National Institute of Standards and Technology

NIST Chemistry WebBook, SRD 69

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Thogresen, J.

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Scheer, M.; Bilodeau, RC; Thogresen, J.; Haugen, HK, Threshold Photodetachment of Al-: Electron Affinity and Fine Structure, Phys. Rev. A, 1998, 57, 3, R1493-, https://doi.org/10.1103/PhysRevA.57.R1493 . [all data]