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Disilane, hexamethyl-

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Gas phase ion energetics data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled as indicated in comments:
LBLHLM - Sharon G. Lias, John E. Bartmess, Joel F. Liebman, John L. Holmes, Rhoda D. Levin, and W. Gary Mallard
LLK - Sharon G. Lias, Rhoda D. Levin, and Sherif A. Kafafi
RDSH - Henry M. Rosenstock, Keith Draxl, Bruce W. Steiner, and John T. Herron

Ionization energy determinations

IE (eV) Method Reference Comment
8.27 ± 0.05PIPECOSzepes and Baer, 1984T = 298K; LBLHLM
8.27 ± 0.05PIPECOSzepes and Baer, 1984T = 0K; LBLHLM
8.27 ± 0.05PIPECOSzepes and Baer, 1984, 2T = 0K; LBLHLM
8.4PESzepes, Koranyi, et al., 1981LLK
8.0PEPotzinger, Ritter, et al., 1975LLK
8.35 ± 0.12EILappert, Pedley, et al., 1971LLK
8.46 ± 0.15EIGaidis, Briggs, et al., 1971LLK
8.00 ± 0.01EIPitt, Bursey, et al., 1970RDSH
8.35 ± 0.12EILappert, Simpson, et al., 1969RDSH
8.79 ± 0.08EIHess, Lampe, et al., 1965RDSH
8.68PEMochida, Worley, et al., 1985Vertical value; LBLHLM
8.7 ± 0.05PESzepes, Koranyi, et al., 1981Vertical value; LLK
8.69PEKhvostenko, Zykov, et al., 1981Vertical value; LLK
8.69PEBock and Ensslin, 1971Vertical value; LLK

Appearance energy determinations

Ion AE (eV) Other Products MethodReferenceComment
C3H9Si+9.8 ± 0.1C3H9SiPIPECOSzepes and Baer, 1984T = 0K; LBLHLM
C3H9Si+9.9(CH3)3SiEIPotzinger, Ritter, et al., 1975LLK
C3H9Si+10.22 ± 0.18(CH3)3SiEILappert, Pedley, et al., 1971LLK
C3H9Si+10.22 ± 0.18?EILappert, Simpson, et al., 1969RDSH
C3H9Si+10.0 ± 0.1?EIBand, Davidson, et al., Commun. 1967RDSH
C3H9Si+10.0 ± 0.1?EIConnor, Finney, et al., 1966RDSH
C3H9Si+10.69 ± 0.04?EIHess, Lampe, et al., 1964RDSH
C5H15Si2+9.6 ± 0.1CH3PIPECOSzepes and Baer, 1984T = 0K; LBLHLM
C5H15Si2+9.6 ± 0.1CH3PIPECOSzepes and Baer, 1984, 2T = 0K; LBLHLM
C5H15Si2+10.74 ± 0.08CH3EIHess, Lampe, et al., 1965RDSH


Go To: Top, Gas phase ion energetics data, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Szepes and Baer, 1984
Szepes, L.; Baer, T., Dissociation dynamics of energy selected hexamethyldisilane ions and the heats of formation of (CH3)3Si+ and (CH3)3Si, J. Am. Chem. Soc., 1984, 106, 273. [all data]

Szepes and Baer, 1984, 2
Szepes, L.; Baer, T., (CH3)3SiX tipusu vegyuletek vizsgalata fotoelectron-fotoion koincidenciaval,I. Meghatarozott belso energiaju hexametil-diszilan-ionok disszociaciojanak dinamikaja, Magy. Kem. Foly., 1984, 90, 104. [all data]

Szepes, Koranyi, et al., 1981
Szepes, L.; Koranyi, T.; Naray-Szabo, G.; Modelli, A.; Distefano, G., Ultraviolet photoelectron spectra of group IV hexamethyl derivatives containing a metal-metal bond, J. Organomet. Chem., 1981, 217, 35. [all data]

Potzinger, Ritter, et al., 1975
Potzinger, P.; Ritter, A.; Krause, J., Massenspektrometrische Bestimmung von Bindungsenergien in siliciumorganischen Verbindungen, Z. Naturforsch. A:, 1975, 30, 347. [all data]

Lappert, Pedley, et al., 1971
Lappert, M.F.; Pedley, J.B.; Simpson, J.; Spalding, T.R., Bonding studies of compounds of boron and the Group IV elements. VI. Mass spectrometric studies on compounds Me4M and Me3M-M'Me3 (M and M'=C, Si, Ge, Sn, and Pb): thermochemical data, J. Organomet. Chem., 1971, 29, 195. [all data]

Gaidis, Briggs, et al., 1971
Gaidis, J.M.; Briggs, P.R.; Shannon, T.W., Mass spectra of disilanes. Phenyl-silicon interaction and silicon-silicon bond strength, J. Phys. Chem., 1971, 75, 974. [all data]

Pitt, Bursey, et al., 1970
Pitt, C.G.; Bursey, M.M.; Rogerson, P.F., Catenates of the group IV elements. Correlation of «sigma» electron energies, J. Am. Chem. Soc., 1970, 92, 519. [all data]

Lappert, Simpson, et al., 1969
Lappert, M.F.; Simpson, J.; Spalding, T.R., Bonding studies of compounds of the group IV elements: ionisation potentials of the Me3M radicals, J.Organometal. Chem., 1969, 17, PI. [all data]

Hess, Lampe, et al., 1965
Hess, G.G.; Lampe, F.W.; Sommer, L.H., An electron impact study of ionization and dissociation of trimethylsilanes, J. Am. Chem. Soc., 1965, 87, 5327. [all data]

Mochida, Worley, et al., 1985
Mochida, K.; Worley, S.; Kochi, J., UV photoelectron spectra of peralkylated catenates of Group 4B elements (silicon, germanium, and tin), Bull. Chem. Soc. Jpn., 1985, 58, 3389. [all data]

Khvostenko, Zykov, et al., 1981
Khvostenko, V.I.; Zykov, B.G.; Yuriev, V.P.; Mironov, V.F.; Kovel'zon, G.I.; Panasenko, A.A.; Sheludyakov, V.D.; Gailyunas, I.A., Study of d(«pi»)-p(«pi») interaction in vinyl- and alkylsilicon-containing compounds by photoelectron spectroscopy, J. Organomet. Chem., 1981, 218, 155. [all data]

Bock and Ensslin, 1971
Bock, H.; Ensslin, W., Bond-bond interaction in polysilanes, Angew. Chem. Int. Ed. Engl., 1971, 10, 404. [all data]

Band, Davidson, et al., Commun. 1967
Band, S.J.; Davidson, I.M.T.; Lambert, C.A.; Stephenson, I.L., Bond dissociation energies and heats of formation of trimethylsilyl compounds, Chem., Commun. 1967, 723. [all data]

Connor, Finney, et al., 1966
Connor, J.A.; Finney, G.; Leigh, G.J.; Haszeldine, R.N.; Robinson, P.J.; Sedgwick, R.D.; Simmons, R.F., Bond dissociation energies in organosilicon compounds, Chem. Commun., 1966, 178. [all data]

Hess, Lampe, et al., 1964
Hess, G.G.; Lampe, F.W.; Sommer, L.H., Bond dissociation energies and ion energetics in organosilicon compounds by electron impact, J. Am. Chem. Soc., 1964, 86, 3174. [all data]


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