SiF4..F anion
- Formula: F5Si-
- Molecular weight: 123.0781
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Gas phase thermochemistry data
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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.
Data compiled by: John E. Bartmess
Quantity | Value | Units | Method | Reference | Comment |
---|---|---|---|---|---|
ΔfH°gas | <-1988. ± 4.2 | kJ/mol | R-EA | Kawamata, Neigishi, et al., 1996 | |
ΔfH°gas | -2148. ± 21. | kJ/mol | Ther | Murphy and Beauchamp, 1977 | Fluoride Affinity: <BF3, >iPr2BF |
ΔfH°gas | <-2317.9 | kJ/mol | IMRB | MacNeil and Thynne, 1970 |
Reaction thermochemistry data
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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.
Data compiled by: John E. Bartmess
Note: Please consider using the reaction search for this species. This page allows searching of all reactions involving this species. A general reaction search form is also available. Future versions of this site may rely on reaction search pages in place of the enumerated reaction displays seen below.
Individual Reactions
F5Si- + = F9Si2-
By formula: F5Si- + F4Si = F9Si2-
Quantity | Value | Units | Method | Reference | Comment |
---|---|---|---|---|---|
ΔrH° | 40. ± 8.4 | kJ/mol | IMRE | Hiraoka, Nasu, et al., 2000 | gas phase |
Quantity | Value | Units | Method | Reference | Comment |
ΔrG° | 21.5 | kJ/mol | IMRE | Hiraoka, Nasu, et al., 2000 | gas phase |
References
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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.
Kawamata, Neigishi, et al., 1996
Kawamata, H.; Neigishi, Y.; Kishi, R.; Iwata, S.; Nakajima, A.; Kaya, K.,
Photoelectron Spectroscopy of Silicon-Fluorine Binary Cluster Anions (SinFm-),
J. Chem. Phys., 1996, 105, 13, 5369, https://doi.org/10.1063/1.472377
. [all data]
Murphy and Beauchamp, 1977
Murphy, M.K.; Beauchamp, J.L.,
Methyl and Fluorine Substituent Effects on the Gas Phase Lewis Acidities of Silanes by ICR Spectroscopy,
J. Am. Chem. Soc., 1977, 99, 15, 4992, https://doi.org/10.1021/ja00457a017
. [all data]
MacNeil and Thynne, 1970
MacNeil, K.A.G.; Thynne, J.C.J.,
The Formation of Negative Ions by Electron Impact on Silicon Tetrafluoride and Carbon Tetrafluoride,
Int. J. Mass Spectrom. Ion Phys., 1970, 3, 6, 455, https://doi.org/10.1016/0020-7381(70)80004-3
. [all data]
Hiraoka, Nasu, et al., 2000
Hiraoka, K.; Nasu, M.; Minamitsu, A.; Shimizu, A.; Yamabe, S.,
On the structure and stability of gas-phase cluster ions SiF3+(CO)(n), SiF3OH2+(SiF4)(n), SiF4H+(SiF4)(n), and F- (SiF4)(n),
J. Phys. Chem. A, 2000, 104, 36, 8353-8359, https://doi.org/10.1021/jp000525d
. [all data]
Notes
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- Symbols used in this document:
ΔfH°gas Enthalpy of formation of gas at standard conditions ΔrG° Free energy of reaction at standard conditions ΔrH° Enthalpy of reaction at standard conditions - Data from NIST Standard Reference Database 69: NIST Chemistry WebBook
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