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| Author: | Jisai |
Only one matching reference was found.
Oikawa, S.; Tsuda, M.; Yoshida, J.; Jisai, Y., On the primary process in the plasma-chemical and photochemical vapor deposition from silane. Mechanism of the radiative species SiH*(A2Δ) formation, J. Chem. Phys., 1986, 85, 2808-2813. [all data]