2,6-Octadienal, 3,7-dimethyl-, (Z)-


Van Den Dool and Kratz RI, polar column, temperature ramp

Go To: Top, References, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled by: NIST Mass Spectrometry Data Center, William E. Wallace, director

Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxRTX-WaxDB-WaxDB-WaxSupelcowax-10
Column length (m) 30.60.30.30.30.
Carrier gas HeHeHeHeHe
Substrate      
Column diameter (mm) 0.320.220.250.250.2
Phase thickness (μm) 0.50.250.50.250.2
Tstart (C) 40.60.40.50.70.
Tend (C) 240.230.250.220.220.
Heat rate (K/min) 7.2.4.4.3.
Initial hold (min)   5.4. 
Final hold (min) 5.35.15.20.15.
I 1696.1673.1681.1678.1679.
ReferenceMahattanatawee K., Perez-Cacho P.R., et al., 2007Paolini J., Costa J., et al., 2007Pozo-Bayon M.A., Ruiz-Rodriguez A., et al., 2007Osorio, Alarcon, et al., 2006Pinto, Pina-Vaz, et al., 2006
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase Supelcowax-10BP-20DB-WaxDB-WaxDB-Wax
Column length (m) 30.50.60.30.30.
Carrier gas HeHeN2HeHe
Substrate      
Column diameter (mm) 0.20.220.250.250.25
Phase thickness (μm) 0.20.250.250.250.25
Tstart (C) 70.60.70.40.40.
Tend (C) 220.220.230.250.250.
Heat rate (K/min) 3.2.2.3.3.
Initial hold (min)   2.  
Final hold (min) 15.20.20.20.20.
I 1679.1678.1695.1660.1663.
ReferenceSalgueiro L.R., Pinto E., et al., 2006Boti J.B., Koukoua G., et al., 2005Choi, 2005Fanciullino, Gancel, et al., 2005Gancel, Ollitrault, et al., 2005
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxSupelcowax-10Carbowax 20MMegawax
Column length (m) 30.60.60.60.30.
Carrier gas HeN2HeHeHe
Substrate      
Column diameter (mm) 0.320.250.20.250.25
Phase thickness (μm) 0.50.250.20.250.25
Tstart (C) 40.70.60.45.40.
Tend (C) 240.230.200.250.220.
Heat rate (K/min) 7.2.2.2.2.
Initial hold (min)  2. 0.176.
Final hold (min) 5.20.10. 10.
I 1692.1686.1633.1662.1645.
ReferenceMahattanatawee, Rouseff, et al., 2005Njoroge, Koaze, et al., 2005Smadja, Rondeau, et al., 2005Verzera, Campisi, et al., 2005Verzera, Trozzi, et al., 2005
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase RTX-WaxHP-20MSupelcowaxSupelcowaxDB-Wax
Column length (m) 30.50.25.25.60.
Carrier gas HeHe  N2
Substrate      
Column diameter (mm) 0.250.20.250.250.25
Phase thickness (μm) 0.250.20.250.250.25
Tstart (C) 45.70.35.35.70.
Tend (C) 240.180.225.225.230.
Heat rate (K/min) 3.4.4.4.2.
Initial hold (min) 6.4.5.5.2.
Final hold (min) 10.10.10.10.20.
I 1656.1633.1705.1705.1695.
ReferenceDugo, Mondello, et al., 2004Skocibusic and Bezic, 2004Chisholm, Wilson, et al., 2003Chisholm, Wilson, et al., 2003Choi, 2003
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxDB-WaxHP-20MHP20Wax
Column length (m) 60.60.30.50.50.
Carrier gas HeH2 HeHe
Substrate      
Column diameter (mm) 0.250.320.320.20.2
Phase thickness (μm) 0.250.250.50.20.2
Tstart (C) 40.40.40.70.70.
Tend (C) 210.245.240.180.180.
Heat rate (K/min) 2.1.57.5.4.
Initial hold (min)    4.4.
Final hold (min) 40.20.5.10.10.
I 1667.1663.1690.1641.1641.
ReferenceChyau, Ko, et al., 2003Gancel, Ollitrault, et al., 2003Högnadóttir and Rouseff, 2003Radonic and Milso, 2003Skocibusic and Bezic, 2003
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase MegawaxBP-20RTX-WaxBP-20DB-Wax
Column length (m) 30.50.30.50.30.
Carrier gas HeHeHe He
Substrate      
Column diameter (mm) 0.250.220.250.220.32
Phase thickness (μm) 0.250.250.250.250.50
Tstart (C) 40.60.45.60.40.
Tend (C) 220.220.250.220.240.
Heat rate (K/min) 2.2.3.2.7.
Initial hold (min) 6. 6.  
Final hold (min) 10.20.10.20.5.
I 1645.1674.1659.1677.1693.
ReferenceVerzera, Trozzi, et al., 2003Lota, de Rocca Serra, et al., 2002Mondello, Zappia, et al., 2002Pintore, Usai, et al., 2002Lin and Rouseff, 2001
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase BP-20HP-20MHP-20MAT-WaxCP-Wax 52CB
Column length (m) 50.50.50.60.60.
Carrier gas HeHeHeHeHe
Substrate      
Column diameter (mm) 0.220.200.200.320.25
Phase thickness (μm) 0.250.200.200.250.25
Tstart (C) 60.70.70.65.45.
Tend (C) 220.180.180.250.250.
Heat rate (K/min) 2.4.4.2.2.
Initial hold (min)  4.4.10.0.17
Final hold (min)  10.10.60. 
I 1674.1633.1641.1663.1662.
ReferenceLota, Serra, et al., 2001Milos, Radonic, et al., 2001Milos, Radonic, et al., 2001Pino and Marbot, 2001Verzera, Campisi, et al., 2001
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxDB-WaxCP-Wax 52CBDB-WaxBP-20
Column length (m) 60.60.25.60.50.
Carrier gas HeHe N2He
Substrate      
Column diameter (mm) 0.50.530.250.250.22
Phase thickness (μm) 0.321.00.150.250.25
Tstart (C) 40.50.40.70.60.
Tend (C) 290.220.220.230.230.
Heat rate (K/min) 4.3.3.2.2.
Initial hold (min) 2. 5.2. 
Final hold (min) 5.  20.35.
I 1697.1682.1682.1697.1674.
ReferenceBartley and Jacobs, 2000Brophy, Goldsack, et al., 2000Chagonda, Makanda, et al., 2000Choi and Sawamura, 2000Lota, de Rocca Serra, et al., 2000
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase MegawaxBP-20BP-20DB-WaxDB-Wax
Column length (m) 30.50.50.60.30.
Carrier gas HeHeHe  
Substrate      
Column diameter (mm) 0.250.220.220.250.32
Phase thickness (μm) 0.250.250.250.250.5
Tstart (C) 40.60.60.40.40.
Tend (C) 220.230.230.200.245.
Heat rate (K/min) 2.2.2.3.3.
Initial hold (min) 6.  5.3.
Final hold (min) 10.35.35.60.20.
I 1645.1674.1674.1680.1632.
ReferenceVerzera, Trozzi, et al., 2000Lota, Serra, et al., 1999Lota, Serra, et al., 1999Cha, Kim, et al., 1998Ollé, Baumes, et al., 1998
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase DB-WaxCarbowax 20MDB-WaxCP-Wax 52CBHP-20M
Column length (m) 25.60.60.50.50.
Carrier gas HeHeHeH2He
Substrate      
Column diameter (mm) 0.250.320.250.320.25
Phase thickness (μm) 0.250.4250.25  
Tstart (C) 50.45.50.50.60.
Tend (C) 240.300.150.200.190.
Heat rate (K/min) 4.3.2.1.53.
Initial hold (min) 3.3.10.10. 
Final hold (min)  20.20.40. 
I 1702.1666.1704.1679.1658.
ReferenceMöllenbeck, König, et al., 1997Mondello, Dugo, et al., 1995Combariza, Tirado, et al., 1994Wu and Yang, 1994Chung, Eiserich, et al., 1993
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillaryCapillaryCapillary
Active phase HP-FFAPCarbowax 20MCarbowax 20MCarbowax 20MCarbowax 20M
Column length (m) 50.60.60.60.60.
Carrier gas HeHeHe  
Substrate      
Column diameter (mm) 0.250.320.320.320.32
Phase thickness (μm)    0.250.25
Tstart (C) 60.50.50.40.40.
Tend (C) 210.225.225.230.230.
Heat rate (K/min) 3.1.51.5  
Initial hold (min)      
Final hold (min)  80.80.  
I 1724.1666.1665.1671.1678.
ReferenceChung, Eiserich, et al., 1993Chen and Ho, 1988Chen and Ho, 1988Peppard and Ramus, 1988Peppard and Ramus, 1988
Comment MSDC-RI MSDC-RI MSDC-RI MSDC-RI MSDC-RI
Column type CapillaryCapillaryCapillary
Active phase Carbowax 20MCarbowax 20MCarbowax 20M
Column length (m) 60.60.60.
Carrier gas    
Substrate    
Column diameter (mm) 0.320.320.32
Phase thickness (μm) 0.250.250.25
Tstart (C) 40.40.40.
Tend (C) 230.230.230.
Heat rate (K/min)    
Initial hold (min)    
Final hold (min)    
I 1679.1680.1687.
ReferencePeppard and Ramus, 1988Peppard and Ramus, 1988Peppard and Ramus, 1988
Comment MSDC-RI MSDC-RI MSDC-RI

References

Go To: Top, Van Den Dool and Kratz RI, polar column, temperature ramp, Notes

Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

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Brophy, Goldsack, et al., 2000
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Chagonda, Makanda, et al., 2000
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Choi and Sawamura, 2000
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Lota, de Rocca Serra, et al., 2000
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Verzera, Trozzi, et al., 2000
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Lota, Serra, et al., 1999
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Cha, Kim, et al., 1998
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Notes

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