Silane, trimethyl-

• Formula: C₃H₁₀Si
• Molecular weight: 74.1970
• IUPAC Standard InChI: InChI=1S/C3H10Si/c1-4(2)3/h4H,1-3H3 Copy

  
• IUPAC Standard InChIKey: PQDJYEQOELDLCP-UHFFFAOYSA-N Copy
• CAS Registry Number: 993-07-7
• Chemical structure:
  This structure is also available as a 2d Mol file
• Other names: Trimethylsilane; 2-Methyl-2-silapropane; (CH3)3SiH
• Permanent link for this species. Use this link for bookmarking this species for future reference.
• Information on this page:
  • Reaction thermochemistry data
  • Gas phase ion energetics data
  • Gas Chromatography
  • References
  • Notes
• Other data available:
  • Phase change data
  • Mass spectrum (electron ionization)
• Data at other public NIST sites:
  • Gas Phase Kinetics Database
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Reaction thermochemistry data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled by: John E. Bartmess

Note: Please consider using the reaction search for this species. This page allows searching of all reactions involving this species. A general reaction search form is also available. Future versions of this site may rely on reaction search pages in place of the enumerated reaction displays seen below.

Individual Reactions

C₃H₉Si^- +  =

By formula: C₃H₉Si^- + H⁺ = C₃H₁₀Si

Gas phase ion energetics data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled as indicated in comments:
B - John E. Bartmess
LLK - Sharon G. Lias, Rhoda D. Levin, and Sherif A. Kafafi
RDSH - Henry M. Rosenstock, Keith Draxl, Bruce W. Steiner, and John T. Herron
LL - Sharon G. Lias and Joel F. Liebman

Ionization energy determinations

Appearance energy determinations

De-protonation reactions

C₃H₉Si^- +  =

By formula: C₃H₉Si^- + H⁺ = C₃H₁₀Si

Gas Chromatography

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled by: NIST Mass Spectrometry Data Center, William E. Wallace, director

Normal alkane RI, non-polar column, temperature ramp

View large format table.

References

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Wetzel, Salomon, et al., 1989
Wetzel, D.M.; Salomon, K.E.; Berger, S.; Brauman, J.I., Gas-Phase Acidities of Organosilanes and Electron Affinities of Organosilyl Radicals, J. Am. Chem. Soc., 1989, 111, 11, 3835, https://doi.org/10.1021/ja00193a013 . [all data]

Damrauer, Kass, et al., 1988
Damrauer, R.; Kass, S.R.; DePuy, C.H., Gas-Phase Acidities of Methylsilanes: C-H versus Si-H, Organomet., 1988, 7, 3, 637, https://doi.org/10.1021/om00093a011 . [all data]

Grimm and Bartmess, 1992
Grimm, D.T.; Bartmess, J.E., The Intrinsic (Gas Phase) Basicity of some Anions Commonly Used in Condensed-Phase Synthesis, J. Am. Chem. Soc., 1992, 114, 4, 1227, https://doi.org/10.1021/ja00030a016 . [all data]

Potzinger, Ritter, et al., 1975
Potzinger, P.; Ritter, A.; Krause, J., Massenspektrometrische Bestimmung von Bindungsenergien in siliciumorganischen Verbindungen, Z. Naturforsch. A:, 1975, 30, 347. [all data]

Connor, Haszeldine, et al., 1967
Connor, J.A.; Haszeldine, R.N.; Leigh, G.J.; Sedgwick, R.D., Organosilicon chemistry. Part II. The thermal decomposition of hexamethyldisilane, the Me₃Si-SiMe₃ bond dissociation energy, and the ionisation potential of the trimethylsilyl radical, J. Chem. Soc. A, 1967, 768. [all data]

Hobrock and Kiser, 1962
Hobrock, B.G.; Kiser, R.W., Electron impact spectroscopy of tetramethylgermanium, trimethylsilane, and dimethylmercury, J. Phys. Chem., 1962, 66, 155. [all data]

Roberge, Sandorfy, et al., 1978
Roberge, R.; Sandorfy, C.; Matthews, J.I.; Strausz, O.P., The far ultraviolet HeI photoelectron spectra of alkyl and fluorine substituted silane derivatives, J. Chem. Phys., 1978, 69, 5105. [all data]

Potzinger and Lampe, 1970
Potzinger, P.; Lampe, F.W., Thermochemistry of simple alkylsilanes, J. Phys. Chem., 1970, 74, 719. [all data]

Shin, Corderman, et al., 1990
Shin, S.K.; Corderman, R.R.; Beauchamp, J.L., Photoionization mass spectrometric studies of the methylsilanes Si(CH₃)_nH_4-n (n = 0-3), Int. J. Mass Spectrom. Ion Processes, 1990, 101, 257. [all data]

Hess, Lampe, et al., 1965
Hess, G.G.; Lampe, F.W.; Sommer, L.H., An electron impact study of ionization and dissociation of trimethylsilanes, J. Am. Chem. Soc., 1965, 87, 5327. [all data]

Band, Davidson, et al., Commun. 1967
Band, S.J.; Davidson, I.M.T.; Lambert, C.A.; Stephenson, I.L., Bond dissociation energies and heats of formation of trimethylsilyl compounds, Chem., Commun. 1967, 723. [all data]

Connor, Finney, et al., 1966
Connor, J.A.; Finney, G.; Leigh, G.J.; Haszeldine, R.N.; Robinson, P.J.; Sedgwick, R.D.; Simmons, R.F., Bond dissociation energies in organosilicon compounds, Chem. Commun., 1966, 178. [all data]

Hess, Lampe, et al., 1964
Hess, G.G.; Lampe, F.W.; Sommer, L.H., Bond dissociation energies and ion energetics in organosilicon compounds by electron impact, J. Am. Chem. Soc., 1964, 86, 3174. [all data]

Zenkevich, 2005
Zenkevich, I.G., Experimentally measured retention indices., 2005. [all data]

Szekely, Nefedov, et al., 1967
Szekely, T.; Nefedov, O.M.; Garzo, G.; Shiryayav, V.I.; Fritz, D., Gas chromatographic investigation of the thermal decomposition of polydimethylsilylene, Acta Chim. Acad. Sci. Hung., 1967, 54, 3-4, 241-254. [all data]

Notes

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• Symbols used in this document:
  

  AE	Appearance energy
  ΔrG°	Free energy of reaction at standard conditions
  ΔrH°	Enthalpy of reaction at standard conditions

• Data from NIST Standard Reference Database 69: NIST Chemistry WebBook
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