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| Author: | Flamm, D. |
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2 matching references were found.
Donnelly, V.M.; Flamm, D.L., Studies of chemiluminescence accompanying fluorine atom etching of silicon, J. Appl. Phys., 1980, 51, 10, 5273, https://doi.org/10.1063/1.327282 . [all data]
Flamm, D.L., Mechanisms of radical production in radiofrequency discharges of CF3Cl, CF3Br, and certain other plasma etchants: Spectrum of a transient species, J. Appl. Phys., 1980, 51, 11, 5688, https://doi.org/10.1063/1.327567 . [all data]