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6 matching references were found.

Kenner, R.D.; Haak, H.K.; Stuhl, F., Cl₂ and HCl emissions in the ArF-laser photolyses of chlorinated compounds: identification and mechanism of generation, J. Chem. Phys., 1986, 85, 1915-1923. [all data]

Kenner, R.D.; Rohrer, F.; Stuhl, F., OH(A) production in the 193-nm photolysis of HONO, J. Phys. Chem., 1986, 90, 2635-2639. [all data]

Kenner, R.D.; Rohrer, F.; Stuhl, F., Generation of NH(a¹Δ) in the 193 nm photolysis of ammonia, J. Chem. Phys., 1987, 86, 2036-2043. [all data]

Kenner, R.D.; Kaes, A.; Browarzik, R.K.; Stuhl, F., Lifetime and deactivation of NH and ND (A³Π, v=0 and 1), J. Chem. Phys., 1989, 91, 1440-1445. [all data]

Kenner, R.D.; Rohrer, F.; Stuhl, F., Electronic quenching of NH(c¹Π), J. Phys. Chem., 1989, 93, 7824-7832. [all data]

Kenner, R.D.; Pfannenberg, S.; Heinrich, P.; Stuhl, F., Electronic quenching of CH(A²Δ), NH(A³Π), NH(c¹Π), and PH(A³Π) between 240 and 420 K, J. Phys. Chem., 1991, 95, 6585-6593. [all data]