Difluorosilylene
- Formula: F2Si
- Molecular weight: 66.0823
- IUPAC Standard InChIKey: MGNHOGAVECORPT-UHFFFAOYSA-N
- CAS Registry Number: 13966-66-0
- Chemical structure:
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Vibrational and/or electronic energy levels
Go To: Top, References, Notes
Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.
Data compiled by: Marilyn E. Jacox
State: B
Energy (cm-1) |
Med. | Transition | λmin (nm) |
λmax (nm) |
References | ||
---|---|---|---|---|---|---|---|
To = 62280 | gas | B-X | 158 | 165 | Gole, Hauge, et al., 1972 | ||
Dagata, Squire, et al., 1987 | |||||||
Horwitz, Dulcey, et al., 1988 | |||||||
Johnson, Hudgens, et al., 1996 | |||||||
Vib. sym. |
No. | Approximate type of mode |
cm-1 | Med. | Method | References | |
---|---|---|---|---|---|---|---|
a1 | 1 | Sym. stretch | 790 | T | gas | AB MPI | Gole, Hauge, et al., 1972 Johnson, Hudgens, et al., 1996 |
2 | Bend | 320 | T | gas | AB | Gole, Hauge, et al., 1972 | |
State: A
Energy (cm-1) |
Med. | Transition | λmin (nm) |
λmax (nm) |
References | ||
---|---|---|---|---|---|---|---|
To = 44113.9 | gas | A-X | 213 | 276 | Johns, Chantry, et al., 1958 | ||
Rao and Venkateswarlu, 1961 | |||||||
Khanna, Besenbruch, et al., 1967 | |||||||
Dixon and Halle, 1970 | |||||||
Matsumi, Toyoda, et al., 1986 | |||||||
Vanhaelemeersch, Van Hoeymissen, et al., 1991 | |||||||
Biehl, Boyle, et al., 1997 | |||||||
To = 43964 | T | Ne | A-X | 216 | 225 | Milligan and Jacox, 1968 | |
Vib. sym. |
No. | Approximate type of mode |
cm-1 | Med. | Method | References | |
---|---|---|---|---|---|---|---|
a1 | 2 | Bend | 250.1 ± 0.3 | gas | AB LF | Khanna, Besenbruch, et al., 1967 Dixon and Halle, 1970 Vanhaelemeersch, Van Hoeymissen, et al., 1991 Karolczak, Judge, et al., 1995 | |
2 | Bend | 253 | T | Ne | AB | Milligan and Jacox, 1968 | |
State: a
Energy (cm-1) |
Med. | Transition | λmin (nm) |
λmax (nm) |
References | ||
---|---|---|---|---|---|---|---|
To = 26319.478 ± 0.006 | gas | a-X | 364 | 420 | Rao, 1970 | ||
Horwitz, Dulcey, et al., 1988 | |||||||
Karolczak, Judge, et al., 1995 | |||||||
Johnson, Hudgens, et al., 1996 | |||||||
Biehl, Boyle, et al., 1997 | |||||||
Harper, Clouthier, et al., 1998 | |||||||
Vib. sym. |
No. | Approximate type of mode |
cm-1 | Med. | Method | References | |
---|---|---|---|---|---|---|---|
a1 | 2 | Bend | 278.2 | gas | EM LF | Rao, 1970 Horwitz, Dulcey, et al., 1988 Karolczak, Judge, et al., 1995 | |
State: X
Vib. sym. |
No. | Approximate type of mode |
cm-1 | Med. | Method | References | |
---|---|---|---|---|---|---|---|
a1 | 1 | Sym. stretch | 855.01 | gas | IR LF | Khanna, Hauge, et al., 1967 Caldow, Deeley, et al., 1981 Vanhaelemeersch, Van Hoeymissen, et al., 1991 | |
1 | Sym. stretch | 851 | s | Ne | IR | Hastie, Hauge, et al., 1969 | |
1 | Sym. stretch | 843 | s | Ar | IR | Milligan and Jacox, 1968 Hastie, Hauge, et al., 1969 | |
2 | Bend | 345 | gas | MW UV | Rao and Curl, 1966 Khanna, Besenbruch, et al., 1967 | ||
2 | Bend | 345 | gas | LF MPI | Vanhaelemeersch, Van Hoeymissen, et al., 1991 Johnson, Hudgens, et al., 1996 | ||
2 | Bend | 343 | Ar | IR | Milligan and Jacox, 1968 | ||
b2 | 3 | Asym. stretch | 870.40 | gas | IR | Khanna, Hauge, et al., 1967 Caldow, Deeley, et al., 1981 | |
3 | Asym. stretch | 864.6 | s | Ne | IR | Hastie, Hauge, et al., 1969 | |
3 | Asym. stretch | 855 | vs | Ar | IR | Milligan and Jacox, 1968 Hastie, Hauge, et al., 1969 | |
Additional references: Jacox, 1994, page 100; Jacox, 1998, page 197; Jacox, 2003, page 140; Rao, Curl, et al., 1965; Fehlner and Turner, 1974; Bizzocchi and Degli Esposti, 2006
Notes
s | Strong |
vs | Very strong |
T | Tentative assignment or approximate value |
o | Energy separation between the v = 0 levels of the excited and electronic ground states. |
References
Go To: Top, Vibrational and/or electronic energy levels, Notes
Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.
Gole, Hauge, et al., 1972
Gole, J.L.; Hauge, R.H.; Margrave, J.L.; Hastie, J.W.,
The vaccum ultraviolet spectra of SiF2 and GeF2,
J. Mol. Spectrosc., 1972, 43, 3, 441, https://doi.org/10.1016/0022-2852(72)90055-0
. [all data]
Dagata, Squire, et al., 1987
Dagata, J.A.; Squire, D.W.; Dulcey, C.S.; Hsu, D.S.Y.; Lin, M.C.,
MPI/MS detection of SiF and SiF2 radicals produced from the reaction of F2 and NF3 with silicon,
Chem. Phys. Lett., 1987, 134, 2, 151, https://doi.org/10.1016/0009-2614(87)87112-9
. [all data]
Horwitz, Dulcey, et al., 1988
Horwitz, J.S.; Dulcey, C.S.; Lin, M.C.,
REMPI/MS detection of SiF2 radicals by (3+1) and (1+3) photoionization,
Chem. Phys. Lett., 1988, 150, 1-2, 165, https://doi.org/10.1016/0009-2614(88)80415-9
. [all data]
Johnson, Hudgens, et al., 1996
Johnson, R.D., III; Hudgens, J.W.; Ashfold, M.N.R.,
Excited electronic states of the SiF2 radical studied by resonance enhanced multiphoton ionisation spectroscopy and by ab initio methods,
Chem. Phys. Lett., 1996, 261, 4-5, 474, https://doi.org/10.1016/0009-2614(96)00990-6
. [all data]
Johns, Chantry, et al., 1958
Johns, J.W.C.; Chantry, G.W.; Barrow, R.F.,
The ultra-violet spectrum of silicon difluoride,
Trans. Faraday Soc., 1958, 54, 1589, https://doi.org/10.1039/tf9585401589
. [all data]
Rao and Venkateswarlu, 1961
Rao, D.R.; Venkateswarlu, P.,
Emission spectrum of SiF2,
J. Mol. Spectrosc., 1961, 7, 1-6, 287, https://doi.org/10.1016/0022-2852(61)90362-9
. [all data]
Khanna, Besenbruch, et al., 1967
Khanna, V.M.; Besenbruch, G.; Margrave, J.L.,
Ultraviolet Absorption Spectrum of SiF2,
J. Chem. Phys., 1967, 46, 6, 2310, https://doi.org/10.1063/1.1841037
. [all data]
Dixon and Halle, 1970
Dixon, R.N.; Halle, M.,
Rotational analysis of absorption bands in the 2266 Å system of SiF2,
J. Mol. Spectrosc., 1970, 36, 2, 192, https://doi.org/10.1016/0022-2852(70)90104-9
. [all data]
Matsumi, Toyoda, et al., 1986
Matsumi, Y.; Toyoda, S.; Hayashi, T.; Miyamura, M.; Yoshikawa, H.; Komiya, S.,
Laser-induced fluorescence study of silicon etching process: Detection of SiF2 and CF2 radicals,
J. Appl. Phys., 1986, 60, 12, 4102, https://doi.org/10.1063/1.337489
. [all data]
Vanhaelemeersch, Van Hoeymissen, et al., 1991
Vanhaelemeersch, S.; Van Hoeymissen, J.; Vermeylen, D.; Peeters, J.,
SiF2 as a primary desorption product of Si etching by F atoms: Interpretation of laser-induced fluorescence spectra; rate constant of the gas phase SiF2+F reaction,
J. Appl. Phys., 1991, 70, 7, 3892, https://doi.org/10.1063/1.349197
. [all data]
Biehl, Boyle, et al., 1997
Biehl, H.; Boyle, K.J.; Seccombe, D.P.; Smith, D.M.; Tuckett, R.P.; Yoxall, K.R.; Baumgartel, H.; Jochims, H.W.,
Vacuum-UV fluorescence spectroscopy of SiF[sub 4] in the range 10--30 eV,
J. Chem. Phys., 1997, 107, 3, 720, https://doi.org/10.1063/1.474437
. [all data]
Milligan and Jacox, 1968
Milligan, D.E.; Jacox, M.E.,
Matrix-Isolation Study of the Vacuum-Ultraviolet Photolysis of Difluorosilane. The Infrared and Ultraviolet Spectra of the Free Radical SiF2,
J. Chem. Phys., 1968, 49, 10, 4269, https://doi.org/10.1063/1.1669870
. [all data]
Karolczak, Judge, et al., 1995
Karolczak, J.; Judge, R.H.; Clouthier, D.J.,
Experimental Determination of the Structure of SiF2 in Its Excited Triplet State,
J. Am. Chem. Soc., 1995, 117, 37, 9523, https://doi.org/10.1021/ja00142a020
. [all data]
Rao, 1970
Rao, D.R.,
New electronic emission from SiF2,
J. Mol. Spectrosc., 1970, 34, 2, 284, https://doi.org/10.1016/0022-2852(70)90093-7
. [all data]
Harper, Clouthier, et al., 1998
Harper, W.W.; Clouthier, D.J.; Judge, R.H.,
Rotational Analysis of the 210and 220Bands of the ã3B1←X1A1System of Jet-Cooled Silicon Difluoride,
J. Mol. Spectrosc., 1998, 189, 1, 46, https://doi.org/10.1006/jmsp.1998.7527
. [all data]
Khanna, Hauge, et al., 1967
Khanna, V.M.; Hauge, R.; Curl, R.F., Jr.; Margrave, J.L.,
J. Chem. Phys., 1967, 47, 5031. [all data]
Caldow, Deeley, et al., 1981
Caldow, G.L.; Deeley, C.M.; Turner, P.H.; Mills, I.M.,
The infrared spectrum of silicon difluoride,
Chem. Phys. Lett., 1981, 82, 3, 434, https://doi.org/10.1016/0009-2614(81)85414-0
. [all data]
Hastie, Hauge, et al., 1969
Hastie, J.W.; Hauge, R.H.; Margrave, J.L.,
Infrared spectra of silicon difluroide in neon and argon matrixes,
J. Am. Chem. Soc., 1969, 91, 10, 2536, https://doi.org/10.1021/ja01038a024
. [all data]
Rao and Curl, 1966
Rao, V.M.; Curl, R.F., Jr.,
Microwave Spectrum and Force Constants of SiF2: Centrifugal Distortion,
J. Chem. Phys., 1966, 45, 6, 2032, https://doi.org/10.1063/1.1727887
. [all data]
Jacox, 1994
Jacox, M.E.,
Vibrational and electronic energy levels of polyatomic transient molecules, American Chemical Society, Washington, DC, 1994, 464. [all data]
Jacox, 1998
Jacox, M.E.,
Vibrational and electronic energy levels of polyatomic transient molecules: supplement A,
J. Phys. Chem. Ref. Data, 1998, 27, 2, 115-393, https://doi.org/10.1063/1.556017
. [all data]
Jacox, 2003
Jacox, M.E.,
Vibrational and electronic energy levels of polyatomic transient molecules: supplement B,
J. Phys. Chem. Ref. Data, 2003, 32, 1, 1-441, https://doi.org/10.1063/1.1497629
. [all data]
Rao, Curl, et al., 1965
Rao, V.M.; Curl, R.F., Jr.; Timms, P.L.; Margrave, J.L.,
Microwave Spectrum of SiF2,
J. Chem. Phys., 1965, 43, 7, 2557, https://doi.org/10.1063/1.1697165
. [all data]
Fehlner and Turner, 1974
Fehlner, T.P.; Turner, D.W.,
The photoelectron spectrum of SiF2,
Inorg. Chem., 1974, 13, 754. [all data]
Bizzocchi and Degli Esposti, 2006
Bizzocchi, L.; Degli Esposti, C.,
Millimeter and submillimeter-wave spectroscopy of silicon difluoride,
J. Mol. Spectrosc., 2006, 235, 1, 117, https://doi.org/10.1016/j.jms.2005.10.011
. [all data]
Notes
Go To: Top, Vibrational and/or electronic energy levels, References
- Data from NIST Standard Reference Database 69: NIST Chemistry WebBook
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