivars, J. Agric. Food Chem., 2007, 55, 8, 3074-3082, https://doi.org/10.1021/jf063476w . [all data]

Botelho, Caldeira, et al., 2007
Botelho, G.; Caldeira, I.; Mendes-Faia, A.; Clímaco, M.C., Evaluation of two quantitative gas chromatography-olfactometry methods for clonal red wines differentiation, Flavour Fragr. J., 2007, 22, 5, 414-420, https://doi.org/10.1002/ffj.1815 . [all data]

Hashizume M., Gordon M.H., et al., 2007
Hashizume M.; Gordon M.H.; Mottram D.S., Light-induced off-flavor development in cloudy apple juice, J. Agric. Food Chem., 2007, 55, 22, 9177-9182, https://doi.org/10.1021/jf0715727 . [all data]

Politeo, Jukic, et al., 2007
Politeo, O.; Jukic, M.; Milos, M., Chemical Composition and Antioxidant Activity of Free Volatile Aglycones from Laurel (Laurus nobilis L.) Compared to Its Essential Oil, Croatica Chem. Acta, 2007, 80, 1, 121-126. [all data]

Pozo-Bayon M.A., Ruiz-Rodriguez A., et al., 2007
Pozo-Bayon M.A.; Ruiz-Rodriguez A.; Pernin K.; Cayot N., Influence of eggs on the aroma composition of a sponge cake and on the aroma release in model studies on flavored sponge cakes, J. Agric. Food Chem., 2007, 55, 4, 1418-1426, https://doi.org/10.1021/jf062203y . [all data]

Wu, Zorn, et al., 2007
Wu, S.; Zorn, H.; Krings, U.; Berger, R.G., Volatiles from submerged and surface-cultured beefsteak fungus, Fistulina hepatica, Flavour Fragr. J., 2007, 22, 1, 53-60, https://doi.org/10.1002/ffj.1758 . [all data]

Aubert C. and Pitrat M., 2006
Aubert C.; Pitrat M., Volatile compounds in the skin and pulp of Queen Anne's pocket melon, J. Agric. Food Chem., 2006, 54, 21, 8177-8182, https://doi.org/10.1021/jf061415s . [all data]

Cho, Choi, et al., 2006
Cho, I.H.; Choi, H.-K.; Kim, Y.-S., Difference in the volatile composition of pine-mushrooms (Tricholoma matsutake Sing.) according to their grades, J. Agric. Food Chem., 2006, 54, 13, 4820-4825, https://doi.org/10.1021/jf0601416 . [all data]

Dob, Dahmane, et al., 2006
Dob, T.; Dahmane, D.; Agli, M.; Chelghoum, C., Essential oil composition of Lavandula stoechas from Algeria, Pharm. Biol., 2006, 44, 1, 60-64, https://doi.org/10.1080/13880200500496421 . [all data]

Fernandez-Segovia, Escriche, et al., 2006
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Notes

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