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Author:Langel, W.

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5 matching references were found.

Hack, H.; Langel, W., Photophysics of difluoromethylene (~A 1B1 (0,6,0)) excited by a krypton fluoride laser at 248 nm. 3. Direct measurements of 1B1 collisional removal rates, J. Phys. Chem., 1983, 87, 18, 3462, https://doi.org/10.1021/j100241a022 . [all data]

Hack, W.; Langel, W., Formation of C2(e3«PI»g, C1«PI»g) in the photolysis of CO(X1«SIGMA»g+) at 193 nm with an ArF laser, Chem. Phys. Lett., 1981, 81, 387-390. [all data]

Dornhofer, G.; Hack, W.; Langel, W., Electronic excitation and quenching of CS formed in the ArF laser photolysis of CS2, J. Phys. Chem., 1984, 88, 3060-3069. [all data]

Langel, W.; Kollhoff, H.; Knozinger, E., J. Chem. Phys., 1989, 90, 3430. [all data]

Knozinger, E.; Kollhoff, H.; Langel, W., J. Chem. Phys., 1986, 85, 4881. [all data]