Tris(2,2,6,6-tetramethylheptane-3,5-dionato)yttrium(III)


Phase change data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled by: William E. Acree, Jr., James S. Chickos

Enthalpy of vaporization

ΔvapH (kcal/mol) Temperature (K) Reference
21.4450. - 455.Fulem, Ruzicka, et al., 2004

Enthalpy of sublimation

ΔsubH (kcal/mol) Temperature (K) Method Reference Comment
33.84395. - 434.N/AFulem, Ruzicka, et al., 2004 
36.1 ± 0.2372.TEColominas, Lau, et al., 2001Based on data from 358. - 387. K.
36.59 ± 0.1366.TEColominas, Lau, et al., 2001Based on data from 357. - 377. K.
32.48403. - 433.TG,DTAYuan, Yang, et al., 1997 
30.11397.TRappoli and DeSisto, 1996Based on data from 382. - 412. K.
37.50388.MEAmano, Sato, et al., 1981Based on data from 363. - 418. K.

Enthalpy of fusion

ΔfusH (kcal/mol) Temperature (K) Reference
12.4440.Fulem, Ruzicka, et al., 2004

References

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Fulem, Ruzicka, et al., 2004
Fulem, Michal; Ruzicka, Kvetoslav; Ruzicka, Vlastimil; Simecek, Tomislav; Hulicius, Eduard; Pangrác, Jiri, Vapour pressure and heat capacities of metal organic precursors, Y(thd)3 and Zr(thd)4, Journal of Crystal Growth, 2004, 264, 1-3, 192-200, https://doi.org/10.1016/j.jcrysgro.2003.12.016 . [all data]

Colominas, Lau, et al., 2001
Colominas, Carles; Lau, Kai H.; Hildenbrand, Donald L.; Crouch-Baker, Steven; Sanjurjo, Angel, Vapor Pressures of the Copper and Yttrium β-Diketonate MOCVD Precursors, J. Chem. Eng. Data, 2001, 46, 2, 446-450, https://doi.org/10.1021/je0003445 . [all data]

Yuan, Yang, et al., 1997
Yuan, Z.; Yang, P.; Meng, G.; Peng, D., Synthesis, characterization, Stability and Sublimation Behavior of Yttrium (III) Dipivaloylmethane Chelate, Wuji Huaxue Xuebao, 1997, 13, 2, 168. [all data]

Rappoli and DeSisto, 1996
Rappoli, Brian J.; DeSisto, William J., Gas phase ultraviolet spectroscopy of high-temperature superconductor precursors for chemical vapor deposition processing, Appl. Phys. Lett., 1996, 68, 19, 2726, https://doi.org/10.1063/1.115578 . [all data]

Amano, Sato, et al., 1981
Amano, Ryohei; Sato, Akiko; Suzuki, Shin, Sublimation behavior of tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanoid(III)., Bull. Chem. Soc. Jpn., 1981, 54, 5, 1368-1374, https://doi.org/10.1246/bcsj.54.1368 . [all data]


Notes

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