National Institute of Standards and Technology

NIST Chemistry WebBook, SRD 69

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Toyoda, S.

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Matsumi, Y.; Toyoda, S.; Hayashi, T.; Miyamura, M.; Yoshikawa, H.; Komiya, S., Laser-induced fluorescence study of silicon etching process: Detection of SiF2 and CF2 radicals, J. Appl. Phys., 1986, 60, 12, 4102, https://doi.org/10.1063/1.337489 . [all data]