Search Results

Search criteria:

You may also wish to search for items by Jisai.

Only one matching reference was found.

Oikawa, S.; Tsuda, M.; Yoshida, J.; Jisai, Y., On the primary process in the plasma-chemical and photochemical vapor deposition from silane. Mechanism of the radiative species SiH*(A²Δ) formation, J. Chem. Phys., 1986, 85, 2808-2813. [all data]