trans-Linalool oxide (furanoid)


Normal alkane RI, polar column, temperature ramp

Go To: Top, References, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled by: NIST Mass Spectrometry Data Center, William E. Wallace, director

Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase HP-InnowaxDB-WaxHP-InnowaxCarbowaxTC-FFAP
Column length (m) 30.30.50.60. 
Carrier gas NitrogenHeliumHeliumHeHe
Substrate      
Column diameter (mm) 0.250.250.200.20.25
Phase thickness (μm) 0.520.250.200.250.25
Tstart (C) 35.40.45.60.60.
Tend (C) 205.230.190.250.220.
Heat rate (K/min) 3.3.4.2.3.
Initial hold (min) 10.2.2.8. 
Final hold (min) 10.5.50.15.30.
I 1475.1472.1477.1450.1453.
ReferenceWannes, Mhamdi, et al., 2009Zhao, Xu, et al., 2009Soria, Sanz, et al., 2008Ferhat, Tigrine-Kordjani, et al., 2007Kurose, Okamura, et al., 2007
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Supelcowax-10DB-WaxDB-Wax EtrDB-WaxSupelcowax
Column length (m) 30.60.60.60.30.
Carrier gas HeHeHe N2
Substrate      
Column diameter (mm) 0.250.250.250.250.32
Phase thickness (μm) 0.250.50.250.250.25
Tstart (C) 40.50.40.70.50.
Tend (C) 250.230.230.230.200.
Heat rate (K/min) 3.3.2.2.5.
Initial hold (min) 5.2.5.2. 
Final hold (min) 10.20.100.20. 
I 1475.1466.1476.1473.1438.
ReferenceVichi, Riu-Aumatell, et al., 2007Cai, Lin, et al., 2006Ibarz, Ferreira, et al., 2006Lan Phi N.T., Nishiyama C., et al., 2006Martin, Joseph, et al., 2006
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase HP-WaxHP-20MHP-20MNB-20MDB-Wax
Column length (m) 30.30.50.30.60.
Carrier gas NitrogenN2HeHe 
Substrate      
Column diameter (mm) 0.250.250.20.20.25
Phase thickness (μm) 0.250.250.20.250.25
Tstart (C) 50.50.70.50.70.
Tend (C) 280.250.180.250.230.
Heat rate (K/min) 5.5.4.2.2.
Initial hold (min)   4. 2.
Final hold (min) 5.10.15. 20.
I 1469.1469.1434.1453.1477.
ReferenceMarzouk, Mansour, et al., 2006Marzouk, Neffati, et al., 2006Mastelic, Jerkovic, et al., 2006Orav, Raal, et al., 2006Sawamura, Onishi, et al., 2006
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Carbowax-PEGSupelcowax-10Supelcowax-10Carbowax 20MCarbowax 20M
Column length (m) 60.30.30.60.50.
Carrier gas HeliumHeHeN2Helium
Substrate      
Column diameter (mm) 0.200.250.250.250.25
Phase thickness (μm) 0.250.250.250.250.25
Tstart (C) 60.50.50.40.40.
Tend (C) 250.220.250.190.190.
Heat rate (K/min) 2.4.4.10.4.
Initial hold (min) 8.1.1.2.2.
Final hold (min) 15.10.10.15.30.
I 1450.1438.1480.1451.1461.
ReferenceTigrine-Kordiani, Meklati, et al., 2006Wong, Lim, et al., 2006Wong, Sivasothy, et al., 2006Babu and Kaul, 2005de la Fuente, Martinez-Castro, et al., 2005
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase SupelcowaxStabilwaxDB-WaxDB-WaxSupelcowax-10
Column length (m) 60.30.30.60.30.
Carrier gas He HeN2He
Substrate      
Column diameter (mm) 0.20.320.250.250.25
Phase thickness (μm) 0.20.50.250.250.25
Tstart (C) 60.40.50.70.50.
Tend (C) 230.280.180.230.220.
Heat rate (K/min) 4.6.3.2.4.
Initial hold (min) 30.5. 2.3.
Final hold (min)  5.40.20.30.
I 1438.1436.1468.1481.1435.
ReferenceGauvin and Smadja, 2005Jirovetz, Buchbauer, et al., 2005Lee, Umano, et al., 2005Njoroge, Koaze, et al., 2005Wong and Tan, 2005
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxNB-20MHP-InnowaxCarbowax 20M
Column length (m) 60.60.50.50.25.
Carrier gas N2N2HeHeN2
Substrate      
Column diameter (mm) 0.250.250.20.20.22
Phase thickness (μm) 0.250.250.250.20.25
Tstart (C) 70.70.50.45.50.
Tend (C) 230.230.250.190.200.
Heat rate (K/min) 2.2.2.4.5.
Initial hold (min) 2.2. 2. 
Final hold (min) 20.20. 50. 
I 1480.1459.1455.1483.1463.
ReferenceChoi, 2004Choi, 2004, 2Raal, Arak, et al., 2004Soria, Gonzalez, et al., 2004Agnaniet, Mounzeo, et al., 2003
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxHP-InnowaxCarbowax 20MDB-WaxDB-Wax
Column length (m) 60.50.50.60.60.
Carrier gas HeliumHeHeN2 
Substrate      
Column diameter (mm) 0.250.20.250.250.25
Phase thickness (μm)  0.20.250.25 
Tstart (C) 70.45.45.70.60.
Tend (C) 210.190.190.230.180.
Heat rate (K/min) 2.4.4.2.3.
Initial hold (min)  2.2.2.4.
Final hold (min) 60.50.50.20. 
I 1475.1478.1478.1441.1454.
ReferenceMookdasanit, Tamura, et al., 2003Soria, Martinez-Castro, et al., 2003Soria, Martinez-Castro, et al., 2003Tu, Onishi, et al., 2003Ito, Sugimoto, et al., 2002
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Supelcowax-10DB-WaxDB-WaxDB-WaxCP-Wax 52CB
Column length (m) 60.60.60.30.50.
Carrier gas HeN2N2HeHe
Substrate      
Column diameter (mm) 0.20.250.250.250.30
Phase thickness (μm) 0.50.250.250.10.25
Tstart (C) 70.70.70.40.40.
Tend (C) 220.230.230.180.220.
Heat rate (K/min) 2.2.2.2.3.
Initial hold (min)  2. 5.5.
Final hold (min)  20. 20. 
I 1451.1464.1480.1439.1450.
ReferenceOrav, Kailas, et al., 2002Tu, Onishi, et al., 2002Tu, Thanh, et al., 2002Kato and Shibamoto, 2001Chagonda, Makanda, et al., 2000
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxDB-WaxDB-WaxCarbowax
Column length (m) 25.25.30.30.50.
Carrier gas HeHeHeHeN2
Substrate      
Column diameter (mm) 0.250.250.250.250.2
Phase thickness (μm) 0.250.250.250.25 
Tstart (C) 50.50.50.50.80.
Tend (C) 200.200.240.240.200.
Heat rate (K/min) 4.4.4.4.1.
Initial hold (min) 4.4.3.3. 
Final hold (min) 10.10.10.10.20.
I 1461.1461.1440.1455.1451.
ReferenceMorales, Duque, et al., 2000Morales, Duque, et al., 2000Parada, Duque, et al., 2000Parada, Duque, et al., 2000Menon, Chacko, et al., 1999
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase HP-InnowaxDB-WaxSupelcowax-10HP-InnowaxHP-Innowax
Column length (m) 25.60.30.25.25.
Carrier gas  HeHe  
Substrate      
Column diameter (mm) 0.250.250.250.320.32
Phase thickness (μm)  0.25   
Tstart (C) 35.40.60.35.35.
Tend (C) 250.200.240.250.250.
Heat rate (K/min) 4.2.4.4.4.
Initial hold (min)  2.   
Final hold (min)      
I 1453.1471.1449.1453.1453.
ReferenceOng and Acree, 1999Umano, Nakahara, et al., 1999Lamarque, Maestri, et al., 1998Ong and Acree, 1998Ong, Acree, et al., 1998
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase TC-WaxSupelcowax-10Carbowax 20MCarbowax 20MDB-Wax
Column length (m) 60.60.50.50.60.
Carrier gas  HeHeHeHe
Substrate      
Column diameter (mm) 0.250.250.250.250.32
Phase thickness (μm)  0.25  0.25
Tstart (C) 80.40.60.60.30.
Tend (C) 240.200.180.180.180.
Heat rate (K/min) 3.3.2.2.2.
Initial hold (min) 5.3.4.4.4.
Final hold (min)  30.  25.
I 1475.1468.1440.1440.1425.
ReferenceShuichi, Masazumi, et al., 1996Wong and Lai, 1996Kawakami, Kobayashi, et al., 1993Kawakami and Kobayashi, 1991Takeoka, Buttery, et al., 1991
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Carbowax 20MCarbowax 20MDB-WaxDB-WaxCarbowax 20M
Column length (m) 50.50.60.60.50.
Carrier gas N2N2H2H2N2
Substrate      
Column diameter (mm) 0.220.220.250.250.22
Phase thickness (μm)   0.250.25 
Tstart (C) 80.80.30.30.80.
Tend (C) 200.200.180.180.200.
Heat rate (K/min) 3.3.2.2.3.
Initial hold (min)   2.2. 
Final hold (min)      
I 1464.1465.1438.1439.1464.
ReferenceMihara, Tateba, et al., 1988Mihara, Tateba, et al., 1988Takeoka, Flath, et al., 1988Takeoka, Flath, et al., 1988Mihara, Tateba, et al., 1987
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillary
Active phase Carbowax 20MCarbowax 20MCarbowax 20MCarbowax 20M
Column length (m) 50.150.50.150.
Carrier gas N2   
Substrate     
Column diameter (mm) 0.220.660.320.64
Phase thickness (μm)     
Tstart (C) 80.60.70.50.
Tend (C) 200.170.180.170.
Heat rate (K/min) 3.1.2.1.
Initial hold (min)  40. 30.
Final hold (min)     
I 1465.1440.1424.1440.
ReferenceMihara, Tateba, et al., 1987Buttery, Xu, et al., 1985Engel and Tressl, 1983Buttery, Parker, et al., 1981
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI

References

Go To: Top, Normal alkane RI, polar column, temperature ramp, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Wannes, Mhamdi, et al., 2009
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Soria, Martinez-Castro, et al., 2003
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Ito, Sugimoto, et al., 2002
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Orav, Kailas, et al., 2002
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Tu, Onishi, et al., 2002
Tu, N.T.M.; Onishi, Y.; Choi, H.-S.; Kondo, Y.; Bassore, S.M.; Ukeda, H.; Sawamura, M., Characteristic odor components of Citrus sphaerocarpa Tanaka (Kabosu) cold-pressed peel oil, J. Agric. Food Chem., 2002, 50, 10, 2908-2913, https://doi.org/10.1021/jf011578a . [all data]

Tu, Thanh, et al., 2002
Tu, N.T.M.; Thanh, L.X.; Une, A.; Ukeda, H.; Sawamura, M., Volatile constituents of Vietnamese pummelo, orange, tangerine and lime peel oils, Flavour Fragr. J., 2002, 17, 3, 169-174, https://doi.org/10.1002/ffj.1076 . [all data]

Kato and Shibamoto, 2001
Kato, M.; Shibamoto, T., Variation of major volatile constituents in various green teas from Southeast Asia, J. Agric. Food Chem., 2001, 49, 3, 1394-1396, https://doi.org/10.1021/jf001321x . [all data]

Chagonda, Makanda, et al., 2000
Chagonda, L.S.; Makanda, C.; Chalchat, J.-C., The essential oils of wild and cultivated Cymbopogon validus (Stapf) Stapf ex Burtt Davy and Elionurus muticus (Spreng.) Kunth from Zimbabwe, Flavour Fragr. J., 2000, 15, 2, 100-104, https://doi.org/10.1002/(SICI)1099-1026(200003/04)15:2<100::AID-FFJ874>3.0.CO;2-Y . [all data]

Morales, Duque, et al., 2000
Morales, A.L.; Duque, C.; Bautista, E., Identification of free and glycosidically bound volatiles and glycosides by capillary GC and capillary GC-MS in Lulo del Chocó (Solanum topiro), J. Hi. Res. Chromatogr., 2000, 23, 5, 379-385, https://doi.org/10.1002/(SICI)1521-4168(20000501)23:5<379::AID-JHRC379>3.0.CO;2-B . [all data]

Parada, Duque, et al., 2000
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Notes

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