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| Author: | Hayashi, T. |
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7 matching references were found.
Matsumi, Y.; Toyoda, S.; Hayashi, T.; Miyamura, M.; Yoshikawa, H.; Komiya, S., Laser-induced fluorescence study of silicon etching process: Detection of SiF2 and CF2 radicals, J. Appl. Phys., 1986, 60, 12, 4102, https://doi.org/10.1063/1.337489 . [all data]
Washida, N.; Matsumi, Y.; Hayashi, T.; Ibuki, T.; Hiraya, A.; Shobatake, K., Emission spectra of SiH(A 2Δ→X 2Π) and SiCl2(A 1B1→X 1A1) in the VUV photolyses of silane and chlorinated silanes, J. Chem. Phys., 1985, 83, 6, 2769, https://doi.org/10.1063/1.449227 . [all data]
Washida, N.; Matsumi, Y.; Hayashi, T.; Ibuki, T.; Hiraya, A.; Shobatake, K., Emission spectra of SiH(A2Δ→X2Π) and SiCl2(A«tilde»1B1→X«tilde»1A1) in the VUV photolyses of silane and chlorinated silanes, J. Chem. Phys., 1985, 83, 2769-2774. [all data]
Takagi, H.; Hayashi, T., Studies on the Agents for Silk Reeling II. On the Properties of Non-ionic Surface Active Agents of Octylphenol Type, Shinshu Daigaku Sen'igakubu Kenkyu Hokoku, 1955, 5, 92. [all data]
Hayashi, T., Kagaku Kenkyusho Hokoku, 1934, 23, 274. [all data]
Kubota, B.; Hayashi, T., Bull. Chem. Soc. Jpn., 1926, 1, 67. [all data]
Kikkawa, S.; Hayashi, T.; Nomura, M.; Otsu, N., Chlorination of methylcyclohexane in molten salt media, Bull. Chem. Soc. Japan, 1975, 48, 90-5. [all data]
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