Hexanoic acid, ethyl ester

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Van Den Dool and Kratz RI, polar column, temperature ramp

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled by: NIST Mass Spectrometry Data Center, William E. Wallace, director

Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxInnowaxDB-WaxDB-WaxDB-Wax
Column length (m) 30.30.30.30.30.
Carrier gas HeH2HeHeHe
Substrate      
Column diameter (mm) 0.250.250.250.250.25
Phase thickness (μm) 0.250.250.50.50.5
Tstart (C) 50.45.40.40.40.
Tend (C) 180.210.250.250.250.
Heat rate (K/min) 3.53.54.4.4.
Initial hold (min) 2.5.5.5.5.
Final hold (min) 25.20.15.15.15.
I 1232.1244.1240.1240.1240.
ReferenceBotelho, Caldeira, et al., 2007Botelho, Caldeira, et al., 2007Pozo-Bayon M.A., Ruiz-Rodriguez A., et al., 2007Pozo-Bayon M.A., Ruiz-Rodriguez A., et al., 2007Pozo-Bayon M.A., Ruiz-Rodriguez A., et al., 2007
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Supelcowax-10DB-Wax EtrAT-WaxDB-WaxDB-Wax
Column length (m) 30.30.30.60.30.
Carrier gas HeHeH2HeHe
Substrate      
Column diameter (mm) 0.320.250.530.250.32
Phase thickness (μm) 0.50.25 0.250.5
Tstart (C) 70.40.40.40.40.
Tend (C) 220.250.230.265.265.
Heat rate (K/min) 4.5.3.7.7.
Initial hold (min) 7.3.5.  
Final hold (min) 20.15. 5.5.
I 1246.1236.1248.1239.1237.
ReferenceArena, Guarrera, et al., 2006Aubert C. and Pitrat M., 2006Campo, Ferreira, et al., 2006Gurbuz O., Rouseff J.M., et al., 2006Gurbuz O., Rouseff J.M., et al., 2006
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase CP-Wax 52CBInnowaxDB-WaxDB-WaxLM-120
Column length (m) 60.60.30.30.50.
Carrier gas HeHeHe  
Substrate      
Column diameter (mm) 0.250.250.250.320.25
Phase thickness (μm) 0.250.250.250.50.5
Tstart (C) 40.40.50.40.50.
Tend (C) 250.230.220.200.240.
Heat rate (K/min) 4.4.4.5.3.
Initial hold (min)  4.4.3. 
Final hold (min)  20.20.8.30.
I 1236.1230.1227.1247.1253.
ReferenceKourkoutas, Elmore, et al., 2006Lee, Lee, et al., 2006Osorio, Alarcon, et al., 2006Petka, Ferreira, et al., 2006Pinto, Guedes, et al., 2006
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxOV-351StabilwaxDB-WaxDB-Wax
Column length (m) 30.50.30.60.60.
Carrier gas HeHeN2HeHe
Substrate      
Column diameter (mm) 0.250.320.320.320.32
Phase thickness (μm) 0.250.21.1.1.
Tstart (C) 40.60.40.45.45.
Tend (C) 200.220.230.250.250.
Heat rate (K/min) 10.5.4.5.5.
Initial hold (min) 3. 2.1.1.
Final hold (min) 20. 10.12.12.
I 1221.1224.1242.1258.1267.
ReferenceWhetstine M.E.C., Drake M.A., et al., 2006Bonvehí, 2005Fang and Qian, 2005Malliaa, Fernandez-Garcia, et al., 2005Malliaa, Fernandez-Garcia, et al., 2005
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase InnowaxSupelcowax-10DB-WaxDB-WaxDB-Wax
Column length (m) 30.30.30.30.30.
Carrier gas HeHe H2 
Substrate      
Column diameter (mm) 0.250.250.250.250.25
Phase thickness (μm) 0.250.250.250.250.25
Tstart (C) 40.60.40.40.40.
Tend (C) 200.240.200.250.200.
Heat rate (K/min) 5.3.10.3.10.
Initial hold (min) 5.5.3.3.5.
Final hold (min) 2.10.20.20.15.
I 1231.1245.1221.1232.1224.
ReferencePena, Barciela, et al., 2005Riu-Aumatell, Lopez-Tamames, et al., 2005Whetstine, Cadwallader, et al., 2005Aubert and Bourger, 2004Avsar, Karagul-Yuceer, et al., 2004
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-FFAPDB-WaxDB-FFAPCP-Wax 52CBZB-Wax
Column length (m) 15.30.15.30.30.
Carrier gas He HeHeHe
Substrate      
Column diameter (mm) 0.320.250.320.250.25
Phase thickness (μm) 0.250.250.250.20.15
Tstart (C) 35.40.35.80.35.
Tend (C) 225.200.225.240.220.
Heat rate (K/min) 10.10.10.10.1.8
Initial hold (min) 5.5.5.4.10.
Final hold (min) 15.15.15. 10.
I 1244.1224.1232.1233.1226.
ReferenceAvsar, Karagul-Yuceer, et al., 2004Avsar, Karagul-Yuceer, et al., 2004Avsar, Karagul-Yuceer, et al., 2004Ferrari, Lablanquie, et al., 2004Ledauphin, Saint-Clair, et al., 2004
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxDB-WaxDB-WaxHP-Wax
Column length (m) 30.30.30.30.30.
Carrier gas HeHeHeHeN2
Substrate      
Column diameter (mm) 0.320.250.250.250.25
Phase thickness (μm) 0.50.250.250.250.25
Tstart (C) 40.40.40.40.60.
Tend (C) 240.240.240.250.220.
Heat rate (K/min) 5.6.6.3.5.
Initial hold (min) 5.10.10. 10.
Final hold (min)  25.25.20. 
I 1241.1223.1229.1212.1229.
ReferenceRega, Fournier, et al., 2004Varming, Andersen, et al., 2004Varming, Petersen, et al., 2004Brat, Rega, et al., 2003Emilio Tomei, Manganelli, et al., 2003
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxAT-WaxDB-WaxAT-WaxCP-Wax 52CB
Column length (m) 60.60.30.60.50.
Carrier gas HeHe HeH2
Substrate      
Column diameter (mm) 0.250.320.320.320.32
Phase thickness (μm)  0.250.50.25 
Tstart (C) 40.65.35.65.50.
Tend (C) 220.250.240.250.200.
Heat rate (K/min) 3.2.5.2.2.
Initial hold (min) 10.10.5.10. 
Final hold (min) 30.60.5.60. 
I 1233.1222.1241.1225.1271.
ReferenceHayata, Sakamoto, et al., 2003Pino, Almora, et al., 2003Rega, Fournier, et al., 2003Pino, Marbot, et al., 2002Liu, Yang, et al., 2001
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxAT-WaxAT-WaxDB-WaxSupelcowax-10
Column length (m) 30.60.60.30.60.
Carrier gas H2HeHeHeHe
Substrate      
Column diameter (mm) 0.320.320.320.320.25
Phase thickness (μm) 0.250.250.250.50.25
Tstart (C) 35.65.65.35.35.
Tend (C) 220.250.250.250.195.
Heat rate (K/min) 4.2.2.1.12.
Initial hold (min) 0.510.10.  
Final hold (min)  60.60.10.90.
I 1241.21224.1225.1240.01238.
ReferencePet'ka, Mocák, et al., 2001Pino and Marbot, 2001Pino, Marbot, et al., 2001Siegmund, Derler, et al., 2001Chung, 2000
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Supelcowax-10DB-WaxCarbowax 20MDB-WaxDB-Wax
Column length (m) 60.60.60.60.60.
Carrier gas He HeHeHe
Substrate      
Column diameter (mm) 0.250.250.320.250.25
Phase thickness (μm) 0.250.250.425  
Tstart (C) 35.40.45.40.35.
Tend (C) 195.200.300.200.180.
Heat rate (K/min) 2.3.3.3.3.
Initial hold (min) 5.5.3.5.5.
Final hold (min) 90.60.20.  
I 1238.1228.1230.1238.1237.
ReferenceChung, 1999Cha, Kim, et al., 1998Mondello, Dugo, et al., 1995Sumitani, Suekane, et al., 1994Stashenko, Macku, et al., 1992
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Carbowax 20MDB-WaxCarbowax 20MCarbowax 20MOV-351
Column length (m) 25.30.25.25.25.
Carrier gas  He  N2
Substrate      
Column diameter (mm) 0.310.250.310.310.32
Phase thickness (μm) 0.3    
Tstart (C) 50.40.50.50.100.
Tend (C) 200.200.200.200.230.
Heat rate (K/min) 2.2.2.2.6.
Initial hold (min)  10.   
Final hold (min)      
I 1220.1230.1220.1223.1261.
ReferenceSuárez and Duque, 1992Umano, Hagi, et al., 1992Suárez and Duque, 1991Suárez and Duque, 1991Korhonen, 1985
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryPacked
Active phase Carbowax 20MCarbowax 20M
Column length (m)   
Carrier gas He 
Substrate  Celite 545
Column diameter (mm)   
Phase thickness (μm)   
Tstart (C) 50.75.
Tend (C) 160.228.
Heat rate (K/min) 1.4.6
Initial hold (min) 10. 
Final hold (min)   
I 1224.1228.
ReferenceChen, Kuo, et al., 1982van den Dool and Kratz, 1963
Comment MSDC-RI MSDC-RI

References

Go To: Top, Van Den Dool and Kratz RI, polar column, temperature ramp, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

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Umano, Hagi, et al., 1992
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Suárez and Duque, 1991
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Korhonen, 1985
Korhonen, I.O.O., Gas-liquid chromatographic analyses. XLIII. Retention increments for 2-chloro-, 2,2-dichloro- and 2,2,2-trichloroethyl esters of aliphatic C2-C20 n-alkanoic acids on SE-30 and OV-351 capillary columns, J. Chromatogr., 1985, 329, 43-56, https://doi.org/10.1016/S0021-9673(01)81894-X . [all data]

Chen, Kuo, et al., 1982
Chen, C.-C.; Kuo, M.-C.; Hwang, L.S.; Wu, J.S.-B.; Wu, C.-M., Headspace components of passion fruit juice, J. Agric. Food Chem., 1982, 30, 6, 1211-1215, https://doi.org/10.1021/jf00114a052 . [all data]

van den Dool and Kratz, 1963
van den Dool, H.; Kratz, P. Dec., A generalization of the retention index system including linear temperature programmed gas-liquid partition chromatography, J. Chromatogr., 1963, 11, 463-471, https://doi.org/10.1016/S0021-9673(01)80947-X . [all data]


Notes

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