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Silane, tetramethyl-

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Gas phase ion energetics data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data evaluated as indicated in comments:
L - Sharon G. Lias

Data compiled as indicated in comments:
B - John E. Bartmess
LLK - Sharon G. Lias, Rhoda D. Levin, and Sherif A. Kafafi
RDSH - Henry M. Rosenstock, Keith Draxl, Bruce W. Steiner, and John T. Herron
LBLHLM - Sharon G. Lias, John E. Bartmess, Joel F. Liebman, John L. Holmes, Rhoda D. Levin, and W. Gary Mallard

Quantity Value Units Method Reference Comment
IE (evaluated)9.80 ± 0.04eVN/AN/AL

Ionization energy determinations

IE (eV) Method Reference Comment
9.80 ± 0.03PIMurphy and Beauchamp, 1977LLK
9.6PEPotzinger, Ritter, et al., 1975LLK
9.99 ± 0.03EIMacLean and Sacher, 1974LLK
9.79 ± 0.04PEJonas, Schweitzer, et al., 1973LLK
9.4 ± 0.1PEEvans, Green, et al., 1972LLK
9.85 ± 0.16EILappert, Pedley, et al., 1971LLK
9.74 ± 0.05EIPotzinger and Lampe, 1970RDSH
9.86 ± 0.02PIDistefano, 1970RDSH
9.85 ± 0.16EILappert, Simpson, et al., 1969RDSH
9.9 ± 0.1EIBand, Davidson, et al., 1968RDSH
9.98 ± 0.03EIHess, Lampe, et al., 1965RDSH
10.29PEKhvostenko, Zykov, et al., 1981Vertical value; LLK
10.4PERoberge, Sandorfy, et al., 1978Vertical value; LLK
10.57PEStarzewski, Richter, et al., 1976Vertical value; LLK

Appearance energy determinations

Ion AE (eV) Other Products MethodReferenceComment
CH3Si+17.3?EIdeRidder and Dijkstra, 1967RDSH
CH3Si+17.1 ± 0.4?EIHobrock and Kiser, 1961RDSH
CH4Si+16.3?EIdeRidder and Dijkstra, 1967RDSH
CH5Si+13.81 ± 0.02C2H4+CH3PIDistefano, 1970RDSH
CH5Si+14.4C2H4+CH3EIdeRidder and Dijkstra, 1967RDSH
C2H6Si+13.4?EIdeRidder and Dijkstra, 1967RDSH
C2H6Si+13.9 ± 0.3?EIHobrock and Kiser, 1961RDSH
C2H7Si+13.3?EIdeRidder and Dijkstra, 1967RDSH
C3H9Si+10.09 ± 0.01CH3PIPECOSzepes and Baer, 1984T = 298K; LBLHLM
C3H9Si+10.28 ± 0.01CH3PIPECOSzepes and Baer, 1984T = 0K; LBLHLM
C3H9Si+10.28 ± 0.01CH3PIPECOSzepes and Baer, 1984, 2T = 0K; LBLHLM
C3H9Si+10.03 ± 0.04CH3PIMurphy and Beauchamp, 1977LLK
C3H9Si+10.3 ± 0.1CH3EIPotzinger, Ritter, et al., 1975LLK
C3H9Si+10.63 ± 0.05CH3EIMacLean and Sacher, 1974LLK
C3H9Si+10.53 ± 0.20CH3EILappert, Pedley, et al., 1971LLK
C3H9Si+10.25 ± 0.05CH3EIPotzinger and Lampe, 1970RDSH
C3H9Si+10.09 ± 0.02CH3PIDistefano, 1970RDSH
C3H9Si+10.53 ± 0.20CH3EILappert, Simpson, et al., 1969RDSH
C3H9Si+10.4 ± 0.1CH3EIBand, Davidson, et al., Commun. 1967RDSH
C3H9Si+10.5 ± 0.1CH3EIConnor, Finney, et al., 1966RDSH
C3H9Si+10.63 ± 0.13CH3EIHess, Lampe, et al., 1964RDSH
SiH+18.2?EIdeRidder and Dijkstra, 1967RDSH
SiH3+16.5?EIdeRidder and Dijkstra, 1967RDSH
Si+17.9?EIdeRidder and Dijkstra, 1967RDSH

De-protonation reactions

C4H11Si- + Hydrogen cation = Silane, tetramethyl-

By formula: C4H11Si- + H+ = C4H12Si

Quantity Value Units Method Reference Comment
Deltar388.2 ± 3.1kcal/molG+TSDamrauer, Kass, et al., 1988gas phase; Comparable to fluorobenzene; B
Deltar390.9 ± 2.0kcal/molD-EAWetzel and Brauman, 1988gas phase; B
Quantity Value Units Method Reference Comment
Deltar379.0 ± 3.0kcal/molIMRBDamrauer, Kass, et al., 1988gas phase; Comparable to fluorobenzene; B
Deltar381.7 ± 2.1kcal/molH-TSWetzel and Brauman, 1988gas phase; B
Deltar390.7 ± 5.0kcal/molIMRBDePuy and Damrauer, 1984gas phase; B


Go To: Top, Gas phase ion energetics data, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Murphy and Beauchamp, 1977
Murphy, M.K.; Beauchamp, J.L., Photoionization mass spectrometry of the fluoromethylsilanes (CH3)n F4-nSi (n = 1-4), J. Am. Chem. Soc., 1977, 99, 2085. [all data]

Potzinger, Ritter, et al., 1975
Potzinger, P.; Ritter, A.; Krause, J., Massenspektrometrische Bestimmung von Bindungsenergien in siliciumorganischen Verbindungen, Z. Naturforsch. A:, 1975, 30, 347. [all data]

MacLean and Sacher, 1974
MacLean, D.I.; Sacher, R.E., A study of some spectroscopic properties of Group IVA acetylides, J. Organomet. Chem., 1974, 74, 197. [all data]

Jonas, Schweitzer, et al., 1973
Jonas, A.E.; Schweitzer, G.K.; Grimm, F.A.; Carlson, T.A., The photoelectron spectra of the tetrafluoro and tetramethyl compounds of the group IV elements, J. Electron Spectrosc. Relat. Phenom., 1973, 1, 29. [all data]

Evans, Green, et al., 1972
Evans, S.; Green, J.C.; Joachim, P.J.; Orchard, A.F.; Turner, D.W.; Maier, J.P., Electronic structures of the Group IVB tetramethyls by helium-(I) photoelectron spectroscopy, J. Chem. Soc. Faraday Trans. 2, 1972, 68, 905. [all data]

Lappert, Pedley, et al., 1971
Lappert, M.F.; Pedley, J.B.; Simpson, J.; Spalding, T.R., Bonding studies of compounds of boron and the Group IV elements. VI. Mass spectrometric studies on compounds Me4M and Me3M-M'Me3 (M and M'=C, Si, Ge, Sn, and Pb): thermochemical data, J. Organomet. Chem., 1971, 29, 195. [all data]

Potzinger and Lampe, 1970
Potzinger, P.; Lampe, F.W., Thermochemistry of simple alkylsilanes, J. Phys. Chem., 1970, 74, 719. [all data]

Distefano, 1970
Distefano, G., Photoionization study of tetramethylsilicon, Inorg. Chem., 1970, 9, 1919. [all data]

Lappert, Simpson, et al., 1969
Lappert, M.F.; Simpson, J.; Spalding, T.R., Bonding studies of compounds of the group IV elements: ionisation potentials of the Me3M radicals, J.Organometal. Chem., 1969, 17, PI. [all data]

Band, Davidson, et al., 1968
Band, S.J.; Davidson, I.M.T.; Lambert, C.A., Bond dissociation energies: electron impact studies on some trimethylsilyl compounds, J. Chem. Soc. A, 1968, 2068. [all data]

Hess, Lampe, et al., 1965
Hess, G.G.; Lampe, F.W.; Sommer, L.H., An electron impact study of ionization and dissociation of trimethylsilanes, J. Am. Chem. Soc., 1965, 87, 5327. [all data]

Khvostenko, Zykov, et al., 1981
Khvostenko, V.I.; Zykov, B.G.; Yuriev, V.P.; Mironov, V.F.; Kovel'zon, G.I.; Panasenko, A.A.; Sheludyakov, V.D.; Gailyunas, I.A., Study of d(«pi»)-p(«pi») interaction in vinyl- and alkylsilicon-containing compounds by photoelectron spectroscopy, J. Organomet. Chem., 1981, 218, 155. [all data]

Roberge, Sandorfy, et al., 1978
Roberge, R.; Sandorfy, C.; Matthews, J.I.; Strausz, O.P., The far ultraviolet HeI photoelectron spectra of alkyl and fluorine substituted silane derivatives, J. Chem. Phys., 1978, 69, 5105. [all data]

Starzewski, Richter, et al., 1976
Starzewski, K.-H.A.O.; Richter, W.; Schmidbaur, H., Photoelektronenspektren und Struktur von Arsenyliden. P versus As: Ein Beitrag zur Problematik der ylidischen Bindung, Chem. Ber., 1976, 109, 473. [all data]

deRidder and Dijkstra, 1967
deRidder, J.J.; Dijkstra, G., Mass spectra of the tetramethyl and tetraethyl compounds of carbon, silicon, germanium, tin and lead, Rec. Trav. Chim., 1967, 86, 737. [all data]

Hobrock and Kiser, 1961
Hobrock, B.G.; Kiser, R.W., Electron impact spectroscopy of tetramethylsilicon, -tin and -lead, J. Phys. Chem., 1961, 65, 2186. [all data]

Szepes and Baer, 1984
Szepes, L.; Baer, T., Dissociation dynamics of energy selected hexamethyldisilane ions and the heats of formation of (CH3)3Si+ and (CH3)3Si, J. Am. Chem. Soc., 1984, 106, 273. [all data]

Szepes and Baer, 1984, 2
Szepes, L.; Baer, T., (CH3)3SiX tipusu vegyuletek vizsgalata fotoelectron-fotoion koincidenciaval,I. Meghatarozott belso energiaju hexametil-diszilan-ionok disszociaciojanak dinamikaja, Magy. Kem. Foly., 1984, 90, 104. [all data]

Band, Davidson, et al., Commun. 1967
Band, S.J.; Davidson, I.M.T.; Lambert, C.A.; Stephenson, I.L., Bond dissociation energies and heats of formation of trimethylsilyl compounds, Chem., Commun. 1967, 723. [all data]

Connor, Finney, et al., 1966
Connor, J.A.; Finney, G.; Leigh, G.J.; Haszeldine, R.N.; Robinson, P.J.; Sedgwick, R.D.; Simmons, R.F., Bond dissociation energies in organosilicon compounds, Chem. Commun., 1966, 178. [all data]

Hess, Lampe, et al., 1964
Hess, G.G.; Lampe, F.W.; Sommer, L.H., Bond dissociation energies and ion energetics in organosilicon compounds by electron impact, J. Am. Chem. Soc., 1964, 86, 3174. [all data]

Damrauer, Kass, et al., 1988
Damrauer, R.; Kass, S.R.; DePuy, C.H., Gas-Phase Acidities of Methylsilanes: C-H versus Si-H, Organomet., 1988, 7, 3, 637, https://doi.org/10.1021/om00093a011 . [all data]

Wetzel and Brauman, 1988
Wetzel, D.M.; Brauman, J.I., Quantitative Measure of alpha-Silyl Carbanion Stabilization. The Electron Affinity of (Trimethylsilyl)methyl Radical, J. Am. Chem. Soc., 1988, 110, 25, 8333, https://doi.org/10.1021/ja00233a008 . [all data]

DePuy and Damrauer, 1984
DePuy, C.H.; Damrauer, R., Reactions of organosilane anionic species with nitrous oxide, Organometallics, 1984, 3, 362. [all data]


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