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Haak, H.K.

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2 matching references were found.

Haak, H.K.; Stuhl, F., ArF (193 nm) laser photolysis of HN₃, CH₃NH₂, and N₂H₄: formation of excited NH radicals, J. Phys. Chem., 1984, 88, 3627-3633. [all data]

Kenner, R.D.; Haak, H.K.; Stuhl, F., Cl₂ and HCl emissions in the ArF-laser photolyses of chlorinated compounds: identification and mechanism of generation, J. Chem. Phys., 1986, 85, 1915-1923. [all data]