Tris(2,2,6,6-tetramethylheptane-3,5-dionato)yttrium(III)


Phase change data

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Data compiled by: William E. Acree, Jr., James S. Chickos

Enthalpy of vaporization

ΔvapH (kJ/mol) Temperature (K) Reference
89.5450. to 455.Fulem, Ruzicka, et al., 2004

Enthalpy of sublimation

ΔsubH (kJ/mol) Temperature (K) Method Reference Comment
141.6395. to 434.N/AFulem, Ruzicka, et al., 2004 
151.0 ± 0.8372.TEColominas, Lau, et al., 2001Based on data from 358. to 387. K.
153.1 ± 0.4366.TEColominas, Lau, et al., 2001Based on data from 357. to 377. K.
135.9403. to 433.TG,DTAYuan, Yang, et al., 1997 
126.0397.TRappoli and DeSisto, 1996Based on data from 382. to 412. K.
156.9388.MEAmano, Sato, et al., 1981Based on data from 363. to 418. K.

Enthalpy of fusion

ΔfusH (kJ/mol) Temperature (K) Reference
51.8440.Fulem, Ruzicka, et al., 2004

References

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Data compilation copyright by the U.S. Secretary of Commerce on behalf of the U.S.A. All rights reserved.

Fulem, Ruzicka, et al., 2004
Fulem, Michal; Ruzicka, Kvetoslav; Ruzicka, Vlastimil; Simecek, Tomislav; Hulicius, Eduard; Pangrác, Jiri, Vapour pressure and heat capacities of metal organic precursors, Y(thd)3 and Zr(thd)4, Journal of Crystal Growth, 2004, 264, 1-3, 192-200, https://doi.org/10.1016/j.jcrysgro.2003.12.016 . [all data]

Colominas, Lau, et al., 2001
Colominas, Carles; Lau, Kai H.; Hildenbrand, Donald L.; Crouch-Baker, Steven; Sanjurjo, Angel, Vapor Pressures of the Copper and Yttrium β-Diketonate MOCVD Precursors, J. Chem. Eng. Data, 2001, 46, 2, 446-450, https://doi.org/10.1021/je0003445 . [all data]

Yuan, Yang, et al., 1997
Yuan, Z.; Yang, P.; Meng, G.; Peng, D., Synthesis, characterization, Stability and Sublimation Behavior of Yttrium (III) Dipivaloylmethane Chelate, Wuji Huaxue Xuebao, 1997, 13, 2, 168. [all data]

Rappoli and DeSisto, 1996
Rappoli, Brian J.; DeSisto, William J., Gas phase ultraviolet spectroscopy of high-temperature superconductor precursors for chemical vapor deposition processing, Appl. Phys. Lett., 1996, 68, 19, 2726, https://doi.org/10.1063/1.115578 . [all data]

Amano, Sato, et al., 1981
Amano, Ryohei; Sato, Akiko; Suzuki, Shin, Sublimation behavior of tris(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanoid(III)., Bull. Chem. Soc. Jpn., 1981, 54, 5, 1368-1374, https://doi.org/10.1246/bcsj.54.1368 . [all data]


Notes

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