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Ohta, T.; Cicoira, F.; Doppelt, P.; Beitone, L.; Hoffmann, P., Static Vapor Pressure Measurement of Low Volatility Precursors for Molecular Vapor Deposition Below Ambient Temperature, Chem. Vap. Deposition, 2001, 7, 1, 33-37, https://doi.org/10.1002/1521-3862(200101)7:1<33::AID-CVDE33>3.0.CO;2-Y . [all data]