Silicon tetrafluoride

• Formula: F₄Si
• Molecular weight: 104.0791
• IUPAC Standard InChI: InChI=1S/F4Si/c1-5(2,3)4 Copy

  
• IUPAC Standard InChIKey: ABTOQLMXBSRXSM-UHFFFAOYSA-N Copy
• CAS Registry Number: 7783-61-1
• Chemical structure:
  This structure is also available as a 2d Mol file or as a computed 3d SD file
  The 3d structure may be viewed using Java or Javascript.
• Other names: Silane, tetrafluoro-; Silicon fluoride (SiF4); Tetrafluorosilane; SiF4; Silicon fluoride; UN 1859
• Permanent link for this species. Use this link for bookmarking this species for future reference.
• Information on this page:
  • Gas phase thermochemistry data
  • Reaction thermochemistry data
  • Gas phase ion energetics data
  • References
  • Notes
• Other data available:
  • Phase change data
  • Ion clustering data
  • IR Spectrum
  • Mass spectrum (electron ionization)
  • Vibrational and/or electronic energy levels
• Data at other public NIST sites:
  • Electron-Impact Ionization Cross Sections (on physics web site)
  • Gas Phase Kinetics Database
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Gas phase thermochemistry data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Gas Phase Heat Capacity (Shomate Equation)

C_p° = A + B*t + C*t² + D*t³ + E/t²
H° − H°_298.15= A*t + B*t²/2 + C*t³/3 + D*t⁴/4 − E/t + F − H
S° = A*ln(t) + B*t + C*t²/2 + D*t³/3 − E/(2*t²) + G
    C_p = heat capacity (J/mol*K)
    H° = standard enthalpy (kJ/mol)
    S° = standard entropy (J/mol*K)
    t = temperature (K) / 1000.

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Reaction thermochemistry data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled as indicated in comments:
B - John E. Bartmess
M - Michael M. Meot-Ner (Mautner) and Sharon G. Lias

Note: Please consider using the reaction search for this species. This page allows searching of all reactions involving this species. A general reaction search form is also available. Future versions of this site may rely on reaction search pages in place of the enumerated reaction displays seen below.

Individual Reactions

 +  = ( • )

By formula: F^- + F₄Si = (F^- • F₄Si)

CN^- +  = (CN^- • )

By formula: CN^- + F₄Si = (CN^- • F₄Si)

 +  = ( • )

By formula: Cl^- + F₄Si = (Cl^- • F₄Si)

C₆H₅NO₂^- +  = C₆H₅F₄NO₂Si^-

By formula: C₆H₅NO₂^- + F₄Si = C₆H₅F₄NO₂Si^-

C₆H₄FNO₂^- +  = C₆H₄F₅NO₂Si^-

By formula: C₆H₄FNO₂^- + F₄Si = C₆H₄F₅NO₂Si^-

C₆H₄ClNO₂^- +  = C₆H₄ClF₄NO₂Si^-

By formula: C₆H₄ClNO₂^- + F₄Si = C₆H₄ClF₄NO₂Si^-

C₇H₇NO₂^- +  = C₇H₇F₄NO₂Si^-

By formula: C₇H₇NO₂^- + F₄Si = C₇H₇F₄NO₂Si^-

 +  = C₆H₄F₄O₂Si^-

By formula: C₆H₄O₂^- + F₄Si = C₆H₄F₄O₂Si^-

C₆H₄N₂O₄^- +  = C₆H₄F₄N₂O₄Si^-

By formula: C₆H₄N₂O₄^- + F₄Si = C₆H₄F₄N₂O₄Si^-

F₅Si^- +  = F₉Si₂^-

By formula: F₅Si^- + F₄Si = F₉Si₂^-

C₆H₄FNO₂^- +  = C₆H₄F₅NO₂Si^-

By formula: C₆H₄FNO₂^- + F₄Si = C₆H₄F₅NO₂Si^-

C₆H₄ClNO₂^- +  = C₆H₄ClF₄NO₂Si^-

By formula: C₆H₄ClNO₂^- + F₄Si = C₆H₄ClF₄NO₂Si^-

C₆H₄FNO₂^- +  = C₆H₄F₅NO₂Si^-

By formula: C₆H₄FNO₂^- + F₄Si = C₆H₄F₅NO₂Si^-

C₆H₄ClNO₂^- +  = C₆H₄ClF₄NO₂Si^-

By formula: C₆H₄ClNO₂^- + F₄Si = C₆H₄ClF₄NO₂Si^-

C₇H₇NO₂^- +  = C₇H₇F₄NO₂Si^-

By formula: C₇H₇NO₂^- + F₄Si = C₇H₇F₄NO₂Si^-

C₇H₇NO₂^- +  = C₇H₇F₄NO₂Si^-

By formula: C₇H₇NO₂^- + F₄Si = C₇H₇F₄NO₂Si^-

C₆H₄N₂O₄^- +  = C₆H₄F₄N₂O₄Si^-

By formula: C₆H₄N₂O₄^- + F₄Si = C₆H₄F₄N₂O₄Si^-

C₆H₄N₂O₄^- +  = C₆H₄F₄N₂O₄Si^-

By formula: C₆H₄N₂O₄^- + F₄Si = C₆H₄F₄N₂O₄Si^-

C₆H₄NO₃^- +  = C₆H₄F₄NO₃Si^-

By formula: C₆H₄NO₃^- + F₄Si = C₆H₄F₄NO₃Si^-

C₆H₄BrNO₂^- +  = C₆H₄BrF₄NO₂Si^-

By formula: C₆H₄BrNO₂^- + F₄Si = C₆H₄BrF₄NO₂Si^-

C₆H₄BrNO₂^- +  = C₆H₄BrF₄NO₂Si^-

By formula: C₆H₄BrNO₂^- + F₄Si = C₆H₄BrF₄NO₂Si^-

C₇H₄F₃NO₂^- +  = C₇H₄F₇NO₂Si^-

By formula: C₇H₄F₃NO₂^- + F₄Si = C₇H₄F₇NO₂Si^-

C₁₀H₇NO₂^- +  = C₁₀H₇F₄NO₂Si^-

By formula: C₁₀H₇NO₂^- + F₄Si = C₁₀H₇F₄NO₂Si^-

C₇H₄F₃NO₂^- +  = C₇H₄F₇NO₂Si^-

By formula: C₇H₄F₃NO₂^- + F₄Si = C₇H₄F₇NO₂Si^-

C₇H₄N₂O₂^- +  = C₇H₄F₄N₂O₂Si^-

By formula: C₇H₄N₂O₂^- + F₄Si = C₇H₄F₄N₂O₂Si^-

C₈H₃F₆NO₂^- +  = C₈H₃F₁₀NO₂Si^-

By formula: C₈H₃F₆NO₂^- + F₄Si = C₈H₃F₁₀NO₂Si^-

C₈H₉NO₂^- +  = C₈H₉F₄NO₂Si^-

By formula: C₈H₉NO₂^- + F₄Si = C₈H₉F₄NO₂Si^-

C₁₃H₁₀O^- +  = C₁₃H₁₀F₄OSi^-

By formula: C₁₃H₁₀O^- + F₄Si = C₁₃H₁₀F₄OSi^-

C₇H₄F₃NO₂^- +  = C₇H₄F₇NO₂Si^-

By formula: C₇H₄F₃NO₂^- + F₄Si = C₇H₄F₇NO₂Si^-

C₆H₄NO₃^- +  = C₆H₄F₄NO₃Si^-

By formula: C₆H₄NO₃^- + F₄Si = C₆H₄F₄NO₃Si^-

C₇H₄N₂O₂^- +  = C₇H₄F₄N₂O₂Si^-

By formula: C₇H₄N₂O₂^- + F₄Si = C₇H₄F₄N₂O₂Si^-

Gas phase ion energetics data

Go To: Top, Gas phase thermochemistry data, Reaction thermochemistry data, References, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data evaluated as indicated in comments:
HL - Edward P. Hunter and Sharon G. Lias
L - Sharon G. Lias

Data compiled as indicated in comments:
MM - Michael M. Meot-Ner (Mautner)
LL - Sharon G. Lias and Joel F. Liebman
LBLHLM - Sharon G. Lias, John E. Bartmess, Joel F. Liebman, John L. Holmes, Rhoda D. Levin, and W. Gary Mallard
LLK - Sharon G. Lias, Rhoda D. Levin, and Sherif A. Kafafi
RDSH - Henry M. Rosenstock, Keith Draxl, Bruce W. Steiner, and John T. Herron

Proton affinity at 298K

Gas basicity at 298K

Protonation entropy at 298K

Ionization energy determinations

Appearance energy determinations

References

Go To: Top, Gas phase thermochemistry data, Reaction thermochemistry data, Gas phase ion energetics data, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Cox, Wagman, et al., 1984
Cox, J.D.; Wagman, D.D.; Medvedev, V.A., CODATA Key Values for Thermodynamics, Hemisphere Publishing Corp., New York, 1984, 1. [all data]

Chase, 1998
Chase, M.W., Jr., NIST-JANAF Themochemical Tables, Fourth Edition, J. Phys. Chem. Ref. Data, Monograph 9, 1998, 1-1951. [all data]

Kawamata, Neigishi, et al., 1996
Kawamata, H.; Neigishi, Y.; Kishi, R.; Iwata, S.; Nakajima, A.; Kaya, K., Photoelectron Spectroscopy of Silicon-Fluorine Binary Cluster Anions (SinFm-), J. Chem. Phys., 1996, 105, 13, 5369, https://doi.org/10.1063/1.472377 . [all data]

Murphy and Beauchamp, 1977
Murphy, M.K.; Beauchamp, J.L., Methyl and Fluorine Substituent Effects on the Gas Phase Lewis Acidities of Silanes by ICR Spectroscopy, J. Am. Chem. Soc., 1977, 99, 15, 4992, https://doi.org/10.1021/ja00457a017 . [all data]

Larson and McMahon, 1985
Larson, J.W.; McMahon, T.B., Fluoride and chloride affinities of the main group oxides, fluorides, oxofluorides, and alkyls. Quantitative scales of lewis acidities from ICR halide exchange equilibria, J. Am. Chem. Soc., 1985, 107, 766. [all data]

Wenthold and Squires, 1995
Wenthold, P.G.; Squires, R.R., Bond dissociation energies of F2(-) and HF2(-). A gas-phase experimental and G2 theoretical study, J. Phys. Chem., 1995, 99, 7, 2002, https://doi.org/10.1021/j100007a034 . [all data]

Larson and McMahon, 1984
Larson, J.W.; McMahon, T.B., Fluoride and chloride affinities of main group oxides, fluorides, oxofluorides, and alkyls. Quantitative scales of lewis acidities from ion cyclotron resonance halide-exchange equilibria, J. Phys. Chem., 1984, 88, 1083. [all data]

Larson, Szulejko, et al., 1988
Larson, J.W.; Szulejko, J.E.; McMahon, T.B., Gas Phase Lewis Acid-Base Interactions. An Experimental Determination of Cyanide Binding Energies From Ion Cyclotron Resonance and High-Pressure Mass Spectrometric Equilibrium Measurements., J. Am. Chem. Soc., 1988, 110, 23, 7604, https://doi.org/10.1021/ja00231a004 . [all data]

Payzant, Yamdagni, et al., 1971
Payzant, J.D.; Yamdagni, R.; Kebarle, P., Hydration of CN-, NO₂-, NO₃-, and HO- in the gas phase, Can. J. Chem., 1971, 49, 3308. [all data]

Williamson, Knighton, et al., 2001
Williamson, D.H.; Knighton, W.B.; Grimsrud, E.P., Lewis acid-base interactions of SiF4 with molecular anions formed by electron capture reactions, Int. J. Mass Spectrom., 2001, 206, 1-2, 53-61, https://doi.org/10.1016/S1387-3806(00)00388-2 . [all data]

Hiraoka, Nasu, et al., 2000
Hiraoka, K.; Nasu, M.; Minamitsu, A.; Shimizu, A.; Yamabe, S., On the structure and stability of gas-phase cluster ions SiF3+(CO)(n), SiF3OH2+(SiF4)(n), SiF4H+(SiF4)(n), and F- (SiF4)(n), J. Phys. Chem. A, 2000, 104, 36, 8353-8359, https://doi.org/10.1021/jp000525d . [all data]

Hunter and Lias, 1998
Hunter, E.P.; Lias, S.G., Evaluated Gas Phase Basicities and Proton Affinities of Molecules: An Update, J. Phys. Chem. Ref. Data, 1998, 27, 3, 413-656, https://doi.org/10.1063/1.556018 . [all data]

Ling, Milburn, et al., 1999
Ling, Y.; Milburn, R.K.; Hopkinson, A.C.; Bohme, D.K., Experimental and theoretical studies of the proton affinity of SiF4 and the structure of SiF4H+, J. Am. Soc. Mass Spectrom., 1999, 10, 848. [all data]

Kickel, Fisher, et al., 1993
Kickel, B.L.; Fisher, E.R.; Armentrout, P.B., Dissociative charge-transfer reactions of N⁺(³P), N₂⁺(²_g⁺), Ar⁺(²P_3/2,_1/2), and Kr⁺(²P_3/2) with SiF₄. Thermochemistry of SiF₄⁺ and SiF₃⁺, J. Phys. Chem., 1993, 97, 10198. [all data]

Murphy and Beauchamp, 1977, 2
Murphy, M.K.; Beauchamp, J.L., Photoionization mass spectrometry of the fluoromethylsilanes (CH₃)_n F_4-nSi (n = 1-4), J. Am. Chem. Soc., 1977, 99, 2085. [all data]

Farber and Srivastava, 1977
Farber, M.; Srivastava, R.D., Mass spectrometric determination of the heats of formation of the silane fluorides, Chem. Phys. Lett., 1977, 51, 307. [all data]

Lloyd and Roberts, 1975
Lloyd, D.R.; Roberts, P.J., Photoelectron spectra of halides. VII. Variable temperature He(I) and He(II) studies of CF₄, SiF₄, and GeF₄, J. Electron Spectrosc. Relat. Phenom., 1975, 7, 325. [all data]

Bassett and Lloyd, 1971
Bassett, P.J.; Lloyd, D.R., Photoelectron spectra of halides. Part I. Tetrafluorides and tetrachlorides of group IVB, J. Chem. Soc., 1971, (A), 641. [all data]

Bull, Pullen, et al., 1970
Bull, W.E.; Pullen, B.P.; Grimm, F.A.; Moddeman, W.E.; Schweitzer, G.K.; Carlson, T.A., High resolution photoelectron spectroscopy of carbon and silicon tetrafluorides, Inorg. Chem., 1970, 9, 2474. [all data]

McDonald, Williams, et al., 1968
McDonald, J.D.; Williams, C.H.; Thompson, J.C.; Margrave, J.L., Appearance potentials, ionization potentials and heats of formation for perfluorosilanes and perfluoroborosilanes, Advan. Chem. Ser., 1968, 72, 261. [all data]

Bieri, Asbrink, et al., 1982
Bieri, G.; Asbrink, L.; Von Niessen, W., 30.4-nm He(II) photoelectron spectra of organic molecules, J. Electron Spectrosc. Relat. Phenom., 1982, 27, 129. [all data]

Fehlner and Turner, 1974
Fehlner, T.P.; Turner, D.W., The photoelectron spectrum of SiF₂, Inorg. Chem., 1974, 13, 754. [all data]

Jonas, Schweitzer, et al., 1973
Jonas, A.E.; Schweitzer, G.K.; Grimm, F.A.; Carlson, T.A., The photoelectron spectra of the tetrafluoro and tetramethyl compounds of the group IV elements, J. Electron Spectrosc. Relat. Phenom., 1973, 1, 29. [all data]

Notes

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• Symbols used in this document:
  

  AE	Appearance energy
  IE (evaluated)	Recommended ionization energy
  S°gas,1 bar	Entropy of gas at standard conditions (1 bar)
  ΔfH°gas	Enthalpy of formation of gas at standard conditions
  ΔrG°	Free energy of reaction at standard conditions
  ΔrH°	Enthalpy of reaction at standard conditions
  ΔrS°	Entropy of reaction at standard conditions

• Data from NIST Standard Reference Database 69: NIST Chemistry WebBook
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