National Institute of Standards and Technology

NIST Chemistry WebBook, SRD 69

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Sheehan, Richard J.

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Sheehan, Richard J.; Langer, Stanley H., Vapor pressures of fluorine- and silicon-containing derivatives of some hydroxylic compounds, J. Chem. Eng. Data, 1969, 14, 2, 248-250, https://doi.org/10.1021/je60041a011 . [all data]